公开(公告)号：US20150104094A1

公开(公告)日：2015-04-16

申请号：US14391682

申请日：2012-04-16

申请人： Hailiang Li ,  Changqing Xie ,  Ming Liu ,  Dongmei Li ,  Jiebin Niu ,  Lina Shi ,  Xiaoli Zhu

发明人： Hailiang Li ,  Changqing Xie ,  Ming Liu ,  Dongmei Li ,  Jiebin Niu ,  Lina Shi ,  Xiaoli Zhu

IPC分类号： G01N21/88 ,  G01N21/47 ,  G06T7/00 ,  G01N21/95

CPC分类号： G01N21/8851 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/95 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/12 ,  G02B21/16 ,  G02B27/4222 ,  G02B2207/125 ,  G03F1/84 ,  G06T7/0004

摘要： A defect detection system for an extreme ultraviolet lithography mask comprises an extreme ultraviolet light source (1), extreme ultraviolet light transmission parts (2, 3), an extreme ultraviolet lithography mask (4), a photon sieve (6) and a collection (7) and analysis (8) system. Point light source beams emitted by the extreme ultraviolet light source (1) are focused on the extreme ultraviolet lithography mask (4) through the extreme ultraviolet light transmission parts (2, 3); the extreme ultraviolet lithography mask (4) emits scattered light and illuminates the photon sieve (6); and the photon sieve (6) forms a dark field image and transmits the same to the collection (7) and analysis (8) system. The defect detection system for the extreme ultraviolet photolithographic mask uses the photon sieve to replace a Schwarzchild objective, thereby realizing lower cost, relatively small size and high resolution.

摘要翻译： 用于极紫外光刻掩模的缺陷检测系统包括极紫外光源（1），极紫外光透射部分（2,3），极紫外光刻掩模（4），光子筛（6）和集合 7）和分析（8）系统。 由极紫外光源（1）发射的点光源光束通过极紫外光透射部分（2,3）聚焦在极紫外光刻掩模（4）上; 极紫外光刻掩模（4）发射散射光并照射光子筛（6）; 并且光子筛（6）形成暗场图像并将其传输到集合（7）和分析（8）系统。 用于极紫外光刻掩模的缺陷检测系统使用光子筛替代施瓦茨目标，从而实现更低的成本，更小的尺寸和更高的分辨率。

公开(公告)号：US09546964B2

公开(公告)日：2017-01-17

申请号：US14391682

申请日：2012-04-16

申请人： Hailiang Li ,  Changqing Xie ,  Ming Liu ,  Dongmei Li ,  Jiebin Niu ,  Lina Shi ,  Xiaoli Zhu

发明人： Hailiang Li ,  Changqing Xie ,  Ming Liu ,  Dongmei Li ,  Jiebin Niu ,  Lina Shi ,  Xiaoli Zhu

IPC分类号： G06K9/00 ,  G01N21/88 ,  G03F1/84 ,  G02B21/16 ,  G02B27/42 ,  G01N21/47 ,  G01N21/95 ,  G06T7/00 ,  G01N21/956

CPC分类号： G01N21/8851 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/95 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/12 ,  G02B21/16 ,  G02B27/4222 ,  G02B2207/125 ,  G03F1/84 ,  G06T7/0004

摘要： A defect detection system for an extreme ultraviolet lithography mask comprises an extreme ultraviolet light source (1), extreme ultraviolet light transmission parts (2, 3), an extreme ultraviolet lithography mask (4), a photon sieve (6) and a collection (7) and analysis (8) system. Point light source beams emitted by the extreme ultraviolet light source (1) are focused on the extreme ultraviolet lithography mask (4) through the extreme ultraviolet light transmission parts (2, 3); the extreme ultraviolet lithography mask (4) emits scattered light and illuminates the photon sieve (6); and the photon sieve (6) forms a dark field image and transmits the same to the collection (7) and analysis (8) system. The defect detection system for the extreme ultraviolet photolithographic mask uses the photon sieve to replace a Schwarzchild objective, thereby realizing lower cost, relatively small size and high resolution.

摘要翻译： 用于极紫外光刻掩模的缺陷检测系统包括极紫外光源（1），极紫外光透射部分（2,3），极紫外光刻掩模（4），光子筛（6）和集合 7）和分析（8）系统。 由极紫外光源（1）发射的点光源光束通过极紫外光透射部分（2,3）聚焦在极紫外光刻掩模（4）上; 极紫外光刻掩模（4）发射散射光并照射光子筛（6）; 并且光子筛（6）形成暗场图像并将其传输到集合（7）和分析（8）系统。 用于极紫外光刻掩模的缺陷检测系统使用光子筛替代施瓦茨目标，从而实现更低的成本，更小的尺寸和更高的分辨率。

公开(公告)号：US20130044299A1

公开(公告)日：2013-02-21

申请号：US13375102

申请日：2011-08-16

申请人： Changqing Xie ,  Nan Gao ,  Yilei Hua ,  Xiaoli Zhu ,  Hailiang Li ,  Lina Shi ,  Dongmei Li ,  Ming Liu

发明人： Changqing Xie ,  Nan Gao ,  Yilei Hua ,  Xiaoli Zhu ,  Hailiang Li ,  Lina Shi ,  Dongmei Li ,  Ming Liu

IPC分类号： G03B27/32

CPC分类号： G02B5/1876 ,  G03F7/70316 ,  G03F7/70325

摘要： The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve. According to the present disclosure, because the composite photon sieve is used instead of a projection objective lens in a conventional projection-type photolithography system, the advantage of high efficiency in the conventional projection-type photolithography system can be reserved, and also photolithography can be performed in batches rapidly, so that photolithography efficiency can be improved. Meanwhile, costs can be effectively cut down and the system can be reduced in size.

摘要翻译： 本公开涉及微纳米制造领域，并且提供了使用复合光子筛的投影型光刻系统。 该系统包括：依次布置的照明系统，面板，复合光子筛和基板。 照明系统适于产生入射光并用入射光照射掩模板。 掩模板适于通过复合光子筛提供要成像的物体，并且入射光通过掩模板后到达复合光子筛。 复合光子筛适于进行成像，掩模板上的图案在基底上成像。 衬底适于接收由复合光子筛成像的掩模板上的图案的图像。 根据本公开，由于在常规投影型光刻系统中使用复合光子筛代替投影物镜，因此可以预留在常规投影型光刻系统中高效率的优点，并且光刻可以 批量快速进行，从而可以提高光刻效率。 同时，可以有效降低成本，缩小系统。

公开(公告)号：US08736812B2

公开(公告)日：2014-05-27

申请号：US13375102

申请日：2011-08-16

申请人： Changqing Xie ,  Nan Gao ,  Yilei Hua ,  Xiaoli Zhu ,  Hailiang Li ,  Lina Shi ,  Dongmei Li ,  Ming Liu

发明人： Changqing Xie ,  Nan Gao ,  Yilei Hua ,  Xiaoli Zhu ,  Hailiang Li ,  Lina Shi ,  Dongmei Li ,  Ming Liu

IPC分类号： G03B27/42

CPC分类号： G02B5/1876 ,  G03F7/70316 ,  G03F7/70325

摘要： The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve. According to the present disclosure, because the composite photon sieve is used instead of a projection objective lens in a conventional projection-type photolithography system, the advantage of high efficiency in the conventional projection-type photolithography system can be reserved, and also photolithography can be performed in batches rapidly, so that photolithography efficiency can be improved. Meanwhile, costs can be effectively cut down and the system can be reduced in size.

摘要翻译： 本公开涉及微纳米制造领域，并且提供了使用复合光子筛的投影型光刻系统。 该系统包括：依次布置的照明系统，面板，复合光子筛和基板。 照明系统适于产生入射光并用入射光照射掩模板。 掩模板适于通过复合光子筛提供要成像的物体，并且入射光通过掩模板后到达复合光子筛。 复合光子筛适于进行成像，掩模板上的图案在基底上成像。 衬底适于接收由复合光子筛成像的掩模板上的图案的图像。 根据本公开，由于在常规投影型光刻系统中使用复合光子筛代替投影物镜，因此可以预留在常规投影型光刻系统中高效率的优点，并且光刻可以 批量快速进行，从而可以提高光刻效率。 同时，可以有效降低成本，缩小系统。

公开(公告)号：USD1021386S1

公开(公告)日：2024-04-09

申请号：US35517863

申请日：2023-06-30

申请人： Hailiang Li

设计人： Hailiang Li

摘要： 1. Sling bag
1.1 : Perspective
1.2 : Perspective
1.3 : Front
1.4 : Back
1.5 : Left
1.6 : Right
1.7 : Top
1.8 : Bottom
The parts shown by means of broken lines in the reproductions are not part of the claimed design.

公开(公告)号：USD1035269S1

公开(公告)日：2024-07-16

申请号：US35518351

申请日：2023-08-14

申请人： Hailiang Li

设计人： Hailiang Li

摘要： 1. Crossbody bag
1.1 : Perspective
1.2 : Perspective
1.3 : Front
1.4 : Back
1.5 : Left
1.6 : Right
1.7 : Top
1.8 : Bottom
1.9 : Enlarged
1.10 : Enlarged
The parts shown by means of broken lines in the reproductions are not part of the claimed design; fig. 1.9 and fig. 1.10 are the enlarged views of the portion taken at line 9 in fig. 1.1 and line 10 in fig. 1.2; the dash-dot-dash lines in reproductions 1.1, 1.2, 1.9, 1.10 and the number “9” in fig. 1.1, number “10” in fig. 1.2 are included to show a partially enlarged view only and form no part of the claimed design.