公开(公告)号：US20150206708A1

公开(公告)日：2015-07-23

申请号：US14601446

申请日：2015-01-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masashi MURAMATSU ,  Tomokazu KOZAKAI ,  Fumio ARAMAKI

IPC: H01J37/304 ,  H01J37/28 ,  G21K5/02

CPC classification number: H01J37/304 ,  G21K5/02 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/2806 ,  H01J2237/317

Abstract: A charged particle beam apparatus is provided with: a charged particle beam column configured to irradiate a charged particle beam; and a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region.

Abstract translation: 带电粒子束装置具有：被配置成照射带电粒子束的带电粒子束柱; 以及控制器，其被配置为控制所述带电粒子束列以第一像素间隔照射所述带电粒子束用于第一区域，并且对于包含在所述第一区域中的第二区域以不同于所述第一像素间隔的第二像素间隔照射所述带电粒子束 第一个地区。