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公开(公告)号:US20220326501A1
公开(公告)日:2022-10-13
申请号:US17634036
申请日:2020-07-16
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor: Tomonori NAKAMURA , Ikuo ARATA , Xiangguang MAO
Abstract: A solid immersion lens unit includes a solid immersion lens and a holder for swingably holding the solid immersion lens. The solid immersion lens includes a first lens portion formed of a first material, and a second lens portion formed of a second material having a refractive index smaller than a refractive index of the first material and coupled to the first lens portion. The first lens portion includes a contact surface for contacting with an observation object and a convex first spherical surface. The second lens portion includes a concave second spherical surface facing the first spherical surface and a convex third spherical surface to be disposed to face an objective lens. The holder has a contact portion configured to be contactable with the third spherical surface.
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公开(公告)号:US20230206422A1
公开(公告)日:2023-06-29
申请号:US17925625
申请日:2021-03-31
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor: Akira SHIMASE , Xiangguang MAO , Akihito UCHIKADO
IPC: G06T7/00 , G06V10/764 , G01R31/308
CPC classification number: G06T7/001 , G01R31/308 , G06V10/764 , G06T2207/10024 , G06T2207/20081 , G06T2207/20212 , G06T2207/30148
Abstract: A semiconductor inspecting method according to an embodiment includes a step of scanning a semiconductor device with laser light to acquire characteristic information indicative of characteristics of an electrical signal of the semiconductor device in response to irradiation with the laser light for each of irradiation positions of the laser light and to generate a first pattern image of the semiconductor device based on characteristic information for each of irradiation positions, a step of generating a second pattern image of the semiconductor device based on a layout image of the semiconductor device and current path information indicative of a current path in the semiconductor device, and a step of acquiring matching information indicative of a relative relationship between the first pattern image and the layout image based on a result of positional alignment between the first pattern image and the second pattern image.
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公开(公告)号:US20210333216A1
公开(公告)日:2021-10-28
申请号:US17264588
申请日:2019-04-09
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor: Xiangguang MAO , Masanori KOBAYASHI , Hirotoshi TERADA , Ikuo ARATA , Masataka IKESU
Abstract: A solid immersion lens unit includes a solid immersion lens having a contact surface for coming into contact with semiconductor device formed of a silicon substrate and a spherical surface to be disposed to face an objective lens; a holder holding the solid immersion lens; and an optical element held by the holder to be positioned between the objective lens and the solid immersion lens. The solid immersion lens transmits light having at least a part of wavelength in a range of 200 nm or greater and 1100 nm or lower. The optical element corrects aberration caused by a difference in refractive indices between the silicon substrate and the solid immersion lens.
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