公开(公告)号：US20200182804A1

公开(公告)日：2020-06-11

申请号：US16628381

申请日：2017-07-18

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta URANO ,  Toshifumi HONDA ,  Akio YAZAKI ,  Yukihiro SHIBATA ,  Hideki FUKUSHIMA ,  Yasuhiro YOSHITAKE

IPC: G01N21/956 ,  G01N21/47

Abstract: As a technique to improve processing efficiency of defect inspection by quickly adjusting a position of a detection system, provided is a defect inspection apparatus including: a stage that moves with a sample and a pattern substrate placed thereon; an illumination optical system that irradiates an object on the stage from a direction inclined from the normal direction of the pattern substrate; a first detection optical system that detects scattered light in the normal direction; a second detection optical system that detects scattered light in a direction different from the scattered light detected by the first detection optical system; a signal processing unit that processes both scattered light signals; and a control unit. The control unit implements first adjustment processing of adjusting a focal position of the first or the second detection optical system and a three-dimensional position of each detector with respect to an illumination region by using a scattered light signal and second adjustment processing of adjusting a focal point by changing a position in an optical axis direction of a detector of the first or the second detection optical system and a position in a height direction of the stage, and implements the second adjustment processing at a higher frequency than the first adjustment processing.

公开(公告)号：US20190107498A1

公开(公告)日：2019-04-11

申请号：US16080283

申请日：2016-03-02

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuta URANO ,  Yukihiro SHIBATA ,  Toshifumi HONDA ,  Yasuhiro YOSHITAKE ,  Hideki FUKUSHIMA

IPC: G01N21/956 ,  G01N21/88 ,  G01N21/47 ,  G06T7/00

Abstract: In a defect inspection device that irradiates a surface of a sample or a surface of a pattern chip with an illumination light shaped to extend in a first direction, and detects a scattered light generated from the surface of the sample or the surface of the pattern chip by the illumination light to detect a defect on the surface of the sample, the pattern chip has a dot pattern area in which multiple dots are arrayed in multiple rows and multiple columns, a minimum interval between the dots corresponding to the lines aligned in the first direction among the multiple dots arrayed in the dot pattern area in a second direction orthogonal to the first direction is smaller than a width of the illumination light, and a minimum interval between the multiple dots arrayed in the dot pattern area is larger than a resolution of the detection optical system.