公开(公告)号：US20190121113A1

公开(公告)日：2019-04-25

申请号：US16221739

申请日：2018-12-17

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasunori TAKASUGI ,  Kei SAKAI ,  Satoru YAMAGUCHI ,  Kazuyuki HIRAO

IPC: G02B21/36 ,  G01B15/04 ,  G02B21/00 ,  G06T7/32 ,  H01J37/28 ,  G01B15/00 ,  G06K9/62

Abstract: An image forming device is provided that is capable of forming a proper integrated signal even when an image or a signal waveform is acquired from a pattern having the possibility of preventing proper matching, such as a repetition pattern, a shrinking pattern, and the like. In particular, the image forming device forms an integrated image by integrating a plurality of image signals and is provided with: a matching processing section that performs a matching process between the plurality of image signals; an image integration section that integrates the plurality of image signals for which positioning has been performed by the matching processing section; and a periodicity determination section that determines a periodicity of a pattern contained in the image signals. The matching processing section varies a size of an image signal area for the matching in accordance with a determination by the periodicity determination section.

公开(公告)号：US20180012349A1

公开(公告)日：2018-01-11

申请号：US15545067

申请日：2015-01-23

Applicant: Hitachi High-Technologies Corporation

Inventor： Kei SAKAI ,  Satoru YAMAGUCHI ,  Kazuyuki HIRAO ,  Yasunori TAKASUGI

IPC: G06T7/00 ,  G03F7/20 ,  G03F1/86 ,  H01J37/22 ,  G01B15/04

CPC classification number: G06T7/0004 ,  G01B15/04 ,  G01B2210/56 ,  G03F1/86 ,  G03F7/70625 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/22 ,  H01J37/222

Abstract: The purpose of the present invention is to provide a pattern measurement apparatus that appropriately assesses patterns formed by patterning methods for forming patterns that do not exist on photomasks. In order to achieve this purpose, the present invention provides a pattern measurement apparatus comprising a processor that measures the dimensions of patterns formed on a sample by using data acquired by irradiating the sample with a beam, wherein the processor extracts pattern coordinate information on the basis of the data acquired by irradiating the sample with a beam, and uses the coordinate information to generate measurement reference data used when performing dimension measurements of the pattern.

公开(公告)号：US20190295815A1

公开(公告)日：2019-09-26

申请号：US16291070

申请日：2019-03-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasunori TAKASUGI ,  Satoru YAMAGUCHI ,  Kei SAKAI ,  Hideki ITAI ,  Yoshinori MOMONOI ,  Toshimasa KAMEDA ,  Yoshihiro KIMURA

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/12

Abstract: Provided is a charged particle beam apparatus, aiming at obtaining an image and the like focused on the sample surface and the bottom while preventing the visual field deviation occurred when focusing on the sample surface and the bottom respectively. The charged particle beam apparatus forms a first image (301), which is based on detection of the first energy charged particles, based on an irradiation with a beam whose focus is adjusted on a sample surface side, forms a second image (304) which is based on detection of second energy charged particles having a relatively higher energy than the first energy and a third image (303) which is based on the detection of the first energy charged particles, based on the irradiation with a beam whose focus is adjusted on a bottom side of a pattern included in the sample, acquires a deviation between the first image and the third image, and composes the first image and the second image so as to correct the deviation.

公开(公告)号：US20190035600A1

公开(公告)日：2019-01-31

申请号：US16071816

申请日：2016-01-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Kei SAKAI ,  Satoru YAMAGUCHI ,  Hideki ITAI ,  Yasunori TAKASUGI ,  Kumiko SHIMIZU

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/22

Abstract: The objective of the present invention is to provide a charged particle beam device for setting, from an image of a trench-like groove or a pit, device conditions for finding a hole or the like provided in the trench or the pit, or measuring a hole or the like provided inside the trench or the like with high accuracy. In the present invention, a charged particle beam device comprises: a deflector for causing a charged particle beam emitted from a charged particle source to perform a scan; a detector for detecting a charged particle obtained on the basis of the scanning of the charged particle beam; and a computation processing device for generating an image on the basis of the output of the detector. In the charged particle beam device, the computation processing device specifies, from within the generated image, a relatively dark region with respect to other parts thereof, and controls the deflector in such a manner that the charged particle beam selectively scans a sample position corresponding to the dark region.