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1.发明授权Substrate processing method, program, computer-readable storage medium, and substrate processing system 有权基板处理方法，程序，计算机可读存储介质和基板处理系统公开(公告)号：US07884950B2
公开(公告)日：2011-02-08
申请号：US12300135
申请日：2007-05-11
申请人： Heiko Weichert , Kunie Ogata , Tsuyoshi Shibata
发明人： Heiko Weichert , Kunie Ogata , Tsuyoshi Shibata
CPC分类号： G03F7/162 , G01B11/06 , G03F7/70533 , H01L22/12 , H01L22/20
摘要： In a pattern measuring unit installed in a coating and developing treatment system, the height of a pattern formed on a substrate is measured using the Scatterometry method. Based on the measured height of the pattern, an appropriate number of rotations of the substrate during application of a coating solution is calculated, so that the rotation of the substrate during the application is controlled by the calculated number of rotations of the substrate. Since the number of rotations of the substrate when the coating solution is applied to the substrate is controlled, it is unnecessary to stop the system which performs photolithography processing on the substrate, resulting in improved productivity of the substrate.
摘要翻译： 在安装在涂布和显影处理系统中的图案测量单元中，使用散射法测量形成在基底上的图案的高度。 基于所测量的图案的高度，计算在施加涂布溶液期间适当数量的基材的旋转，使得在施加期间基底的旋转由所计算的基底的旋转数量控制。 由于控制将涂布液施加到基板上时的基板的旋转次数，因此不需要在基板上停止进行光刻处理的系统，从而提高基板的生产率。
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2.发明申请SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM 有权基板处理方法，程序，计算机可读存储介质和基板处理系统公开(公告)号：US20090181316A1
公开(公告)日：2009-07-16
申请号：US12300135
申请日：2007-05-11
申请人： Heiko Weichert , Kunie Ogata , Tsuyoshi Shibata
发明人： Heiko Weichert , Kunie Ogata , Tsuyoshi Shibata
CPC分类号： G03F7/162 , G01B11/06 , G03F7/70533 , H01L22/12 , H01L22/20
摘要： In a pattern measuring unit installed in a coating and developing treatment system, the height of a pattern formed on a substrate is measured using the Scatterometry method. Based on the measured height of the pattern, an appropriate number of rotations of the substrate during application of a coating solution is calculated, so that the rotation of the substrate during the application is controlled by the calculated number of rotations of the substrate. Since the number of rotations of the substrate when the coating solution is applied to the substrate is controlled, it is unnecessary to stop the system which performs photolithography processing on the substrate, resulting in improved productivity of the substrate.
摘要翻译： 在安装在涂布和显影处理系统中的图案测量单元中，使用散射法测量形成在基底上的图案的高度。 基于所测量的图案的高度，计算在施加涂布溶液期间适当数量的基材的旋转，使得在施加期间基底的旋转由所计算的基底的旋转数量来控制。 由于控制将涂布液施加到基板上时的基板的旋转次数，因此不需要在基板上停止进行光刻处理的系统，从而提高基板的生产率。
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3.发明授权Substrate processing method, computer-readable storage medium and substrate processing system 有权基板处理方法，计算机可读存储介质和基板处理系统公开(公告)号：US07985516B2
公开(公告)日：2011-07-26
申请号：US12426600
申请日：2009-04-20
CPC分类号： G03F7/38 , H01L21/67225 , H01L21/67248
摘要： A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of a resist pattern and a temperature of thermal processing, a second dimension of the resist pattern after thermal processing is performed at the corrected processing temperature is measured, a distribution within the substrate of the second dimension is classified into a linear component expressed by an approximated curved surface and a nonlinear component, a processing condition of exposure processing is corrected based on the linear component from a previously obtained relation between a dimension of a resist pattern and a processing condition of exposure processing, and thermal processing at the processing temperature corrected in a temperature correcting step and exposure processing under the processing condition corrected in an exposure condition correcting step are performed to form a predetermined pattern.
摘要翻译： 基于先前获得的抗蚀剂图案的尺寸和热处理温度之间的关系，基于热处理后的抗蚀剂图案的第二维度，基于基板上的抗蚀剂图案的第一尺寸的测量来校正热处理的处理温度 在校正后的处理温度下进行处理，将第二维度的基板内的分布分类成由近似曲面和非线性成分表示的线性分量，根据线性分量来校正曝光处理的处理条件 从先前获得的抗蚀剂图案的尺寸和曝光处理的处理条件之间的关系以及在温度校正步骤中校正的处理温度下的热处理和在曝光条件校正步骤中校正的处理条件下的曝光处理进行到 形成一个预先 确定模式。
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4.发明授权Substrate processing method, computer-readable storage medium and substrate processing system 有权基板处理方法，计算机可读存储介质和基板处理系统公开(公告)号：US08253077B2
公开(公告)日：2012-08-28
申请号：US13159055
申请日：2011-06-13
IPC分类号： H05B3/68
CPC分类号： G03F7/38 , H01L21/67225 , H01L21/67248
摘要： A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of a resist pattern and a temperature of thermal processing, a second dimension of the resist pattern after thermal processing is performed at the corrected processing temperature is measured, a distribution within the substrate of the second dimension is classified into a linear component expressed by an approximated curved surface and a nonlinear component, a processing condition of exposure processing is corrected based on the linear component from a previously obtained relation between a dimension of a resist pattern and a processing condition of exposure processing, and thermal processing at the processing temperature corrected in a temperature correcting step and exposure processing under the processing condition corrected in an exposure condition correcting step are performed to form a predetermined pattern.
摘要翻译： 基于先前获得的抗蚀剂图案的尺寸和热处理温度之间的关系，基于热处理后的抗蚀剂图案的第二维度，基于基板上的抗蚀剂图案的第一尺寸的测量来校正热处理的处理温度 在校正后的处理温度下进行处理，将第二维度的基板内的分布分类成由近似曲面和非线性成分表示的线性分量，根据线性分量来校正曝光处理的处理条件 从先前获得的抗蚀剂图案的尺寸和曝光处理的处理条件之间的关系以及在温度校正步骤中校正的处理温度下的热处理和在曝光条件校正步骤中校正的处理条件下的曝光处理进行到 形成一个预先 确定模式。
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5.发明申请SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM 有权基板处理方法，计算机可读存储介质和基板处理系统公开(公告)号：US20110242513A1
公开(公告)日：2011-10-06
申请号：US13159055
申请日：2011-06-13
IPC分类号： G03B27/42
CPC分类号： G03F7/38 , H01L21/67225 , H01L21/67248
摘要： A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of a resist pattern and a temperature of thermal processing, a second dimension of the resist pattern after thermal processing is performed at the corrected processing temperature is measured, a distribution within the substrate of the second dimension is classified into a linear component expressed by an approximated curved surface and a nonlinear component, a processing condition of exposure processing is corrected based on the linear component from a previously obtained relation between a dimension of a resist pattern and a processing condition of exposure processing, and thermal processing at the processing temperature corrected in a temperature correcting step and exposure processing under the processing condition corrected in an exposure condition correcting step are performed to form a predetermined pattern.
摘要翻译： 基于先前获得的抗蚀剂图案的尺寸和热处理温度之间的关系，基于热处理后的抗蚀剂图案的第二维度，基于基板上的抗蚀剂图案的第一尺寸的测量来校正热处理的处理温度 在校正后的处理温度下进行处理，将第二维度的基板内的分布分类成由近似曲面和非线性成分表示的线性分量，根据线性分量来校正曝光处理的处理条件 从先前获得的抗蚀剂图案的尺寸和曝光处理的处理条件之间的关系以及在温度校正步骤中校正的处理温度下的热处理和在曝光条件校正步骤中校正的处理条件下的曝光处理进行到 形成一个预先 确定模式。
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公开(公告)号：US08959916B2
公开(公告)日：2015-02-24
申请号：US13281981
申请日：2011-10-26
申请人： Kenji Yamamoto , Masato Handa , Naoyuki Nagafuchi , Naohiro Kusumi , Mitsuko Fukuda , Tsuyoshi Shibata , Shinji Matsuura
发明人： Kenji Yamamoto , Masato Handa , Naoyuki Nagafuchi , Naohiro Kusumi , Mitsuko Fukuda , Tsuyoshi Shibata , Shinji Matsuura
CPC分类号： F01K13/00 , F01K11/02 , F22B37/008 , F22B37/24 , F22B37/40 , Y02E20/326
摘要： A thermal power plant is proposed for achieving high reliability, low material cost, and low construction cost by devising the arrangement and structures of a boiler, steam turbines, and a flue gas treatment apparatus to reduce a usage amount of high-temperature resistance material and further to reduce a thermal elongation of piping. In a thermal power plant including a 2 pass-type boiler having a furnace for burning fuel, a rear heat recovery area for recovering heat from combustion gas exhausted from the furnace, steam turbines are arranged near the rear heat recovery area.
摘要翻译： 提出通过设计锅炉，蒸汽轮机和烟气处理装置的布置和结构来降低高温电阻材料的使用量，从而实现高可靠性，低材料成本和低建筑成本的火力发电厂， 进一步降低管道的热延伸率。 在包括具有用于燃烧燃料的炉的2通型锅炉的火力发电设备中，用于从从炉排出的燃烧气体中回收热量的后部热回收区域设置在后部热回收区域附近。
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公开(公告)号：US08578868B2
公开(公告)日：2013-11-12
申请号：US12893733
申请日：2010-09-29
CPC分类号： F23L7/007 , F23C9/003 , F23C2202/10 , F23C2900/06041 , F23D1/00 , F23J2215/50 , F23L2900/07001 , F23L2900/07005 , Y02E20/322 , Y02E20/344
摘要： An oxyfuel combustion boiler plant comprising: an air separation unit for manufacturing oxygen by separating nitrogen from air, a boiler having a burner for burning the oxygen supplied from the air separation unit and pulverized coal, and a primary system pipe for supplying the pulverized coal to the burner, an exhaust gas recirculation system pipe for supplying combustion exhaust gas discharged from the boiler to the primary system pipe, and a carbon dioxide capture unit for capturing carbon dioxide in the exhaust gas discharged from the boiler, the oxyfuel combustion boiler plant is further comprising: an oxygen supply pipe for supplying the oxygen manufactured by the air separation unit to the primary system pipe in the burner, and a pipe for supplying the combustion exhaust gas discharged from the boiler to the oxygen supply pipe, wherein an injection port of the oxygen supply pipe is disposed on an upstream side of an injection portion of the burner.
摘要翻译： 一种氧燃料燃烧锅炉设备，包括：空气分离单元，用于通过从空气中分离氮气来制造氧气，具有用于燃烧从空气分离单元和粉煤供应的氧气的燃烧器的锅炉，以及用于将粉煤供应到 燃烧器，用于将从锅炉排出的燃烧废气排放到主系统管的排气再循环系统管，以及用于捕获从锅炉排出的废气中的二氧化碳的二氧化碳捕获单元，氧燃料燃烧锅炉设备 包括：用于将由空气分离单元制造的氧气供应到燃烧器中的主系统管的供氧管，以及用于将从锅炉排出的燃烧废气供应到氧气供应管的管，其中， 供氧管设置在燃烧器的喷射部分的上游侧。
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公开(公告)号：US08561555B2
公开(公告)日：2013-10-22
申请号：US12708268
申请日：2010-02-18
CPC分类号： F23C9/003 , F01K13/02 , F23C9/08 , F23C2202/00 , F23C2202/50 , F23L7/007 , F23L2900/07001 , F23N2027/02 , F23N2037/04 , F23N2041/10 , Y02C10/06 , Y02E20/322 , Y02E20/344
摘要： An oxyfuel combustion boiler plant having a first boiler and a second boiler for injecting gas including oxygen in higher concentration than that in the air, gas including carbon dioxide in higher concentration than that in the air, and fuel from a burner and generating steam by combustion gas in a furnace, respectively, comprising: an exhaust gas supply pipe for supplying exhaust gas discharged from the first boiler to a burner of the second boiler, and a gas flow rate control apparatus for controlling a flow rate of exhaust gas flowing through the exhaust gas supply pipe.
摘要翻译： 一种具有第一锅炉和第二锅炉的含氧燃烧锅炉设备，其包括比空气中浓度高的气体，包括比空气中浓度高的二氧化碳的气体和来自燃烧器的燃料，以及通过燃烧产生蒸汽的气体 分别包括：用于将从第一锅炉排出的排气供给到第二锅炉的燃烧器的排气供给管，以及用于控制流过排气的废气的流量的气体流量控制装置 供气管。
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公开(公告)号：US08461182B2
公开(公告)日：2013-06-11
申请号：US13122281
申请日：2009-09-30
IPC分类号： A61K31/04 , C07D215/38
CPC分类号： C07D401/06 , C07D401/14
摘要： PROBLEMTo provide a novel compound, a pharmaceutically acceptable salt or a hydrate thereof useful for preventing or treating for depression, anxiety disorders (such as generalized anxiety disorder, posttraumatic stress disorder, panic disorder, obsessive-compulsive disorder or social anxiety disorder), attention deficit disorder, mania, manic-depressive illness, schizophrenia, mood disorders, stress, sleep disorders, attacks, memory impairment, cognitive impairment, dementia, amnesia, delirium, obesity, eating disorder, appetite disorder, hyperphagia, bulimia, cibophobia, diabetes, cardiovascular diseases, hypertension, dyslipidemia, myocardial infarction, movement disorder (such as Parkinson's disease, epilepsy, convulsion or tremor), drug abuse, drug addiction or sexual dysfunction, based on a melanin-concentrating hormone receptor (MCH receptor) antagonistic action.SOLUTIONA compound, a pharmaceutically acceptable salt or a hydrate thereof represented by the formula (I).
摘要翻译： 提供用于预防或治疗抑郁症，焦虑症（例如广泛性焦虑症，创伤后应激障碍，恐慌症，强迫症或社会焦虑症）的新型化合物，其药学上可接受的盐或水合物，注意力 缺陷障碍，躁狂症，躁狂抑郁症，精神分裂症，情绪障碍，压力，睡眠障碍，攻击，记忆障碍，认知障碍，痴呆，遗忘症，del妄，肥胖，进食障碍，食欲障碍，食欲过盛，贪食症， 基于黑色素浓度激素受体（MCH受体）拮抗作用的心血管疾病，高血压，血脂异常，心肌梗塞，运动障碍（例如帕金森病，癫痫，惊厥或震颤），药物滥用，药物成瘾或性功能障碍。 解决方案由式（I）表示的化合物，其药学上可接受的盐或其水合物。
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公开(公告)号：US08259344B2
公开(公告)日：2012-09-04
申请号：US12333627
申请日：2008-12-12
申请人： Hidehisa Mabuchi , Tsuyoshi Shibata
发明人： Hidehisa Mabuchi , Tsuyoshi Shibata
IPC分类号： G06F15/00
CPC分类号： G06F15/00 , B41J19/142 , B41J29/02 , B41J29/393
摘要： There is provided an ink jet printing apparatus in which unevenness that may occur at the edges of printing areas can be reduced also for various printing media including unspecified printing media. In the ink jet printing apparatus which uses a print head for ejecting ink and performs printing by scanning a predetermined area on a printing medium with the print head multiple times, the multiple times of scan including a forward scan and a backward scan, the apparatus comprising: a control unit that cases the print head to print patterns each of which is printed through multiple times of scan of the print head and has different portions in a time interval between the multiple times of scan, with different printing ratios for the multiple times of scan; and a setting unit that sets the printing ratios based on the test patterns.
摘要翻译： 提供了一种喷墨打印设备，其中，对于包括未指定的打印介质的各种打印介质，可以减少在打印区域的边缘处可能发生的不均匀性。 在使用用于喷墨的打印头并通过在打印头上多次扫描打印介质上的预定区域进行打印的喷墨打印设备中，包括正扫描和反向扫描的多次扫描包括 ：控制单元，其将打印头设置为打印通过打印头的多次扫描打印的图案，并且在多次扫描之间的时间间隔中具有不同的部分，具有不同的打印倍数 扫描 以及设置单元，其基于测试图案来设置打印率。
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