SOLID IMMERSION LENS UNIT AND SEMICONDUCTOR INSPECTION DEVICE

    公开(公告)号:US20220326501A1

    公开(公告)日:2022-10-13

    申请号:US17634036

    申请日:2020-07-16

    Abstract: A solid immersion lens unit includes a solid immersion lens and a holder for swingably holding the solid immersion lens. The solid immersion lens includes a first lens portion formed of a first material, and a second lens portion formed of a second material having a refractive index smaller than a refractive index of the first material and coupled to the first lens portion. The first lens portion includes a contact surface for contacting with an observation object and a convex first spherical surface. The second lens portion includes a concave second spherical surface facing the first spherical surface and a convex third spherical surface to be disposed to face an objective lens. The holder has a contact portion configured to be contactable with the third spherical surface.

    SEMICONDUCTOR INSPECTING METHOD AND SEMICONDUCTOR INSPECTING DEVICE

    公开(公告)号:US20230206422A1

    公开(公告)日:2023-06-29

    申请号:US17925625

    申请日:2021-03-31

    Abstract: A semiconductor inspecting method according to an embodiment includes a step of scanning a semiconductor device with laser light to acquire characteristic information indicative of characteristics of an electrical signal of the semiconductor device in response to irradiation with the laser light for each of irradiation positions of the laser light and to generate a first pattern image of the semiconductor device based on characteristic information for each of irradiation positions, a step of generating a second pattern image of the semiconductor device based on a layout image of the semiconductor device and current path information indicative of a current path in the semiconductor device, and a step of acquiring matching information indicative of a relative relationship between the first pattern image and the layout image based on a result of positional alignment between the first pattern image and the second pattern image.

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