公开(公告)号：US20180269026A1

公开(公告)日：2018-09-20

申请号：US15761294

申请日：2015-09-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Shahedul HOQUE ,  Hajime KAWANO ,  Yoshinori MOMONOI ,  Hideki ITAI ,  Minoru YAMAZAKI ,  Hiroshi NISHIHAMA

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/26 ,  G02B21/00

Abstract: The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction. After scanning the second scan line, the charged particle beam device scans the interior of a first frame by repeating the scan line position modification and the scanning of the charged particle beam toward the opposite direction. After scanning the first frame, the charged particle beam device starts the scanning of a second frame with the scan ending point contained within the first frame serving as the scan starting point.

公开(公告)号：US20180374674A1

公开(公告)日：2018-12-27

申请号：US16118891

申请日：2018-08-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideki ITAI ,  Kumiko SHIMIZU ,  Wataru MORI ,  Hajime KAWANO ,  Shahedul HOQUE

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/22

Abstract: A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m≥1), the number m of frames being smaller than the number n of frames.

公开(公告)号：US20130343649A1

公开(公告)日：2013-12-26

申请号：US13791469

申请日：2013-03-08

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hideki ITAI ,  Zhigang WANG ,  Kazunari ASAO

IPC: G06K9/46

CPC classification number: G06K9/4647 ,  G01N23/2254 ,  G01N2223/42 ,  G06T5/007 ,  G06T2207/10061

Abstract: In order to solve the problem that the resolution of a back-scattered electron image without a contrast difference between materials with close atomic numbers is low, an image processing apparatus that performs an image process on a back-scattered electron image as an input image includes: a material peak detection unit that determines a peak luminance value with a peak of a frequency of a luminance histogram based on a luminance value obtained for each measurement position by using the input image as an input and information about material-dependent back-scattered electron generation efficiency, and that outputs the peak luminance value for each material; and an image information adjustment unit that emphasizes a material-dependent contrast on the basis of the input image and the peak luminance value for each material.

Abstract translation: 为了解决在近原子序号的材料之间没有对比度差异的背散射电子图像的分辨率低的问题，对作为输入图像的背散射电子图像进行图像处理的图像处理装置包括 ：材料峰值检测单元，其基于通过使用输入图像作为输入而获得的针对每个测量位置的亮度值来确定具有亮度直方图的频率的峰值的峰值亮度值以及关于材料依赖的反向散射电子的信息 产生效率，并输出每种材料的峰值亮度值; 以及图像信息调整单元，其基于输入图像和每种材料的峰值亮度值强调与材料相关的对比度。

公开(公告)号：US20190295815A1

公开(公告)日：2019-09-26

申请号：US16291070

申请日：2019-03-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasunori TAKASUGI ,  Satoru YAMAGUCHI ,  Kei SAKAI ,  Hideki ITAI ,  Yoshinori MOMONOI ,  Toshimasa KAMEDA ,  Yoshihiro KIMURA

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/12

Abstract: Provided is a charged particle beam apparatus, aiming at obtaining an image and the like focused on the sample surface and the bottom while preventing the visual field deviation occurred when focusing on the sample surface and the bottom respectively. The charged particle beam apparatus forms a first image (301), which is based on detection of the first energy charged particles, based on an irradiation with a beam whose focus is adjusted on a sample surface side, forms a second image (304) which is based on detection of second energy charged particles having a relatively higher energy than the first energy and a third image (303) which is based on the detection of the first energy charged particles, based on the irradiation with a beam whose focus is adjusted on a bottom side of a pattern included in the sample, acquires a deviation between the first image and the third image, and composes the first image and the second image so as to correct the deviation.

公开(公告)号：US20190035600A1

公开(公告)日：2019-01-31

申请号：US16071816

申请日：2016-01-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Kei SAKAI ,  Satoru YAMAGUCHI ,  Hideki ITAI ,  Yasunori TAKASUGI ,  Kumiko SHIMIZU

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/22

Abstract: The objective of the present invention is to provide a charged particle beam device for setting, from an image of a trench-like groove or a pit, device conditions for finding a hole or the like provided in the trench or the pit, or measuring a hole or the like provided inside the trench or the like with high accuracy. In the present invention, a charged particle beam device comprises: a deflector for causing a charged particle beam emitted from a charged particle source to perform a scan; a detector for detecting a charged particle obtained on the basis of the scanning of the charged particle beam; and a computation processing device for generating an image on the basis of the output of the detector. In the charged particle beam device, the computation processing device specifies, from within the generated image, a relatively dark region with respect to other parts thereof, and controls the deflector in such a manner that the charged particle beam selectively scans a sample position corresponding to the dark region.

公开(公告)号：US20170323763A1

公开(公告)日：2017-11-09

申请号：US15329468

申请日：2015-07-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideki ITAI ,  Kumiko SHIMIZU ,  Wataru MORI ,  Hajime KAWANO ,  Shahedul HOQUE

IPC: H01J37/28 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/147 ,  H01J37/1474 ,  H01J37/22 ,  H01J2237/221 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: The purpose of the present invention is to provide a charged particle beam device with which it is possible to minimize the beam irradiation amount while maintaining a high measurement success rate. The present invention is a charged particle beam device provided with a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m≧1), the number m of frames being smaller than the number n of frames.