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    CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR FORMING OBSERVATION IMAGE
    2.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR FORMING OBSERVATION IMAGE 有权
    充电颗粒光束装置和形成观察图像的方法

    公开(公告)号：US20140291509A1

    公开(公告)日：2014-10-02

    申请号：US14217990

    申请日：2014-03-18

    申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

    发明人： Tomokazu KOZAKAI ,  Fumio ARAMAKI ,  Osamu MATSUDA

    IPC分类号： G01N23/225

    CPC分类号： G01N23/2251 ,  H01J37/265 ,  H01J37/28

    摘要： A focused ion beam apparatus includes a lens interferometer configured to detect a relative position of an ion beam column and a sample. An image forming section includes an irradiation position specifying section configured to specify an irradiation position of an ion beam based on the detected relative position of the ion beam column and the sample, and a luminance setting section configured to set luminance of a pixel of an observation image based on the specified irradiation position of the ion beam and a detected amount of secondary particles.

    摘要翻译： 聚焦离子束装置包括被配置为检测离子束柱和样品的相对位置的透镜干涉仪。 图像形成部包括照射位置确定部，其被配置为基于检测到的离子束列和样本的相对位置来指定离子束的照射位置，以及亮度设定部，被配置为设定观察像素的亮度 基于离子束的指定照射位置的图像和二次粒子的检测量。

    FOCUSED ION BEAM SYSTEM
    3.
    发明申请
    FOCUSED ION BEAM SYSTEM 有权
    聚焦离子束系统

    公开(公告)号：US20140284474A1

    公开(公告)日：2014-09-25

    申请号：US14221514

    申请日：2014-03-21

    申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

    发明人： Yasuhiko SUGIYAMA ,  Tomokazu KOZAKAI ,  Osamu MATSUDA

    IPC分类号： H01J37/26 ,  H01J27/20

    CPC分类号： H01J37/28 ,  H01J37/08 ,  H01J37/222 ,  H01J2237/0807 ,  H01J2237/221 ,  H01J2237/2803 ,  H01J2237/31749

    摘要： A focused ion beam system includes a gas field ion source which generates gas ions, an ion gun unit which accelerates the gas ions and radiates the gas ions as an ion beam, a beam optical system which includes at least a focusing lens electrode and radiates the ion beam onto a sample, and an image acquiring mechanism which acquires an FIM image of a tip of an emitter based on the ion beam. The image acquiring mechanism includes an alignment electrode which is disposed between the ion gun unit and the focusing lens electrode and adjusts a radiation direction of the ion beam, an alignment control unit which applies an alignment voltage to the alignment electrode, and an image processing unit which combines a plurality of FIM images acquired when applying different alignment voltages to generate one composite FIM image.

    摘要翻译： 聚焦离子束系统包括产生气体离子的气体离子源，加速气体离子并将气体离子作为离子束辐射的离子枪单元，包括至少聚焦透镜电极的射束光学系统， 离子束到样品，以及图像获取机构，其基于离子束获取发射器的尖端的FIM图像。 图像获取机构包括配置在离子枪单元和聚焦透镜电极之间并调整离子束的辐射方向的取向电极，向对准电极施加取向电压的取向控制单元和图像处理单元 其组合当应用不同对准电压时获得的多个FIM图像以生成一个复合FIM图像。

    METHOD FOR FABRICATING EMITTER
    4.
    发明申请
    METHOD FOR FABRICATING EMITTER 审中-公开
    制造发电机的方法

    公开(公告)号：US20140246397A1

    公开(公告)日：2014-09-04

    申请号：US14278760

    申请日：2014-05-15

    申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

    发明人： Yasuhiko SUGIYAMA ,  Kazuo AITA ,  Fumio ARAMAKI ,  Tomokazu KOZAKAI ,  Osamu MATSUDA ,  Anto YASAKA

    IPC分类号： H01J27/02

    CPC分类号： H01J27/02 ,  H01J1/15 ,  H01J1/3044 ,  H01J9/02 ,  H01J9/025 ,  H01J9/04 ,  H01J37/08 ,  H01J37/26 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31749

    摘要： A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward a tip portion thereof; performing a first etching in which the electrolytically polished part of the emitter material is irradiated with a charged-particle beam to form a pyramid-like sharpened part having a vertex including the tip portion; performing a second etching in which the tip portion is further sharpened through field-assisted gas etching, while observing a crystal structure at the tip portion by a field ion microscope and keeping the number of atoms at a leading edge of the tip portion at a predetermined number or less; and heating the emitter material to arrange the atoms at the leading edge of the tip portion of the sharpened part in a pyramid shape.

    摘要翻译： 一种用于制造尖锐的针状发射体的方法，该方法包括：电解抛光导电发射体材料的端部，使其朝其尖端部分逐渐变细; 进行第一蚀刻，其中用电荷粒子束照射发射体材料的电解抛光部分以形成具有包括尖端部分的顶点的棱锥状的锐化部分; 进行第二蚀刻，其中尖端部分通过场辅助气体蚀刻进一步锐化，同时通过场离子显微镜观察尖端部分处的晶体结构，并将尖端部分的前缘处的原子数保持在预定的 数量以下 并且加热发射体材料以将原子布置在尖锐部分的尖端部分的金字塔形状。

    METHOD OF MANUFACTURING EMITTER, EMITTER, AND FOCUSED ION BEAM APPARATUS
    7.
    发明申请
    METHOD OF MANUFACTURING EMITTER, EMITTER, AND FOCUSED ION BEAM APPARATUS 审中-公开

    公开(公告)号：US20200312603A1

    公开(公告)日：2020-10-01

    申请号：US16785373

    申请日：2020-02-07

    申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

    发明人： Tomokazu KOZAKAI ,  Yoshimi KAWANAMI ,  Hiroyuki MUTOH ,  Yoko NAKAJIMA ,  Hironori MORITANI ,  Shinichi MATSUBARA

    IPC分类号： H01J37/08 ,  H01J37/305 ,  H01J9/02 ,  H01J37/10

    摘要： A method of manufacturing an emitter is disclosed. The method enables a crystal structure of the tip of the front end of the emitter to return to its original state with high reproducibility by rearranging atoms in a treatment, and enables a long lasting emitter to be attained by suppressing extraction voltage rise after the treatment. As a method of manufacturing an emitter having a sharpened needle-shape, the method includes: performing an electropolishing process for the front end of an emitter material having conductivity to taper toward the front end; and performing an etching to make the number of atoms constituting the tip of the front end be a predetermined number or less by further sharpening the front end through an electric field-induced gas etching having constantly applied voltage, while observing the crystal structure of the front end, by a field ion microscope, in a sharp portion having the front end at its apex.

    MASK REPAIR APPARATUS AND METHOD FOR REPAIRING MASK
    8.
    发明申请
    MASK REPAIR APPARATUS AND METHOD FOR REPAIRING MASK 审中-公开

    公开(公告)号：US20200310245A1

    公开(公告)日：2020-10-01

    申请号：US16817249

    申请日：2020-03-12

    申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

    发明人： Tomokazu KOZAKAI ,  Fumio ARAMAKI ,  Osamu MATSUDA ,  Kensuke SHIINA

    IPC分类号： G03F1/72 ,  G03F1/22 ,  G03F7/20

    摘要： The present disclosure relates to a mask repair apparatus capable of efficiently repairing a defect of a target EUVL mask. The mask repair apparatus repairs the defect of the target extreme ultra violet lithography (EUVL) mask having a reflective layer, a first layer disposed on the reflective layer, and a second layer disposed on the first layer, and a third layer disposed on the second layer. The mask repair apparatus performs etching of the third layer by a first etching method, and after the etching of the third layer by the first etching method, performs etching of the second layer by the second etching method different from the first etching method.

    FOCUSED ION BEAM APPARATUS
    9.
    发明申请
    FOCUSED ION BEAM APPARATUS 有权
    聚焦离子束设备

    公开(公告)号：US20160225574A1

    公开(公告)日：2016-08-04

    申请号：US15010231

    申请日：2016-01-29

    申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

    发明人： Anto YASAKA ,  Tomokazu KOZAKAI ,  Osamu MATSUDA ,  Yasuhiko SUGIYAMA ,  Kazuo AITA ,  Fumio ARAMAKI ,  Hiroshi OBA

    IPC分类号： H01J37/08

    CPC分类号： H01J37/08 ,  H01J2237/0807

    摘要： Disclosed herein is a focused ion beam apparatus equipped with a gas field ion source that can produce a focused ion beam for a long period of time by stably and continuously emitting ions from the gas field ion source having high luminance, along an optical axis of an ion-optical system for a long period of time. In the focused ion beam apparatus equipped with a gas field ion source having an emitter for emitting ions, the emitter has a shape in which sharpened iridium is fixed to dissimilar wire.

    摘要翻译： 本发明公开了一种配备有气体离子源的聚焦离子束装置，其可以通过从具有高亮度的气体离子源稳定且连续地发射离子而长时间地产生聚焦离子束，沿着 离子光学系统长时间使用。 在配备有具有用于发射离子的发射极的气体离子源的聚焦离子束装置中，发射体具有将锐化的铱固定在不同的线上的形状。

    FOCUSED ION BEAM APPARATUS
    10.
    发明申请
    FOCUSED ION BEAM APPARATUS 审中-公开
    聚焦离子束设备

    公开(公告)号：US20150162160A1

    公开(公告)日：2015-06-11

    申请号：US14591843

    申请日：2015-01-07

    申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

    发明人： Anto YASAKA ,  Fumio ARAMAKI ,  Yasuhiko SUGIYAMA ,  Tomokazu KOZAKAI ,  Osamu MATSUDA

    IPC分类号： H01J27/02 ,  H01J27/26

    CPC分类号： H01J27/024 ,  H01J27/26 ,  H01J37/08 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/182

    摘要： A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. The surface of the emitter is formed of a precious metal, such as platinum, palladium, iridium, rhodium or gold. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter.

    摘要翻译： 聚焦离子束装置具有离子源室，其中设置有用于发射离子的发射极。 发射体的表面由贵金属形成，例如铂，钯，铱，铑或金。 气体供给单元向离子源室供给氮气，使得氮气吸附在发射体的表面。 提取电极与发射极间隔开，并向提取电极施加电压，使吸附的氮气离子化，并以离子束形式提取氮离子。 温度控制单元控制发射器的温度。