Plasma generation apparatus
    1.
    发明授权
    Plasma generation apparatus 有权
    等离子体发生装置

    公开(公告)号:US08492979B2

    公开(公告)日:2013-07-23

    申请号:US12731700

    申请日:2010-03-25

    IPC分类号: H05B31/26 B23K9/00

    CPC分类号: H05H1/36 H05H1/44

    摘要: Provided is an apparatus, such as an arc mitigating device, which can include a first plasma generation device and a second plasma generation device. The second plasma generation device can include a pair of opposing and spaced apart electrodes and a low voltage, high current energy source connected therebetween. A conduit can be configured to direct plasma between the first and second plasma generation devices, such that the second plasma generation device receives plasma generated by the first plasma generation. The plasma from the first plasma generation device can act to reduce the impedance of an area between the pair of opposing electrodes sufficiently to allow an arc to be established therebetween due to the low voltage, high current energy source.

    摘要翻译: 提供了一种诸如减弧装置的装置,其可以包括第一等离子体产生装置和第二等离子体产生装置。 第二等离子体产生装置可以包括一对相对且间隔开的电极和连接在它们之间的低电压,高电流能量源。 导管可以被配置为在第一和第二等离子体产生装置之间引导等离子体,使得第二等离子体产生装置接收由第一等离子体产生产生的等离子体。 来自第一等离子体产生装置的等离子体可以充分地减小一对相对电极之间的区域的阻抗,以允许由于低电压,高电流能量源而在其间建立电弧。

    PLASMA GENERATION APPARATUS
    2.
    发明申请
    PLASMA GENERATION APPARATUS 审中-公开
    等离子体发生装置

    公开(公告)号:US20110248002A1

    公开(公告)日:2011-10-13

    申请号:US12759049

    申请日:2010-04-13

    IPC分类号: B23K10/00

    CPC分类号: H05H1/52 H01T2/02

    摘要: Provided is an apparatus, such as an arc mitigating device, that includes an annular body that defines a lumen and a longitudinal axis, the annular body having a body length along the longitudinal axis. An electrode can be disposed coaxially within the lumen. The electrode may extend into the body by an electrode length that is at least about 50% of the body length, and may have diameter less than or equal to about 50% of an inner diameter of the annular body. An ablative material portion can be disposed between the annular body and the electrode. The annular body and the electrode may be configured such that when an arc exists between the annular body and the electrode, the ablative material portion undergoes ablation and thereby generates a plasma.

    摘要翻译: 提供了一种诸如减弧装置的装置,其包括限定内腔和纵向轴线的环形体,环形体具有沿着纵向轴线的主体长度。 电极可以同轴地设置在内腔内。 电极可以通过至少约50体积长度的电极长度延伸到体内,并且可以具有小于或等于环形体内径的约50%的直径。 烧蚀材料部分可以设置在环形体和电极之间。 环形体和电极可以被配置为使得当在环形体和电极之间存在电弧时,烧蚀材料部分经历消融并由此产生等离子体。

    Method and systems for discharging energy from an electrical fault
    3.
    发明授权
    Method and systems for discharging energy from an electrical fault 有权
    从电气故障中排出能量的方法和系统

    公开(公告)号:US08922958B2

    公开(公告)日:2014-12-30

    申请号:US13494180

    申请日:2012-06-12

    CPC分类号: H02H9/06 H01T2/02 H02H1/0023

    摘要: An electrical fault mitigation system includes a mitigation device including a containment chamber defining a cavity, a first electrode positioned within the cavity and coupled to a first conductor, and a second electrode positioned within the cavity and coupled to a second conductor. The mitigation device also includes a first voltage source, and a plasma gun positioned within the cavity and configured to emit ablative plasma using the first voltage source to discharge energy from an electrical fault. The system also includes a first voltage limiter device configured to limit a voltage of the first conductor from increasing above a predetermined threshold to prevent a second voltage source from generating a second electrical arc between the first electrode and the second electrode when the second voltage source applies a voltage across the first electrode and the second electrode.

    摘要翻译: 电气故障缓解系统包括缓解装置,其包括限定空腔的容纳室,位于空腔内并耦合到第一导体的第一电极以及位于空腔内并耦合到第二导体的第二电极。 缓解装置还包括位于空腔内的第一电压源和等离子体枪,并且被配置为使用第一电压源发射烧蚀等离子体以从电气故障中释放能量。 该系统还包括第一限压器装置,其被配置为将第一导体的电压限制在高于预定阈值以上,以防止当第二电压源施加时第二电压源在第一电极和第二电极之间产生第二电弧 跨越第一电极和第二电极的电压。

    PLASMA GENERATION APPARATUS
    4.
    发明申请
    PLASMA GENERATION APPARATUS 有权
    等离子体发生装置

    公开(公告)号:US20110234099A1

    公开(公告)日:2011-09-29

    申请号:US12731700

    申请日:2010-03-25

    IPC分类号: H05H1/24

    CPC分类号: H05H1/36 H05H1/44

    摘要: Provided is an apparatus, such as an arc mitigating device, which can include a first plasma generation device and a second plasma generation device. The second plasma generation device can include a pair of opposing and spaced apart electrodes and a low voltage, high current energy source connected therebetween. A conduit can be configured to direct plasma between the first and second plasma generation devices, such that the second plasma generation device receives plasma generated by the first plasma generation. The plasma from the first plasma generation device can act to reduce the impedance of an area between the pair of opposing electrodes sufficiently to allow an arc to be established therebetween due to the low voltage, high current energy source.

    摘要翻译: 提供了一种诸如减弧装置的装置,其可以包括第一等离子体产生装置和第二等离子体产生装置。 第二等离子体产生装置可以包括一对相对且间隔开的电极和连接在它们之间的低电压,高电流能量源。 导管可以被配置为在第一和第二等离子体产生装置之间引导等离子体,使得第二等离子体产生装置接收由第一等离子体产生产生的等离子体。 来自第一等离子体产生装置的等离子体可以充分地减小一对相对电极之间的区域的阻抗,以允许由于低电压,高电流能量源而在其间建立电弧。

    DUAL POWER SOURCE PULSE GENERATOR FOR A TRIGGERING SYSTEM
    6.
    发明申请
    DUAL POWER SOURCE PULSE GENERATOR FOR A TRIGGERING SYSTEM 有权
    用于触发系统的双电源脉冲发生器

    公开(公告)号:US20100052761A1

    公开(公告)日:2010-03-04

    申请号:US12203507

    申请日:2008-09-03

    IPC分类号: H03K3/00 H05B31/00

    CPC分类号: H01T2/02

    摘要: A dual power source pulse generator in power connection with a pair of electrodes having a first electrode, a second electrode and an air gap therebetween. The dual power source pulse generator includes a first pulse source producing a high voltage low current pulse across the pair of electrodes to allow dielectric breakdown, and a second pulse source electrically connected in parallel with an output of the first pulse source, and producing a low voltage high current pulse to thereby produce a current flow of high-density plasma between the same electrodes of the pair of electrodes in response to the high voltage low current pulse.

    摘要翻译: 一种双电源脉冲发生器,其与具有第一电极,第二电极和它们之间的气隙的一对电极电连接。 双电源脉冲发生器包括:第一脉冲源,产生跨越该对电极的高电压低电流脉冲,以允许电介质击穿;以及第二脉冲源,与第一脉冲源的输出并联电连接,并产生低电平 电压高电流脉冲,从而响应于高电压低电流脉冲而在一对电极的相同电极之间产生高密度等离子体的电流。

    Ablative Plasma Gun
    7.
    发明申请
    Ablative Plasma Gun 有权
    烧蚀等离子枪

    公开(公告)号:US20080253040A1

    公开(公告)日:2008-10-16

    申请号:US11735673

    申请日:2007-04-16

    IPC分类号: B23K9/23

    CPC分类号: H05H1/52 H01T2/02

    摘要: A plasma gun with two gap electrodes on opposite ends of a chamber of ablative material such as an ablative polymer. The gun ejects an ablative plasma at supersonic speed. A divergent nozzle spreads the plasma jet to fill a gap between electrodes of a main arc device, such as an arc crowbar or a high voltage power switch. The plasma triggers the main arc device by lowering the impedance of the main arc gap via the ablative plasma to provide a conductive path between the main electrodes. This provides faster triggering and requires less trigger energy than previous arc triggers. It also provides a more conductive initial main arc than previously possible. The initial properties of the main arc are controllable by the plasma properties, which are in turn controllable by design parameters of the ablative plasma gun.

    摘要翻译: 等离子体枪,具有两个间隙电极,位于烧蚀材料室(例如可消融聚合物)的相对两端。 枪以超音速弹出烧蚀等离子体。 扩散喷嘴扩展等离子体射流以填充主弧装置的电极之间的间隙,例如电弧撬棒或高压电源开关。 等离子体通过消融等离子体降低主电弧间隙的阻抗来触发主电弧装置,以在主电极之间提供导电路径。 这提供了更快的触发,并且比以前的电弧触发要求更少的触发能量。 它还提供比以前更可能的更导电的初始主弧。 主弧的初始特性可以通过等离子体性质来控制,这些等离子体性质又可由烧蚀等离子枪的设计参数控制。

    Ablative plasma gun
    8.
    发明授权
    Ablative plasma gun 有权
    烧伤等离子枪

    公开(公告)号:US08742282B2

    公开(公告)日:2014-06-03

    申请号:US11735673

    申请日:2007-04-16

    IPC分类号: B23K9/00 H02H3/00 H01J17/26

    CPC分类号: H05H1/52 H01T2/02

    摘要: A plasma gun with two gap electrodes on opposite ends of a chamber of ablative material such as an ablative polymer. The gun ejects an ablative plasma at supersonic speed. A divergent nozzle spreads the plasma jet to fill a gap between electrodes of a main arc device, such as an arc crowbar or a high voltage power switch. The plasma triggers the main arc device by lowering the impedance of the main arc gap via the ablative plasma to provide a conductive path between the main electrodes. This provides faster triggering and requires less trigger energy than previous arc triggers. It also provides a more conductive initial main arc than previously possible. The initial properties of the main arc are controllable by the plasma properties, which are in turn controllable by design parameters of the ablative plasma gun.

    摘要翻译: 等离子体枪,具有两个间隙电极,位于烧蚀材料室(例如可消融聚合物)的相对两端。 枪以超音速弹出烧蚀等离子体。 扩散喷嘴扩展等离子体射流以填充主弧装置的电极之间的间隙,例如电弧撬棒或高压电源开关。 等离子体通过消融等离子体降低主电弧间隙的阻抗来触发主电弧装置,以在主电极之间提供导电路径。 这提供了更快的触发,并且比以前的电弧触发要求更少的触发能量。 它还提供比以前更可能的更导电的初始主弧。 主弧的初始特性可以通过等离子体性质来控制,这些等离子体性质又可由烧蚀等离子枪的设计参数控制。

    Arc containment device and method
    9.
    发明授权
    Arc containment device and method 有权
    电弧遏制装置及方法

    公开(公告)号:US08563888B2

    公开(公告)日:2013-10-22

    申请号:US12137460

    申请日:2008-06-11

    IPC分类号: H01J17/00

    摘要: An arc containment device is presented. The arc containment device includes a shock shield further having a multiple apertures for escape of gas, the shock shield configured to surround an arc source. The device further comprises an inner enclosure having a multiple openings generally aligned with the multiple apertures, the inner enclosure configured to provide an electrical insulation base for the arc source. An outer enclosure disposed is provided around the inner enclosure, the outer enclosure configured to direct the gas to the environment outside the device.

    摘要翻译: 提出了一种电弧遏制装置。 电弧容纳装置包括还具有用于气体逸出的多个孔的防震罩,所述防震罩构造成围绕电弧源。 该装置还包括具有通常与多个孔对齐的多个开口的内部外壳,该内部外壳被配置为提供用于电弧源的电绝缘基座。 设置在外壳周围的外壳体,外壳被配置为将气体引导到设备外部的环境。

    INSULATING COMPOSITIONS AND DEVICES INCORPORATING THE SAME
    10.
    发明申请
    INSULATING COMPOSITIONS AND DEVICES INCORPORATING THE SAME 审中-公开
    绝缘组合物和包含该组合物的装置

    公开(公告)号:US20110017494A1

    公开(公告)日:2011-01-27

    申请号:US12508811

    申请日:2009-07-24

    摘要: Provided are compositions that include a dielectric matrix material defining multiple voids of substantially uniform respective dimension and configured as a substantially uniform array. The voids may be configured such that charges that accumulate at surfaces of at least some of the voids when the composition is immersed in a uniform external electric field interact with charges that accumulate at surfaces of at least others of the voids to cause movement of the respective charges in a direction having a component transverse to the electric field. Hollow particles may be disposed within respective voids of the array of voids defined by the matrix material, and particles, such as, for example, ceramic, varistor, and/or inorganic dielectric particles, may be incorporated within the matrix material. Associated devices are also provided.

    摘要翻译: 提供的组合物包括限定多个基本上均匀的相应尺寸的空隙的介电基质材料并且被配置为基本均匀的阵列。 空隙可以被配置成使得当组合物浸入均匀的外部电场时积聚在至少一些空隙的表面的电荷与积聚在至少其他空隙的表面的电荷相互作用,引起相应的 在具有横向于电场的分量的方向上充电。 中空颗粒可以设置在由基质材料限定的空隙阵列的相应空隙内,并且可以将诸如陶瓷,变阻器和/或无机介电颗粒的颗粒结合到基质材料内。 还提供相关设备。