公开(公告)号：US12203007B2

公开(公告)日：2025-01-21

申请号：US17384061

申请日：2021-07-23

Applicant: HOYA CORPORATION

Inventor： Hiroki Nakagawa ,  Kashio Nakayama

IPC: C09G1/02 ,  B24B37/04 ,  C09K3/14 ,  C23C14/02 ,  C23C14/34 ,  G11B5/84

Abstract: A polishing liquid for polishing a glass substrate includes cerium oxide as polishing abrasive particles, and a substance that reduces cerium oxide in response to irradiation of light.

公开(公告)号：US11098224B2

公开(公告)日：2021-08-24

申请号：US16337310

申请日：2017-11-24

Applicant: HOYA CORPORATION

Inventor： Hiroki Nakagawa ,  Kashio Nakayama

IPC: C09G1/02 ,  B24B1/00 ,  B81C1/00 ,  B24B37/04 ,  C09K3/14 ,  C23C14/02 ,  C23C14/34 ,  G11B5/84

Abstract: A method for polishing a glass substrate, by which a polishing speed that is higher than a conventional polishing speed can be maintained for a long period of time in processing for polishing a glass substrate using cerium oxide as polishing abrasive particles is provided. A polishing liquid containing cerium oxide as polishing abrasive particles is supplied to a polishing surface of a glass substrate, and the glass substrate is subjected to polishing processing. This polishing liquid contains the cerium oxide as polishing abrasive particles and a substance that reduces cerium oxide in response to light irradiation. Also, processing for irradiating the polishing liquid with light is performed when polishing processing is performed.

公开(公告)号：US08974561B2

公开(公告)日：2015-03-10

申请号：US13627057

申请日：2012-09-26

Applicant: Hoya Corporation

Inventor： Masanori Tamaki ,  Hiroki Nakagawa ,  Yoshihiro Tawara

IPC: G11B5/73 ,  C03C21/00 ,  G11B5/84 ,  C03C19/00 ,  C09G1/02 ,  B24D3/00 ,  A61C17/00

CPC classification number: B24B37/044 ,  A61C17/00 ,  B24D3/005 ,  C03C19/00 ,  C03C21/002 ,  C03C21/008 ,  C09G1/02 ,  G11B5/73 ,  G11B5/8404

Abstract: A manufacturing method of a glass substrate for a magnetic disk is provided whereby nano pits and/or nano scratches cannot be easily produced in polishing a principal face of a glass substrate using a slurry containing zirconium oxide as an abrasive. The manufacturing method of a glass substrate for a magnetic disk includes, for instance, a polishing step of polishing a principal face of a glass substrate using a slurry containing, as an abrasive, zirconium oxide abrasive grains having monoclinic crystalline structures (M) and tetragonal crystalline structures (T).

Abstract translation: 提供了一种用于磁盘的玻璃基板的制造方法，其中使用含有氧化锆作为研磨剂的浆料在玻璃基板的主面研磨时不容易产生纳米凹坑和/或纳米划痕。 用于磁盘的玻璃基板的制造方法包括例如使用包含作为磨料的含有单斜晶体结构（M）和四方晶系的氧化锆磨粒的浆料研磨玻璃基板的主面的抛光步骤 晶体结构（T）。