公开(公告)号：US20240274328A1

公开(公告)日：2024-08-15

申请号：US18509553

申请日：2023-11-15

Applicant: HANA MATERIALS INC.

Inventor： Je Guen YU ,  Yong Uk KIM ,  Je Hee LEE ,  TAE GUN HAN ,  Eun Young LEE ,  Wang Ki CHOI

IPC: H01B17/58 ,  H01J37/32

CPC classification number: H01B17/583 ,  H01J37/32541 ,  H01J37/32568

Abstract: Provided is a bush insert coupled to a plasma electrode plate. The bush insert is configured to provide an insert inner hole that passes through the bush insert in a first direction, an inner surface of the bush insert that defines the insert inner hole is configured to provide a female screw structure, and an outer surface of the bush insert has a non-circular shape in a plan view.

公开(公告)号：US20240038503A1

公开(公告)日：2024-02-01

申请号：US18354022

申请日：2023-07-18

Applicant: HANA MATERIALS INC.

Inventor： Je Guen YU ,  Aran AN ,  Wang Ki CHOI ,  Eun Young LEE

IPC: H01J37/32

CPC classification number: H01J37/32642 ,  H01J37/32807 ,  H01J2237/3341

Abstract: A focus ring and a method for manufacturing the same. The focus ring include a first ring made of a first material, a second ring covered by the first ring, wherein the second ring is made of a second material different from the first material, and a fastening member configured to couple the first ring to the second ring. The fastening member includes a through-part configured to pass through the second ring and a buried part buried in a lower portion of the first ring. The through-part has a first diameter, and the buried part has a second diameter greater than or equal to the first diameter.