Method for Pattern Measurement, Method for Setting Device Parameters of Charged Particle Radiation Device, and Charged Particle Radiation Device
    2.
    发明申请
    Method for Pattern Measurement, Method for Setting Device Parameters of Charged Particle Radiation Device, and Charged Particle Radiation Device 有权
    图案测量方法,带电粒子辐射装置的设备参数设置方法和带电粒子辐射装置

    公开(公告)号:US20150357158A1

    公开(公告)日:2015-12-10

    申请号:US14760322

    申请日:2014-01-22

    Abstract: An object of the present invention is to provide a method for pattern measurement and a charged particle radiation device in which a pattern formed by using a DSA technique can be very precisely measured and inspected. According to an aspect for achieving the object, a method for pattern measurement or a charged particle radiation device for realizing the measurement is proposed as follows. A charged particle is radiated to a polymer compound used for a self-organization lithography technique, and a specific polymer is considerably contracted as compared to the other polymer among multiple polymers forming the polymer compound. Thereafter, dimensions between multiple edges of the other polymer are measured, based on a signal obtained by scanning a region including the other polymer with the charged particle beam.

    Abstract translation: 本发明的目的是提供一种用于图案测量的方法和带电粒子辐射装置,其中可以非常精确地测量和检查使用DSA技术形成的图案。 根据实现该目的的方面,提出了用于图案测量的方法或用于实现测量的带电粒子辐射装置如下。 将带电粒子照射到用于自组织光刻技术的聚合物化合物中,与形成高分子化合物的多种聚合物中的其它聚合物相比,特定聚合物显着收缩。 此后,基于通过用带电粒子束扫描包括其它聚合物的区域而获得的信号来测量另一聚合物的多个边缘之间的尺寸。

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