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    In-situ wear indicator for non-selective material removal systems
    1.
    发明授权
    In-situ wear indicator for non-selective material removal systems 失效
    用于非选择性材料去除系统的原位磨损指示器

    公开(公告)号：US06957622B2

    公开(公告)日：2005-10-25

    申请号：US10773605

    申请日：2004-02-05

    申请人： Gregory S. Boettcher ,  Steven B. Gold ,  Robert P. Katz ,  Gabriel V. Moore

    发明人： Gregory S. Boettcher ,  Steven B. Gold ,  Robert P. Katz ,  Gabriel V. Moore

    IPC分类号： G01D11/00 ,  G01D21/00 ,  G01N3/56 ,  G01N33/00

    CPC分类号： G01N3/56 ,  G01N2033/0095

    摘要： An in-situ wear indicator for detecting wear to at least one selected part in a semiconductor manufacturing environment. The indicator is manufactured in a selected material with a selected thickness so that the indicator degrades upon exposure to the semiconductor manufacturing process at a fixed rate relative to the wear of the selected part. The indicator displays a visual indication of wear which is discernible by an automated detection device.

    摘要翻译： 一种用于在半导体制造环境中检测对至少一个选定部件的磨损的原位磨损指示器。 该指示器以所选择的厚度制成所选择的材料，使得指示剂以暴露于半导体制造工艺的相对于所选择的部件的磨损的固定速率降低。 该指示器显示可由自动检测装置识别的磨损的视觉指示。

    Semiconductor arrangement preventing damage during contact processing
    2.
    发明授权
    Semiconductor arrangement preventing damage during contact processing 失效
    半导体布置防止接触处理过程中的损坏

    公开(公告)号：US06188124B1

    公开(公告)日：2001-02-13

    申请号：US09354374

    申请日：1999-07-14

    申请人： Gregory S. Boettcher ,  Robert P. Katz ,  Ashwani K. Malhotra ,  James Wood

    发明人： Gregory S. Boettcher ,  Robert P. Katz ,  Ashwani K. Malhotra ,  James Wood

    IPC分类号： H01L23544

    CPC分类号： H01L23/564 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A semiconductor arrangement having a first active region and a dummy region on a surface of a substrate. The first active region and the dummy region are spaced from one another without any contact, and the dummy region is closer to an edge of the surface of the substrate in comparison to the first active region. Formed on the dummy region, first active region, and a portion of the substrate surface is a dielectric layer. The surface of the dielectric layer has an inactive portion and an active portion. A mask is disposed on the dielectric layer such that the mask contacts the inactive portion and does not contact the active portion.

    摘要翻译： 一种在衬底表面上具有第一有源区和虚拟区的半导体装置。 与第一有源区域相比，第一有源区域和虚设区域彼此间隔开而没有任何接触，并且虚设区域更靠近衬底的表面的边缘。 在虚拟区域上形成第一有源区，并且衬底表面的一部分是电介质层。 电介质层的表面具有非活性部分和活性部分。 掩模设置在电介质层上，使得掩模接触非活性部分并且不接触有源部分。