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1.发明授权Method for making optical elements for microlithography, the lens systems obtained by the method and their uses 有权用于制造用于微光刻的光学元件的方法，通过该方法获得的透镜系统及其用途公开(公告)号：US07679806B2
公开(公告)日：2010-03-16
申请号：US11369306
申请日：2006-03-07
申请人： Gunther Wehrhan , Regina Martin , Lutz Parthier , Joerg Staeblein , Martin Letz , Jochen Alkemper , Konrad Knapp , Klaus Petermann
发明人： Gunther Wehrhan , Regina Martin , Lutz Parthier , Joerg Staeblein , Martin Letz , Jochen Alkemper , Konrad Knapp , Klaus Petermann
CPC分类号： C30B29/28 , C30B15/00 , G02B1/02 , G02B13/143 , G03F7/70341 , G03F7/70958
摘要： The optical elements for ultraviolet radiation, especially for microlithography, are made from cubic granet, cubic spinel, cubic perovskite and/or cubic M(II)- as well as M(IV)-oxides. The optical elements are made from suitable crystals of Y3Al5O12, Lu3Al5O12, Ca3Al2Si3O12, K2NaAlF6, K2NaScF6, K2LiAlF6 and/or Na3Al2Li3F12, (Mg, Zn)Al2O4, CaAl2O4, CaB2O4 and/or LiAl5O8, BaZrO3 and/or CaCeO3. A front lens used in immersion optics for microlithography at wavelengths under 200 nm is an example of a preferred optical element of the present invention.
摘要翻译： 用于紫外线辐射的光学元件，特别是用于微光刻，由立方晶粒，立方尖晶石，立方钙钛矿和/或立方M（II）以及M（IV） - 氧化物制成。 光学元件由合适的Y3Al5O12，Lu3Al5O12，Ca3Al2Si3O12，K2NaAlF6，K2NaScF6，K2LiAlF6和/或Na3Al2Li3F12，（Mg，Zn）Al2O4，CaAl2O4，CaB2O4和/或LiAl5O8，BaZrO3和/或CaCeO3的晶体制成。 用于200nm以下波长的微光刻的浸没光学元件的前透镜是本发明的优选光学元件的一个例子。
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2.发明申请Method for making optical elements for microlithography, the lens systems obtained by the method and their uses 有权用于制造用于微光刻的光学元件的方法，通过该方法获得的透镜系统及其用途公开(公告)号：US20060245043A1
公开(公告)日：2006-11-02
申请号：US11369306
申请日：2006-03-07
申请人： Gunther Wehrhan , Regina Martin , Lutz Parthier , Joerg Staeblein , Martin Letz , Jochen Alkemper , Konrad Knapp , Klaus Petermann
发明人： Gunther Wehrhan , Regina Martin , Lutz Parthier , Joerg Staeblein , Martin Letz , Jochen Alkemper , Konrad Knapp , Klaus Petermann
IPC分类号： G06K7/10
CPC分类号： C30B29/28 , C30B15/00 , G02B1/02 , G02B13/143 , G03F7/70341 , G03F7/70958
摘要： The optical elements for ultraviolet radiation, especially for microlithography, are made from cubic granatite, cubic spinel, cubic perovskite and/or cubic M(II)- as well as M(IV)-oxides. The optical elements are made from suitable crystals of Y3Al5O12, Lu3Al5O12, Ca3Al2Si3O12, K2NaAlF6, K2NaScF6, K2LiAlF6 and/or Na3Al2Li3F12, (Mg, Zn)Al2O4, CaAl2O4, CaB2O4 and/or LiAl5O8, BaZrO3 and/or CaCeO3. A front lens used in immersion optics for microlithography at wavelengths under 200 nm is an example of a preferred optical element of the present invention.
摘要翻译： 用于紫外线辐射的光学元件，特别是用于微光刻，由立方晶体青瓷，立方尖晶石，立方钙钛矿和/或立方M（II） - 以及M（IV） - 氧化物制成。 光学元件由合适的Y 3 N 2 O 12 N 12 O 12 N 12， 5 12 2，3 3 2 >，K 2 NaAlF 6，K 2 NaScF 6，K 2 LiAlF 6和/或Na 3 Al 2 N 2 N 2 F 12，（Mg ，Zn）Al 2 O 4，CaAl 2 O 4，CaB 2 O 3， O 4和/或LiAl 5 O 8，BaZrO 3和/或CaCeO 3， SUB>。 用于200nm以下波长的微光刻的浸没光学元件的前透镜是本发明的优选光学元件的一个例子。
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3.发明授权公开(公告)号：US07522270B2
公开(公告)日：2009-04-21
申请号：US11440925
申请日：2006-05-25
IPC分类号： G01N21/00
CPC分类号： G01N21/64 , G01N21/33 , G01N2021/1736
摘要： The method determines the extent of irreversible radiation damage of an optical material. The method includes the following three tests to determine the extent of irreversible radiation damage: 1) the optical material is irradiated with ultraviolet radiation at a wavelength of 193 nm and the non-intrinsic fluorescence intensity at a wavelength of 740 nm is measured; 2) the optical material is irradiated with high energy laser light and a change in respective absorptions at a wavelength of 385 nm is determined before and after irradiation; and 3) the optical material is irradiated with an energetic radiation source to form all possible color centers and a difference of respective surface integrals of corresponding absorption spectra in ultraviolet spectral and/or visible spectral regions is measured before and after irradiation.
摘要翻译： 该方法确定光学材料不可逆辐射损伤的程度。 该方法包括以下三个测试，以确定不可逆辐射损伤的程度：1）光学材料用波长193nm的紫外线照射，并测量波长为740nm的非固有荧光强度; 2）用高能量激光照射光学材料，并且在照射之前和之后确定波长385nm处各自吸收的变化; 和3）用能量辐射源照射光学材料以形成所有可能的颜色中心，并且在照射之前和之后测量在紫外光谱和/或可见光谱区域中的相应吸收光谱的各个表面积分的差异。
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4.发明申请Determining the suitability of an optical material for the production of optical elements, corresponding device, and use of said material 有权确定用于制造光学元件的光学材料的适用性，相应的装置以及所述材料的使用公开(公告)号：US20050237523A1
公开(公告)日：2005-10-27
申请号：US10527850
申请日：2003-09-16
IPC分类号： G01N21/64
CPC分类号： G01N21/6402
摘要： The method tests the suitability of an optical material having a radiation-induced absorption, especially of an alkali or alkaline earth halide, for production of an optical element exposed to high-energy irradiation. The method includes pre-irradiating the optical material with laser radiation until rapid damage induced in the optical material with the laser radiation is saturated; subsequently measuring fluorescence of the optical material during and/or immediately after irradiating the optical material with excitation radiation and determining the non-intrinsic fluorescence and intrinsic fluorescence present in the measured fluorescence. Suitability may be preferably determined according to a ratio of the amount of non-intrinsic fluorescence to intrinsic fluorescence. A device for performing the method including a barrier device for blocking scattered excitation radiation is also provided.
摘要翻译： 该方法测试具有辐射诱发吸收的光学材料，特别是碱金属或碱土金属卤化物的光学材料适用于生产暴露于高能辐射的光学元件。 该方法包括用激光辐射预先照射光学材料，直到激光辐射在光学材料中引起的快速损伤饱和为止; 随后在用激发辐射照射光学材料期间和/或之后立即测量光学材料的荧光，并确定所测量的荧光中存在的非固有荧光和固有荧光。 可以根据非固有荧光量与固有荧光的比率来确定适宜性。 还提供了一种用于执行包括阻挡散射激发辐射的屏障装置的方法的装置。
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5.发明授权Determining the suitability of an optical material for the production of optical elements, corresponding device, and use of said material 有权确定用于制造光学元件的光学材料的适用性，相应的装置以及所述材料的使用公开(公告)号：US07256887B2
公开(公告)日：2007-08-14
申请号：US10527850
申请日：2003-09-16
IPC分类号： G01N21/64
CPC分类号： G01N21/6402
摘要： The method tests the suitability of an optical material having a radiation-induced absorption, especially of an alkali or alkaline earth halide, for production of an optical element exposed to high-energy irradiation. The method includes pre-irradiating the optical material with laser radiation until rapid damage induced in the optical material with the laser radiation is saturated; subsequently measuring fluorescence of the optical material during and/or immediately after irradiating the optical material with excitation radiation and determining the non-intrinsic fluorescence and intrinsic fluorescence present in the measured fluorescence. Suitability may be preferably determined according to a ratio of the amount of non-intrinsic fluorescence to intrinsic fluorescence. A device for performing the method including a barrier device for blocking scattered excitation radiation is also provided.
摘要翻译： 该方法测试具有辐射诱发吸收的光学材料，特别是碱金属或碱土金属卤化物的光学材料适用于生产暴露于高能辐射的光学元件。 该方法包括用激光辐射预先照射光学材料，直到激光辐射在光学材料中引起的快速损伤饱和为止; 随后在用激发辐射照射光学材料期间和/或之后立即测量光学材料的荧光，并确定所测量的荧光中存在的非固有荧光和固有荧光。 可以根据非固有荧光量与固有荧光的比率来确定适宜性。 还提供了一种用于执行包括阻挡散射激发辐射的屏障装置的方法的装置。
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6.发明授权Method of testing optical materials by irradiating with high energy density radiation, optical materials selected by said method and uses thereof 有权通过用高能量密度辐射照射光学材料，通过所述方法选择的光学材料及其用途来测试光学材料的方法公开(公告)号：US07742156B2
公开(公告)日：2010-06-22
申请号：US12398402
申请日：2009-03-05
IPC分类号： G01N21/00
CPC分类号： G01N21/64 , G01N21/33 , G01N2021/1736
摘要： An optical material for lithographic applications is selected from crystal materials by a testing method. The crystal materials are preferably quartz and/or alkali or alkaline earth halides, especially fluorides, or mixed crystals. The testing method includes three tests to measure irreversible radiation damage: 1) the optical material is irradiated with ultraviolet radiation at 193 nm and the non-intrinsic fluorescence intensity at 740 nm is measured; 2) the optical material is irradiated with high energy density laser light and a change in respective absorptions before and after irradiation at 385 nm is measured; and 3) the optical material is irradiated with an X-ray or radioactive source to form all possible color centers and a difference of respective surface integrals of corresponding absorption spectra in ultraviolet spectral and/or visible spectral regions is measured before and after irradiation.
摘要翻译： 用于光刻应用的光学材料通过测试方法从晶体材料中选择。 晶体材料优选为石英和/或碱金属或碱土金属卤化物，特别是氟化物或混晶。 测试方法包括测量不可逆辐射损伤的三个测试：1）用193nm的紫外线照射光学材料，测量740nm处的非固有荧光强度; 2）用高能量密度激光照射光学材料，并测量在385nm照射前后各自吸收的变化; 和3）用X射线或放射源照射光学材料以形成所有可能的色心，并且在照射之前和之后测量在紫外光谱和/或可见光谱区域中相应吸收光谱的各自表面积分的差异。
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公开(公告)号：US20060268279A1
公开(公告)日：2006-11-30
申请号：US11440925
申请日：2006-05-25
申请人： Gordon Goenna , Karin Poehl , Regina Martin , Lutz Parthier
发明人： Gordon Goenna , Karin Poehl , Regina Martin , Lutz Parthier
CPC分类号： G01N21/64 , G01N21/33 , G01N2021/1736
摘要： The method determines the extent of irreversible radiation damage of an optical material. The method includes the following three tests to determine the extent of irreversible radiation damage: 1) the optical material is irradiated with ultraviolet radiation at a wavelength of 193 nm and the non-intrinsic fluorescence intensity at a wavelength of 740 nm is measured; 2) the optical material is irradiated with high energy laser light and a change in respective absorptions at a wavelength of 385 nm is determined before and after irradiation; and 3) the optical material is irradiated with an energetic radiation source to form all possible color centers and a difference of respective surface integrals of corresponding absorption spectra in ultraviolet spectral and/or visible spectral regions is measured before and after irradiation.
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8.发明申请METHOD FOR QUANTITATIVE DETERMINATION OF THE SUITABILITY OF CRYSTALS FOR OPTICAL COMPONENTS EXPOSED TO HIGH ENERGY DENSITIES, CRYSTALS GRADED IN THIS WAY AND USES THEREOF 有权用于量化确定暴露于高能量密度的光学部件的晶体适用性的方法，以此方式分级的晶体及其用途公开(公告)号：US20100001208A1
公开(公告)日：2010-01-07
申请号：US11558728
申请日：2006-11-10
IPC分类号： G01N21/64
CPC分类号： G01N21/6402 , G01N21/6489
摘要： A method is described for quantitative determination of suitability of an optical material, especially alkali halide and alkaline earth halide single crystals, for optical components exposed to high energy densities, especially of pulsed laser light at wavelengths under 250 nm. In this procedure radiation-dependent transmission of the optical material is determined at ultraviolet wavelengths by fluorescence measurements for fluorescence induced by ultraviolet radiation at these ultraviolet wavelengths. This is accomplished by a method including determining an induced fluorescence maximum of a non-linear absorption process, measuring a slope (|dT/dH|) of a functional relationship representing the dependence of the radiation-dependent transmission on fluence (H) for the induced fluorescence and determining radiation-dependent transmissions from this slope for particular fluence values.
摘要翻译： 描述了用于定量测定暴露于高能量密度的光学部件，特别是波长在250nm以下的脉冲激光的光学材料，特别是碱金属卤化物和碱土卤化物单晶的适用性的方法。 在该过程中，通过在这些紫外线波长处的紫外线辐射诱导的荧光的荧光测量，在紫外线波长处确定光学材料的辐射相关透射。 这通过一种方法来实现，该方法包括确定非线性吸收过程的诱导荧光最大值，测量代表辐射依赖透射率对注射能量（H）的依赖性的函数关系的斜率（| dT / dH |） 诱导荧光并确定该斜率的辐射依赖传输，以获得特定的注量值。
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9.发明授权Method for quantitative determination of the suitability of crystals for optical components exposed to high energy densities, crystals graded in this way and uses thereof 有权用于定量测定暴露于高能量密度的光学部件的晶体的适应性的方法，以这种方式分级的晶体及其用途公开(公告)号：US07170069B2
公开(公告)日：2007-01-30
申请号：US10909896
申请日：2004-08-02
IPC分类号： G01N21/64
CPC分类号： G01N21/6402 , G01N21/6489
摘要： A method is described for quantitative determination of suitability of an optical material, especially alkali halide and alkaline earth halide single crystals, for optical components exposed to high energy densities, especially of pulsed laser light at wavelengths under 250 nm. In this procedure radiation-dependent transmission of the optical material is determined at ultraviolet wavelengths by fluorescence measurements for fluorescence induced by ultraviolet radiation at these ultraviolet wavelengths. This is accomplished by a method including determining an induced fluorescence maximum of a non-linear absorption process, measuring a slope (|dT/dH|) of a functional relationship representing the dependence of the radiation-dependent transmission on fluence (H) for the induced, fluorescence and determining radiation-dependent transmissions from this slope for particular fluence values.
摘要翻译： 描述了用于定量测定暴露于高能量密度的光学部件，特别是波长在250nm以下的脉冲激光的光学材料，特别是碱金属卤化物和碱土卤化物单晶的适用性的方法。 在该过程中，通过在这些紫外线波长处的紫外线辐射诱导的荧光的荧光测量，在紫外线波长处确定光学材料的辐射相关透射。 这通过一种方法来实现，该方法包括确定非线性吸收过程的诱导荧光最大值，测量代表辐射依赖透射率对注射能量（H）的依赖性的函数关系的斜率（| dT / dH |） 诱导，荧光和确定来自该斜率的辐射依赖传输，以获得特定的注量值。
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10.发明申请Method for quantitative determination of the suitability of crystals for optical components exposed to high energy densities, crystals graded in this way and uses thereof 有权用于定量测定暴露于高能量密度的光学部件的晶体的适应性的方法，以这种方式分级的晶体及其用途公开(公告)号：US20050029470A1
公开(公告)日：2005-02-10
申请号：US10909896
申请日：2004-08-02
CPC分类号： G01N21/6402 , G01N21/6489
摘要： A method is described for quantitative determination of suitability of an optical material, especially alkali halide and alkaline earth halide single crystals, for optical components exposed to high energy densities, especially of pulsed laser light at wavelengths under 250 nm. In this procedure radiation-dependent transmission of the optical material is determined at ultraviolet wavelengths by fluorescence measurements for fluorescence induced by ultraviolet radiation at these ultraviolet wavelengths. This is accomplished by a method including determining an induced fluorescence maximum of a non-linear absorption process, measuring a slope (|dT/dH|) of a functional relationship representing the dependence of the radiation-dependent transmission on fluence (H) for the induced, fluorescence and determining radiation-dependent transmissions from this slope for particular fluence values.
摘要翻译： 描述了用于定量测定暴露于高能量密度的光学部件，特别是波长在250nm以下的脉冲激光的光学材料，特别是碱金属卤化物和碱土卤化物单晶的适用性的方法。 在该过程中，通过在这些紫外线波长处的紫外线辐射诱导的荧光的荧光测量，在紫外线波长处确定光学材料的辐射相关透射。 这通过一种方法来实现，该方法包括确定非线性吸收过程的诱导荧光最大值，测量代表辐射依赖传播对能量密度（H）的依赖性的函数关系的斜率（| dT / dH |） 诱导，荧光和确定来自该斜率的辐射依赖传输，以获得特定的注量值。
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