公开(公告)号：US20230086284A1

公开(公告)日：2023-03-23

申请号：US17908001

申请日：2021-01-15

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Masahiro KOTANI ,  Takayuki OHMURA ,  Akira TASHIRO

IPC: H01J49/04

Abstract: A sample support used for ionizing a component of a sample includes: a substrate having a first surface, a second surface opposite the first surface, and a plurality of through-holes that are open on the first surface and on the second surface; a conductive layer provided on at least the first surface; and a cationizing agent provided in the plurality of through-holes to cationize the component with a predetermined atom.

公开(公告)号：US20220199387A1

公开(公告)日：2022-06-23

申请号：US17439431

申请日：2020-01-23

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Masahiro KOTANI ,  Takayuki OHMURA ,  Akira TASHIRO

IPC: H01J49/04

Abstract: A sample support body for ionization of a sample, including: a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface; a conductive layer provided on the first surface; and a matrix crystal layer provided on at least one of the conductive layer and the second surface, in which the matrix crystal layer is formed of a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.

公开(公告)号：US20230290625A1

公开(公告)日：2023-09-14

申请号：US18018314

申请日：2021-06-01

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Takamasa IKEDA ,  Masahiro KOTANI ,  Akira TASHIRO ,  Takayuki OHMURA

IPC: H01J49/04 ,  H01J49/16 ,  H01J49/00

CPC classification number: H01J49/0409 ,  H01J49/165 ,  H01J49/0031 ,  H01J49/26

Abstract: A sample support is a sample support for ionizing a sample. The sample support includes a substrate that includes a first surface having electrical insulating property, a second surface opposite to the first surface, and an irregular porous structure that opens to at least the first surface.

公开(公告)号：US20230114331A1

公开(公告)日：2023-04-13

申请号：US17908105

申请日：2021-01-15

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Masahiro KOTANI ,  Takayuki OHMURA ,  Akira TASHIRO

IPC: H01J49/04 ,  H01J49/16

Abstract: A sample support used for ionizing a component of a sample includes: a substrate having a first surface, a second surface opposite the first surface, and a plurality of through-holes that are open on the first surface and on the second surface; a conductive layer provided on at least the first surface; and an anionizing agent provided in the plurality of through-holes to anionize the component.

公开(公告)号：US20230411133A1

公开(公告)日：2023-12-21

申请号：US18037346

申请日：2021-10-14

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Masahiro KOTANI ,  Takayuki OHMURA ,  Akira TASHIRO

IPC: H01J49/04

CPC classification number: H01J49/0409

Abstract: A sample support body includes a substrate and a porous layer provided on the substrate and having a surface opposite the substrate. The porous layer includes a body layer having a plurality of holes open to a surface of the porous layer. Each of the plurality of holes includes an extension portion extending in a thickness direction of the substrate and an opening widened from an end of the extension portion on a surface side toward the surface. An average value of the depths of the plurality of holes is 3 μm or more and 100 μm or less. A value obtained by dividing the average value of the depths by an average value of the widths of the plurality of holes is 9 or more and 2500 or less.

公开(公告)号：US20220223396A1

公开(公告)日：2022-07-14

申请号：US17623767

申请日：2020-04-01

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Akira TASHIRO ,  Masahiro KOTANI ,  Takayuki OHMURA

IPC: H01J49/04 ,  H01J49/00

Abstract: A sample support is used for ionization of a sample. The sample support includes a film part having a first front surface and a first back surface, the film part being formed with a plurality of through-holes, and a support part defining a measurement region for ionizing the sample with respect to the film part and supporting the film part. The support part includes an inner portion having a second front surface and a second back surface, the film part being fixed to the inner portion, and an outer portion having a third front surface and a third back surface and extending along an outer edge of the inner portion. A difference generated between a position of the first front surface and a position of the third front surface in a thickness direction of the film part is smaller than a thickness of the film part.

公开(公告)号：US20220157588A1

公开(公告)日：2022-05-19

申请号：US17439049

申请日：2019-12-11

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Masahiro KOTANI ,  Takayuki OHMURA ,  Akira TASHIRO

IPC: H01J49/04 ,  H01J49/16 ,  G01N27/623 ,  B01L3/02

Abstract: The sample support includes a substrate having a plurality of through holes opened in a first surface and a second surface, a frame surrounding a measurement region of the substrate and supporting the substrate when viewed in a thickness direction of the substrate, and a protective layer disposed to face the first surface and having a facing portion facing the measurement region. A through hole penetrating in the thickness direction is formed in the facing portion. The through hole of the facing portion includes a narrow portion having a width smaller than an outer diameter of a tip of a pipette tip for dropping a sample solution into the measurement region.

公开(公告)号：US20230420237A1

公开(公告)日：2023-12-28

申请号：US18037383

申请日：2021-09-17

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Masahiro KOTANI ,  Takayuki OHMURA ,  Akira TASHIRO

IPC: H01J49/04

CPC classification number: H01J49/0418 ,  H01J49/40

Abstract: A sample support body is used for ionizing a component of a sample. The sample support body includes: a substrate; a porous layer provided on the substrate and having a front surface on a side opposite to the substrate; and a partition portion partitioning the front surface into a first region and a second region. The porous layer includes a main body layer having a plurality of holes opening to the front surface. The partition portion includes a partition groove formed on the front surface so as to pass between the first region and the second region.

公开(公告)号：US20230253196A1

公开(公告)日：2023-08-10

申请号：US18015804

申请日：2021-05-10

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Akira TASHIRO ,  Takayuki OHMURA ,  Masahiro KOTANI ,  Takamasa IKEDA

IPC: H01J49/04

CPC classification number: H01J49/0418

Abstract: A sample support used for sample component ionization includes: a substrate having a first surface and a plurality of holes opening to the first surface; and a conductive layer provided on the first surface so as not to block the hole, in which the conductive layer is configured by a plurality of nanoparticles and has a thickness of 30 nm or more.

公开(公告)号：US20230131548A1

公开(公告)日：2023-04-27

申请号：US17913211

申请日：2021-01-14

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Akira TASHIRO ,  Masahiro KOTANI ,  Takayuki OHMURA

IPC: G03F7/09 ,  G03F7/004 ,  G03F7/16

Abstract: A sample support includes: a substrate having a plurality of through-holes opening on a first surface and on a second surface; a first member having a plurality of first openings and disposed on the first surface; a second member having a plurality of second openings and disposed on the second surface, and; a bonding member disposed between the first member and the second member; and a conductive layer integrally provided on a region of the second surface corresponding to each of the plurality of second openings. The plurality of through-holes include a plurality of first through-holes located between each of the plurality of first openings and each of the plurality of second openings, and a plurality of second through-holes located between the first member and the second member. Each of the plurality of second openings communicate with each of the plurality of first openings through the plurality of first through-holes.