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公开(公告)号：US10689751B2
公开(公告)日：2020-06-23
申请号：US15855879
申请日：2017-12-27
发明人： Changqi Hu , Shupeng Guo
摘要： An evaporation source cover, an evaporation source and an evaporation apparatus are disclosed. The evaporation source cover comprises a cover body and an elastic dredging member which is arranged on the cover body. The elastic dredging member comprises a bottom part and a top part. The elastic dredging member is fixed to a surface of the cover body at the bottom part. The elastic dredging member is configured to extend and contract in a direction perpendicular to the surface of the cover body.
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公开(公告)号：US10950482B2
公开(公告)日：2021-03-16
申请号：US16327425
申请日：2018-06-08
发明人： Qinghua Zou , Shupeng Guo , Tingyuan Duan , Gu Yao , Ruhui Zhu , Yu Wang
IPC分类号： H01L21/687 , H01L21/67
摘要： A device for supporting a substrate, an apparatus for manufacturing a display panel, and a method for supporting a substrate are provided. The device for supporting a substrate comprises: a bearing mechanism being provided with a through hole for bearing a substrate; one or more sticky pads on the bearing mechanism surrounding the through hole, which are used for fixing the substrate on the bearing mechanism; and an elevating mechanism, which controls lifting and lowering of the substrate by passing through the through hole, wherein a top of the lifting mechanism is provided with a light-emitting member that emits light when in contact with the substrate, to illuminate the one or more sticky pads such that stickiness of the sticky pads is reduced from a first stickiness to a second stickiness.
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公开(公告)号：US10763319B2
公开(公告)日：2020-09-01
申请号：US16075001
申请日：2018-01-10
发明人： Qinghua Zou , Ruhui Zhu , Gu Yao , Shupeng Guo , Litao Qu
IPC分类号： H01L27/32 , G09G3/3225 , H01L51/52
摘要： Embodiments of the present disclosure relate to a display panel, a method for manufacturing the same, a display device and a displaying method. The display panel includes a substrate, a thin film transistor on the substrate, an insulating layer covering the substrate and the thin film transistor, a first electrode and a second electrode on the insulating layer and electrically insulated with each other, wherein an orthographic projection of the first electrode on the substrate does not overlap with an orthographic projection of the thin film transistor on the substrate, an orthographic projection of the second electrode on the substrate overlaps with an orthographic projection of the thin film transistor on the substrate, a light emitting layer on the first electrode and the second electrode, and a third electrode and a fourth electrode on the light emitting layer.
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公开(公告)号：US11315814B2
公开(公告)日：2022-04-26
申请号：US16176209
申请日：2018-10-31
发明人： Lankai Yeh , Shupeng Guo
IPC分类号： H01L21/673 , H01L35/32 , H01L35/02 , H01L51/00 , C23C14/50 , H01L21/683 , H01L21/67 , H01L21/677
摘要： The present disclosure provides a carrying apparatus and a carrying method, the carrying apparatus includes: a carrying part configured to carry an object to be carried; an adhesive assembly disposed on the carrying part, a viscosity of the adhesive assembly is variable, and the carrying apparatus is configured to selectively adhere to or separate from the object to be carried according to a change of the viscosity; and a supporting part disposed on the carrying part and configured to support the object to be carried so that the object to be carried separates from the carrying part.
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公开(公告)号：US10738379B2
公开(公告)日：2020-08-11
申请号：US15840687
申请日：2017-12-13
发明人： Qinghua Zou , Shupeng Guo , Bin Bu
IPC分类号： C23C14/24 , H01L51/56 , C23C14/12 , C23C16/455 , H01L51/00
摘要： An assembly and a device for vapor deposition are provided in this disclosure, an assembly includes a cell and a housing, the cell is accommodated in the housing, the gaseous materials to be vapor deposited eject from the housing and are vapor deposited onto the substrate. The housing is capable of rotating relative to the cell. The film layer structure can be obtained by controlling the angles of rotation of the housing. Single film layer as well as the composite film layer with various changes of doping ratio can be formed on the substrate of the assembly and the device for vapor deposition in this disclosure.
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6.发明申请公开(公告)号：US20200176300A1
公开(公告)日：2020-06-04
申请号：US16327425
申请日：2018-06-08
发明人： Qinghua Zou , Shupeng Guo , Tingyuan Duan , Gu Yao , Ruhui Zhu , Yu Wang
IPC分类号： H01L21/687 , H01L21/67
摘要： This disclosure provides a device for supporting a substrate, an apparatus for manufacturing a display panel, and a method for supporting a substrate. The device for supporting a substrate comprises: a bearing mechanism being provided with a through hole for bearing a substrate; one or more sticky pads on the bearing mechanism surrounding the through hole, which are used for fixing the substrate on the bearing mechanism; and an elevating mechanism, which controls lifting and lowering of the substrate by passing through the through hole, wherein a top of the lifting mechanism is provided with a light-emitting member that emits light when in contact with the substrate, to illuminate the one or more sticky pads such that stickiness of the sticky pads is reduced from a first stickiness to a second stickiness.
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7.发明申请公开(公告)号：US20180080756A1
公开(公告)日：2018-03-22
申请号：US15520406
申请日：2016-08-02
发明人： Fengjie Zhang , Shupeng Guo , Xiaoyun Liu
CPC分类号： G01B11/0683 , C23C14/542 , C23C14/545 , G01B21/08
摘要： The present disclosure relates to a measurement tool, for measuring the thickness of an evaporated film at a particular position on a large-sized substrate. The measurement tool includes: a measurement part, having at least one measurement surface onto which at least one sampling substrate sheet is positional and fixable; and a support part connected with the support part and configured to be supportable on an edge frame of a mask so as to place the measurement part in an inside of the edge frame of the mask through the support part. The present disclosure also relates to a method of measuring a thickness of an evaporated film of a large-sized substrate by using the above measurement tool.
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公开(公告)号：US10354901B2
公开(公告)日：2019-07-16
申请号：US15540545
申请日：2016-09-14
发明人： Qinghua Zou , Shupeng Guo , Changqi Hu
IPC分类号： H01L21/677 , H01L21/67 , H01L21/687 , H01L21/673
摘要： A conveying device, a conveying method, and an evaporation apparatus are provided. The conveying device comprises a carrying mechanism for carrying a substrate; and a fastening mechanism for fastening the substrate on the carrying mechanism in a mechanical manner. In the conveying device, the substrate is fastened on the carrying mechanism in a mechanical manner by the fastening mechanism. As compared with electrostatic fastening and adhesive fastening, this reduces damage to the substrate, increases the reliability for fastening the substrate, and makes it easy to receive and detach the substrate.
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公开(公告)号：US10290806B2
公开(公告)日：2019-05-14
申请号：US14908442
申请日：2015-09-11
发明人： Qinghui Zeng , Shupeng Guo
摘要： The present disclosure provides an evaporation carrier plate and an evaporation device. The evaporation carrier plate includes a carrier plate body. The carrier plate body includes a glass-carrying surface and a plurality of pin holes for pins to extend through. The evaporation carrier plate further includes a cover plate arranged on a surface of the carrier plate body away from the glass-carrying surface and configured to move relative to the carrier plate body to cover or open the pin holes.
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公开(公告)号：US20180363129A1
公开(公告)日：2018-12-20
申请号：US15781957
申请日：2017-12-15
发明人： Shupeng Guo , Changqi Hu
IPC分类号： C23C14/54 , C23C16/455 , C23C16/52 , G01B7/06 , C23C14/24
摘要： An evaporation apparatus is disclosed. The evaporation apparatus includes an operation platform; an evaporation source on the operation platform; an inner plate on at least one side of the evaporation source, the inner plate being fixedly connected to the evaporation source; and an outer plate on a side of the inner plate away from the evaporation source, the outer plate being adjacent to the inner plate. The inner plate can be configured to detect an evaporation rate of the evaporation source, and the outer plate can adjust an evaporation range.
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