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    Deposition of wear resistant nickel-tungsten plating systems
    1.
    发明授权
    Deposition of wear resistant nickel-tungsten plating systems 有权

    公开(公告)号：US11041252B2

    公开(公告)日：2021-06-22

    申请号：US15928569

    申请日：2018-03-22

    Applicant: HONEYWELL INTERNATIONAL INC.

    Inventor： James Piascik ,  Gangmin Cao ,  Amer Aizaz ,  Jingkang Lv ,  Bahram Jadidian

    IPC: C25D3/12 ,  C25D15/00 ,  C10M103/04 ,  C10M103/06 ,  C25D3/56 ,  C10N30/06 ,  C10N50/08

    Abstract: Methods for depositing wear resistant NiW plating systems on metallic components are provided. In various embodiments, the method includes the step or process of preparing a NiW plating bath containing a particle suspension. The NiW plating bath is prepared by introducing wear resistant particles into the NiW plating path and adding at least one charged surfactant. The first type of wear resistant particles and the first charged surfactant may be contacted when introduced into the NiW plating bath or prior to introduction into the NiW plating bath. The at least one charged surfactant binds with the wear resistant particles to form a particle-surfactant complex. The wear resistant NiW plating system is then electrodeposited onto a surface of a component at least partially submerged in the NiW plating bath. The resulting wear resistant NiW plating system comprised of a NiW matrix in which the wear resistant particles are embedded.

    ELECTROPOLISHING SYSTEM WITH PROBE FOR INTERNAL DEBURRING OF PART AND METHOD OF USING THE SAME
    4.
    发明申请
    ELECTROPOLISHING SYSTEM WITH PROBE FOR INTERNAL DEBURRING OF PART AND METHOD OF USING THE SAME 有权

    公开(公告)号：US20210283701A1

    公开(公告)日：2021-09-16

    申请号：US16815922

    申请日：2020-03-11

    Applicant: HONEYWELL INTERNATIONAL INC.

    Inventor： Qiang Yang ,  Gangmin Cao ,  Jingkang Lv

    IPC: B23H3/00 ,  B23H9/02 ,  C25F3/16 ,  C25F7/00

    Abstract: A probe assembly of an electropolishing system for electropolishing a surface of a part is disclosed. The probe assembly includes a supply line, at least a part of which is flexible. The supply line defines a fluid passage for a flow of an electrolyte therethrough. The probe assembly also includes an electrode with at least one aperture. The electrode is attached to the supply line and is fluidly connected to the fluid passage for receiving the electrolyte and outputting the electrolyte via the at least one aperture. The electrode is configured to be electrically charged for electropolishing the surface of the part. Also, the probe assembly includes a sensor that is attached to at least one of the supply line and the electrode. The sensor is configured to provide substantially real-time feedback corresponding to the electropolishing of the surface of the part. Methods of using the system are also disclosed.

    Methods and systems for electrochemical machining of articles formed by additive manufacturing
    5.
    发明授权
    Methods and systems for electrochemical machining of articles formed by additive manufacturing 有权

    公开(公告)号：US11193216B2

    公开(公告)日：2021-12-07

    申请号：US16433655

    申请日：2019-06-06

    Applicant: HONEYWELL INTERNATIONAL INC.

    Inventor： Gangmin Cao ,  Shangyou Yang ,  Jingkang Lv ,  Juan Dou

    IPC: C25F3/22 ,  B33Y40/00 ,  B33Y80/00

    Abstract: A method for electrochemical machining of a metallic article formed by additive manufacturing includes obtaining or producing the metallic article. The metallic article includes an interior surface and a geometry. The method further includes inserting a flexible, metallic cathode tube into the article. The metallic cathode is spaced apart from the interior surface of the article, and the metallic cathode tube is inserted so as to conform to the geometry of the article. Still further, the method includes introducing an electrolyte fluid into the metallic cathode tube and the interior surface of the article and electrochemical machining the metallic article by applying a voltage across the cathode tube and the metallic article, the metallic article functioning as an anode.

    DEPOSITION OF WEAR RESISTANT NICKEL-TUNGSTEN PLATING SYSTEMS
    6.
    发明申请
    DEPOSITION OF WEAR RESISTANT NICKEL-TUNGSTEN PLATING SYSTEMS 审中-公开

    公开(公告)号：US20190292678A1

    公开(公告)日：2019-09-26

    申请号：US15928569

    申请日：2018-03-22

    Applicant: HONEYWELL INTERNATIONAL INC.

    Inventor： James Piascik ,  Gangmin Cao ,  Amer Aizaz ,  Jingkang Lv ,  Bahram Jadidian

    IPC: C25D15/00 ,  C10M103/04 ,  C10M103/06 ,  C25D3/56

    Abstract: Methods for depositing wear resistant NiW plating systems on metallic components are provided. In various embodiments, the method includes the step or process of preparing a NiW plating bath containing a particle suspension. The NiW plating bath is prepared by introducing wear resistant particles into the NiW plating path and adding at least one charged surfactant. The first type of wear resistant particles and the first charged surfactant may be contacted when introduced into the NiW plating bath or prior to introduction into the NiW plating bath. The at least one charged surfactant binds with the wear resistant particles to form a particle-surfactant complex. The wear resistant NiW plating system is then electrodeposited onto a surface of a component at least partially submerged in the NiW plating bath. The resulting wear resistant NiW plating system comprised of a NiW matrix in which the wear resistant particles are embedded.

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