公开(公告)号：US20130307963A1

公开(公告)日：2013-11-21

申请号：US13919249

申请日：2013-06-17

Applicant: Hitachi High-Technologies Corporation

Inventor： Kaoru SAKAI ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

IPC: G06T7/00

CPC classification number: G06T7/0004 ,  G06T7/001 ,  G06T2207/30148

Abstract: The pattern inspection apparatus of the present invention performs comparison between images of regions corresponding to patterns formed to be same patterns, thereby determining mismatch portions across the images to be defects. The apparatus includes multiple sensors that synchronously acquire images of shiftable multiple detection systems different from one another, and an image comparator section corresponding thereto. In addition, the apparatus includes a means for detecting a statistical offset value from the feature amount to be a defect, thereby properly detecting the defect even when a brightness difference is occurring in association with film a thickness difference in a wafer.

Abstract translation: 本发明的图案检查装置对与形成为相同图案的图案对应的区域的图像进行比较，从而确定跨越图像的不匹配部分为缺陷。 该装置包括同步地获取彼此不同的可移动多个检测系统的图像的多个传感器和与其对应的图像比较部分。 此外，该装置包括用于检测从特征量成为缺陷的统计偏移值的装置，从而即使当与薄膜相关的亮度差与晶片上的厚度差相关时也能适当地检测缺陷。

公开(公告)号：US20130343632A1

公开(公告)日：2013-12-26

申请号：US13846441

申请日：2013-03-18

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuta URANO ,  Akira HAMAMATSU ,  Shunji MAEDA ,  Kaoru SAKAI

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G06T2207/30148

Abstract: A pattern inspection apparatus is provided to compare images of regions, corresponding to each other, of patterns that are formed so as to be identical and judge that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.

Abstract translation: 提供了一种图案检查装置，用于将形成为相同的图案的彼此对应的区域的图像进行比较，并判断图像中的非重合部分是缺陷。 图案检查装置配备有图像比较部，其在特征空间中绘制检查对象图像的各个像素，并且将特征空间中的过度偏离的点作为缺陷进行检测。 即使图像中的相同图案由于晶片上形成的膜的厚度差而具有亮度差，因此也可以正确地检测缺陷。