公开(公告)号：US20100141912A1

公开(公告)日：2010-06-10

申请号：US12703068

申请日：2010-02-09

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。

公开(公告)号：US07532306B2

公开(公告)日：2009-05-12

申请号：US10917371

申请日：2004-08-13

申请人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

发明人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/54

CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。

公开(公告)号：US20070070316A1

公开(公告)日：2007-03-29

申请号：US11458216

申请日：2006-07-18

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。

公开(公告)号：US07570343B2

公开(公告)日：2009-08-04

申请号：US11285283

申请日：2005-11-23

申请人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

发明人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

摘要翻译： 微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜 在投影透镜的图像平面中。 投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。 相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。

公开(公告)号：US20060187430A1

公开(公告)日：2006-08-24

申请号：US11285283

申请日：2005-11-23

申请人： Aurelian Dodoc ,  Karl Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

发明人： Aurelian Dodoc ,  Karl Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

公开(公告)号：US08330935B2

公开(公告)日：2012-12-11

申请号：US12703068

申请日：2010-02-09

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/52 ,  G03B27/68 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。

公开(公告)号：US20100045952A1

公开(公告)日：2010-02-25

申请号：US12611999

申请日：2009-11-04

申请人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

发明人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

IPC分类号： G03B27/42 ,  G03B27/54

摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。

公开(公告)号：US20080316452A1

公开(公告)日：2008-12-25

申请号：US12199998

申请日：2008-08-28

申请人： Aurelian Dodoc ,  Karl-Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

发明人： Aurelian Dodoc ,  Karl-Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

IPC分类号： G03G15/08

摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。

公开(公告)号：US20080309894A1

公开(公告)日：2008-12-18

申请号：US12195566

申请日：2008-08-21

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。