-
1.发明授权Positive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated article 失效含N，N'，N“ - 取代的异氰脲酸酯化合物和相关制品的正性醌醌二叠氮化合物组合物
公开(公告)号：US5332647A
公开(公告)日：1994-07-26
申请号：US111179
申请日：1993-08-24
CPC分类号： G03F7/0226
摘要： A positive-working photosensitive resin composition useful as a photoresist material in the fine patterning work for the manufacture of semiconductor devices is proposed. The composition is excellent in the storage stability and capable of giving a patterned resist layer having good film thickness retention, cross sectional profile of line patterns, resolution and heat resistance. The composition comprises, in addition to a conventional alkali-soluble novolac resin as a film-forming agent and a quinone diazide group containing compound as a photosensitizing agent, a specific isocyanurate compound substituted at each nitrogen atom with a hydroxy- and ter-butyl-substituted benzyl group.
摘要翻译： 提出了用于制造半导体器件的精细图案化工作中用作光致抗蚀剂材料的正性感光性树脂组合物。 该组合物的保存稳定性优异，能够得到具有良好的膜厚保持性，线图案的横截面轮廓，分辨率和耐热性的图案化抗蚀剂层。 该组合物除了常规的作为成膜剂的碱溶性酚醛清漆树脂和含有醌二叠氮基的化合物作为感光剂之外，还包括在每个氮原子处被羟基和叔丁基取代的异氰脲酸酯化合物， 取代的苄基。
-
2.发明授权Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone 失效包含丙二醇单丙基醚和2-庚酮的混合溶剂的正性光致抗蚀剂涂料溶液
公开(公告)号：US5702862A
公开(公告)日：1997-12-30
申请号：US797663
申请日：1997-01-31
申请人： Hayato Ohno , Taku Nakao , Hisanobu Harada , Shinichi Hidesaka , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Hayato Ohno , Taku Nakao , Hisanobu Harada , Shinichi Hidesaka , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： C09D5/00 , C09D11/00 , C09D161/02 , C09D161/04 , G03F7/004 , G03F7/022 , G03F7/20 , H01L21/027 , G03F7/023
CPC分类号： G03F7/0048 , G03F7/022
摘要： A positive photoresist coating solution comprising (a) an alkali-soluble resin, (b) a quinone diazide group-containing compound, and (c) an organic solvent in an amount sufficient for dissolving said (a) and (b) components, wherein said organic solvent contains (i) propylene glycol monopropyl ether and (ii) 2-heptanone. The solution of the present invention exhibits excellent coating ability, sensitivity, thermostability, focal depth range, shape-profiling ability, and the like.
摘要翻译： 一种正型光致抗蚀剂涂料溶液，其包含（a）碱溶性树脂，（b）含醌二叠氮化物基团的化合物和（c）足以溶解所述（a）和（b）组分的量的有机溶剂，其中 所述有机溶剂含有（i）丙二醇单丙醚和（ii）2-庚酮。 本发明的溶液表现出优异的涂布能力，灵敏度，热稳定性，焦深范围，形状分布能力等。
-
3.发明授权Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent 失效正性光致抗蚀剂组合物，其包含在丁内酯作为溶剂制备的酚醛清漆树脂
公开(公告)号：US5604077A
公开(公告)日：1997-02-18
申请号：US603601
申请日：1996-02-21
CPC分类号： G03F7/0236 , C08G8/08
摘要： Proposed is an improved positive-working photoresist composition for use in the photolithographic patterning works for the manufacture of semiconductor devices, which is capable of giving a patterned resist layer on a substrate surface having excellent resolution and heat resistance without formation of scum in the development treatment. The photoresist composition comprises: (a) an alkali-soluble novolac resin as a film-forming ingredient and (b) a naphthoquinone diazide group-containing compound as a photosensitizing ingredient, of which the novolac resin is a condensation product of a phenolic compound and an aldehyde compound, the condensation reaction being undertaken in a solvent system containing, in addition to water, .gamma.-butyrolactone or a combination of .gamma.-butyrolactone and a propyleneglycol monoalkyl ether in a limited proportion.
摘要翻译： 提出了一种用于制造半导体器件的光刻图案化工艺中的改进的正性光致抗蚀剂组合物，其能够在显影处理中不形成浮渣的情况下在具有优异的分辨率和耐热性的基板表面上形成图案化的抗蚀剂层 。 光致抗蚀剂组合物包括：（a）作为成膜成分的碱溶性酚醛清漆树脂和（b）含萘醌二叠氮基的化合物作为光敏成分，其中酚醛清漆树脂是酚类化合物和 醛化合物，缩合反应在除水中的γ-丁内酯或γ-丁内酯和丙二醇单烷基醚的组合之外还含有有限的比例进行。
-
公开(公告)号：US6083657A
公开(公告)日：2000-07-04
申请号：US231826
申请日：1999-01-15
申请人： Shinichi Kono , Yasuo Masuda , Atsushi Sawano , Hayato Ohno , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Shinichi Kono , Yasuo Masuda , Atsushi Sawano , Hayato Ohno , Hidekatsu Kohara , Toshimasa Nakayama
摘要： Phenolic compound (a) is polycondensed with mixed aldehyde (b) consisting essentially of 5-30 mol % of unsaturated aliphatic aldehyde (b-1) and 70-95 mol % of saturated aliphatic aldehyde (b-2) to give alkali-soluble novolak resin (A) as the product of polycondensation reaction. The alkali-soluble novolak resin (A) is used with quinonediazido group containing compound (B) to produce a positive photoresist composition. According to the present invention, there are specifically provided a positive photoresist composition that has high feature integrity in spite of high sensitivity and which yet provides a great depth of focus, a process for producing such positive photoresist composition, as well as an alkali-soluble novolak resin that can advantageously be used in such composition, and a method of forming patterns with high reproducibility using such positive photoresist composition.
摘要翻译： 酚醛化合物（a）与基本上由5-30mol％不饱和脂族醛（b-1）和70-95mol％饱和脂族醛（b-2）组成的混合醛（b）缩聚，得到碱溶性 酚醛清漆树脂（A）作为缩聚反应的产物。 与含醌二叠氮基的化合物（B）一起使用碱溶性酚醛清漆树脂（A）以产生正型光致抗蚀剂组合物。 根据本发明，具体地提供了一种正光致抗蚀剂组合物，尽管具有高灵敏度并且仍然提供了很大的聚焦深度，但具有高特征完整性，制备这种正性光致抗蚀剂组合物的方法以及碱溶性 可以有利地用于这种组合物中的酚醛清漆树脂，以及使用这种正性光致抗蚀剂组合物形成具有高再现性的图案的方法。
-
-
-
搜索结果
4 条记录 (耗时 0.027 秒)