Abstract:
A resistance for adjusting the bias voltage is provided in a high voltage source, a high DC voltage being applied to the resistance, and the high DC voltage and bias voltage are applied to the filament and Wehnelt electrode, respectively, of an electron gun in an electron microscope through a high-voltage cable including two core lines whose resistance value is high enough to reduce surge voltage.
Abstract:
A charged particle accelerator wherein a receptacle surrounding an accelerating tube is made of an insulator, a grounded conductor layer is provided on the outside surface of the receptacle, at least one transformer is formed by opposing a primary coil on the outside and a secondary coil on the inside with the wall of the receptacle held therebetween, a conductor layer is provided on the inside surface of the receptacle at the transformer forming portion, a corona shield is provided at an end part of the inside conductor layer, and the induced voltage of the secondary coil is rectified and smoothed so as to apply the resultant voltage to a Wehnelt cylinder as a bias voltage. Thus, a continuously variable bias voltage can be obtained by regulating the applied voltage on the primary side of the transformer.