公开(公告)号：US20200182804A1

公开(公告)日：2020-06-11

申请号：US16628381

申请日：2017-07-18

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta URANO ,  Toshifumi HONDA ,  Akio YAZAKI ,  Yukihiro SHIBATA ,  Hideki FUKUSHIMA ,  Yasuhiro YOSHITAKE

IPC: G01N21/956 ,  G01N21/47

Abstract: As a technique to improve processing efficiency of defect inspection by quickly adjusting a position of a detection system, provided is a defect inspection apparatus including: a stage that moves with a sample and a pattern substrate placed thereon; an illumination optical system that irradiates an object on the stage from a direction inclined from the normal direction of the pattern substrate; a first detection optical system that detects scattered light in the normal direction; a second detection optical system that detects scattered light in a direction different from the scattered light detected by the first detection optical system; a signal processing unit that processes both scattered light signals; and a control unit. The control unit implements first adjustment processing of adjusting a focal position of the first or the second detection optical system and a three-dimensional position of each detector with respect to an illumination region by using a scattered light signal and second adjustment processing of adjusting a focal point by changing a position in an optical axis direction of a detector of the first or the second detection optical system and a position in a height direction of the stage, and implements the second adjustment processing at a higher frequency than the first adjustment processing.

公开(公告)号：US20160011123A1

公开(公告)日：2016-01-14

申请号：US14773315

申请日：2014-01-20

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yukihiro SHIBATA ,  Hideki FUKUSHIMA ,  Yuta URANO ,  Toshifumi HONDA

IPC: G01N21/956 ,  G01N21/95

CPC classification number: G01N21/956 ,  G01N21/47 ,  G01N21/9501 ,  G01N2021/1765 ,  G01N2201/06113 ,  G01N2201/0636 ,  G06T7/001 ,  G06T7/32 ,  G06T2207/30148 ,  H04N5/2256 ,  H04N5/247

Abstract: A defect inspection device inspecting a sample includes a movable table on which the sample as an inspection object and a pattern chip are mounted, an illumination light irradiation unit which irradiates a surface of the sample or a surface of the pattern chip with linearly-formed illumination light, a detection optical system section where a plurality of detection optical systems are disposed at a plurality of positions above the table and which detect images of scattered light generated from the sample, and a signal processing unit which processes detected signals to detect a defect of the sample surface, and a plurality of repeating patterns for generating the scattered light according to positions of the objective lenses of the plurality of detection optical systems of the detection optical system section when the linearly-formed illumination light is irradiated by the illumination light irradiation unit are periodically formed in the pattern chip.

公开(公告)号：US20160305893A1

公开(公告)日：2016-10-20

申请号：US15132812

申请日：2016-04-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Yukihiro SHIBATA ,  Hideki FUKUSHIMA ,  Yuta URANO ,  Toshifumi HONDA

IPC: G01N21/956 ,  H04N5/225 ,  G06T7/00 ,  H04N5/247 ,  G01N21/95 ,  G01N21/47

CPC classification number: G01N21/956 ,  G01N21/47 ,  G01N21/9501 ,  G01N2021/1765 ,  G01N2201/06113 ,  G01N2201/0636 ,  G06T7/001 ,  G06T7/32 ,  G06T2207/30148 ,  H04N5/2256 ,  H04N5/247

Abstract: A defect inspection device inspecting a sample includes a movable table on which the sample as an inspection object and a pattern chip are mounted, an illumination light irradiation unit which irradiates a surface of the sample or a surface of the pattern chip with linearly-formed illumination light, a detection optical system section where a plurality of detection optical systems are disposed at a plurality of positions above the table and which detect images of scattered light generated from the sample, and a signal processing unit which processes detected signals to detect a defect of the sample surface, and a plurality of repeating patterns for generating the scattered light according to positions of the objective lenses of the plurality of detection optical systems of the detection optical system section when the linearly-formed illumination light is irradiated by the illumination light irradiation unit are periodically formed in the pattern chip.

Abstract translation: 检查样本的缺陷检查装置包括：作为检查对象的样本和图案芯片安装在其上的可移动台，照射光照射单元，其以线性形成的照射照射样品的表面或图案芯片的表面 光，检测光学系统部分，其中多个检测光学系统设置在工作台上方的多个位置处，并且检测从样本产生的散射光的图像;以及信号处理单元，其处理检测到的信号以检测缺陷 样品表面和多个重复图案，用于当由照明光照射单元照射线性形成的照明光时，根据检测光学系统部分的多个检测光学系统的物镜的位置产生散射光 周期性地形成在图案芯片中。

公开(公告)号：US20190107498A1

公开(公告)日：2019-04-11

申请号：US16080283

申请日：2016-03-02

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuta URANO ,  Yukihiro SHIBATA ,  Toshifumi HONDA ,  Yasuhiro YOSHITAKE ,  Hideki FUKUSHIMA

IPC: G01N21/956 ,  G01N21/88 ,  G01N21/47 ,  G06T7/00

Abstract: In a defect inspection device that irradiates a surface of a sample or a surface of a pattern chip with an illumination light shaped to extend in a first direction, and detects a scattered light generated from the surface of the sample or the surface of the pattern chip by the illumination light to detect a defect on the surface of the sample, the pattern chip has a dot pattern area in which multiple dots are arrayed in multiple rows and multiple columns, a minimum interval between the dots corresponding to the lines aligned in the first direction among the multiple dots arrayed in the dot pattern area in a second direction orthogonal to the first direction is smaller than a width of the illumination light, and a minimum interval between the multiple dots arrayed in the dot pattern area is larger than a resolution of the detection optical system.