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    Heat-resistant low-silica zeolite, and process for production and application thereof
    1.
    发明授权
    Heat-resistant low-silica zeolite, and process for production and application thereof 失效
    耐热低硅沸石及其生产和应用的方法

    公开(公告)号：US6036939A

    公开(公告)日：2000-03-14

    申请号：US919163

    申请日：1997-08-28

    申请人： Hajime Funakoshi ,  Yoshinori Shirakura ,  Shunsuke Yatsunami ,  Kazuaki Yamamoto ,  Nobuhiro Ogawa ,  Takashi Mori ,  Atsushi Harada

    发明人： Hajime Funakoshi ,  Yoshinori Shirakura ,  Shunsuke Yatsunami ,  Kazuaki Yamamoto ,  Nobuhiro Ogawa ,  Takashi Mori ,  Atsushi Harada

    IPC分类号： B01D53/04 ,  B01J20/18 ,  C01B13/02 ,  C01B39/22 ,  B01D53/047

    CPC分类号： B01D53/02 ,  B01J20/186 ,  C01B13/027 ,  C01B39/22 ,  B01D2253/1085 ,  B01D2253/25 ,  B01D2253/306 ,  B01D2256/12 ,  B01D2257/102 ,  B01D53/047 ,  C01B2210/0046 ,  Y02C10/08 ,  Y10S423/21

    摘要： A novel heat-resistant low-silica zeolite, an industrial production process, and uses of the low-silica zeolite are provided. The heat-resistant low-silica zeolite contains Si and Al in a molar ratio of SiO.sub.2 /Al.sub.2 O.sub.3 ranging from 1.9 to 2.1, and has sodium and/or potassium as metal cation, wherein the low-silica zeolite contains low-silica faujasite type zeolite at a content of not lower than 88%, and has a thermal decomposition temperature ranging from 870.degree. C. to 900.degree. C. in the air. The process for producing the heat-resistant low-silica zeolite comprises mixing a solution containing an aluminate with another solution containing a silicate, allowing the resulting mixture to gel, and aging the resulting gel, at the temperature of from 0.degree. C. to 60.degree. C., to prepare a slurry having a viscosity ranging from 10 to 10000 cp and containing amorphous aluminosilicate having a specific surface area of not less than 10 m.sup.2 /g with an SiO.sub.2 /Al.sub.2 O.sub.3 molar ratio ranging from 1.9 to 2.1; and subsequently crystallizing the aluminosilicate. The low-silica zeolite ion-exchanged with lithium or an alkaline earth metal is useful for gas separation.

    摘要翻译： 提供了一种新型耐热低硅沸石，工业生产方法和低硅沸石的用途。 该耐热低硅沸石含有SiO 2 / Al 2 O 3的摩尔比为1.9-2.1的Si和Al，并且具有作为金属阳离子的钠和/或钾，其中低硅沸石含有低硅石八面沸石型沸石 含量不低于88％，并且在空气中的热分解温度为870℃至900℃。 制造耐热低硅石沸石的方法包括将含有铝酸盐的溶液与含有硅酸盐的另一种溶液混合，使所得混合物凝胶化，并将所得凝胶老化，在0℃至60℃ 以制备粘度范围为10-10000cp并含有比表面积不小于10m 2 / g的无定形硅酸铝的浆料，SiO 2 / Al 2 O 3摩尔比为1.9-2.1; 随后使铝硅酸盐结晶。 与锂或碱土金属离子交换的低硅石沸石可用于气体分离。

    Sintered Body, Sputtering Target and Molding Die, and Process for Producing Sintered Body Employing the Same
    3.
    发明申请
    Sintered Body, Sputtering Target and Molding Die, and Process for Producing Sintered Body Employing the Same 有权
    烧结体，溅射靶和成型模，以及使用该烧结体的烧结体的制造方法

    公开(公告)号：US20080274351A1

    公开(公告)日：2008-11-06

    申请号：US11815163

    申请日：2006-01-27

    申请人： Kenichi Itoh ,  Masami Mesuda ,  Hitoshi Nagayama ,  Tetsuo Shibutami ,  Shunsuke Yatsunami

    发明人： Kenichi Itoh ,  Masami Mesuda ,  Hitoshi Nagayama ,  Tetsuo Shibutami ,  Shunsuke Yatsunami

    IPC分类号： C04B38/06

    CPC分类号： C23C14/3414 ,  B22F2998/00 ,  B22F2998/10 ,  B28B3/003 ,  B28B7/0097 ,  B30B15/024 ,  C04B35/453 ,  C04B35/457 ,  C04B35/4682 ,  C04B35/47 ,  C04B2235/3213 ,  C04B2235/3217 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/604 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/721 ,  C04B2235/77 ,  C23C14/086 ,  H01J37/3426 ,  Y10T428/266 ,  B22F5/007 ,  B22F3/04 ,  B22F3/10

    摘要： To provide a large sputtering target excellent in discharge characteristics during sputtering and in characteristics of a thin film thereby obtainable. Further, a process for producing a sintered body is provided, whereby a large green body excellent in shape accuracy can be obtained by means of cold isostatic pressing directly without preforming, and a sintered body capable of providing the above-mentioned excellent sputtering target, can be produced efficiently at a low cost.The sputtering target is produced by using a sintered body having the content of carbon contained as an impurity reduced to less than 0.005 wt %. Such a sintered body is obtainable by molding a raw material powder by cold isostatic pressing directly without adding a binder containing an organic substance or a molding aid, followed by firing. Further, it becomes possible to produce such a sintered body by using a molding die having such a construction that at the time of pressure compression, pressing is applied to a filled raw material powder only in a substantially uniaxial direction, and at the time of reducing the pressure after the completion of pressing, the pressure can be released substantially isotropically with respect to the green body. Further, a large target having the thickness of an erosion region made thick, can be easily produced in good yield, and efficiency in the use of the target can be improved.

    摘要翻译： 提供溅射时放电特性优异的溅射靶和由此得到的薄膜特性。 此外，提供一种制造烧结体的方法，由此通过直接进行预均匀的冷等静压，可以获得形状精度优异的大型生坯，并且能够提供上述优异的溅射靶的烧结体 以低成本高效生产。 通过使用具有作为杂质的含有量的碳含量降低至小于0.005重量％的烧结体来制造溅射靶。 这样的烧结体可以通过直接通过冷等静压成型原料粉末而不添加含有有机物的粘合剂或成型助剂，然后进行烧成而获得。 此外，通过使用具有这样的结构的成型模具，可以制造这样的烧结体，该成型模具在压缩压缩时仅在基本上单轴方向上对填充的原料粉末施加压力，并且在还原时 压制完成后的压力，可以相对于生坯基本上各向同性地释放压力。 此外，可以容易地以良好的产率制造具有厚的侵蚀区域的厚度的大的靶，并且可以提高靶的使用效率。