公开(公告)号：US3614422A

公开(公告)日：1971-10-19

申请号：US3614422D

申请日：1970-07-28

Applicant: HITACHI LTD

Inventor： MATSUI ISAO ,  MINAMIKAWA YOSHIHISA ,  KATAGIRI SHINJIRO

IPC: H01B11/20 ,  H01J37/24 ,  H01J37/248 ,  H01J37/26

CPC classification number: H01B11/206 ,  H01J37/243 ,  H01J37/248

Abstract: A resistance for adjusting the bias voltage is provided in a high voltage source, a high DC voltage being applied to the resistance, and the high DC voltage and bias voltage are applied to the filament and Wehnelt electrode, respectively, of an electron gun in an electron microscope through a high-voltage cable including two core lines whose resistance value is high enough to reduce surge voltage.

公开(公告)号：US3622833A

公开(公告)日：1971-11-23

申请号：US3622833D

申请日：1968-05-14

Applicant: HITACHI LTD

Inventor： TAKEDA YASUTSUGU ,  MATSUI ISAO

IPC: H01S3/00 ,  H05H9/00 ,  H05H5/00

CPC classification number: H05H9/00 ,  H01S3/0007

Abstract: A device, in which light waves are directed to the surface of a periodic structure constituted of a material having high reflectivity of the light wave used, whereby a field having a periodic strength of an electric field vector of the light wave is generated in the vicinity of the surface of said periodic structure, and the energy of the light wave is supplied to the charged particles while said charged particles pass through said field, thereby accelerating the charged particles.