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公开(公告)号：US06436248B1
公开(公告)日：2002-08-20
申请号：US09434590
申请日：1999-11-05
申请人： Heinz Baur , Ralf Bluethner , Hans Buchberger , Klaus Goedicke , Michael Junghaehnel , Karl-Heinz Lehnert , Manfred Mueller , Hans-Herrman Schneider , Torsten Winkler
发明人： Heinz Baur , Ralf Bluethner , Hans Buchberger , Klaus Goedicke , Michael Junghaehnel , Karl-Heinz Lehnert , Manfred Mueller , Hans-Herrman Schneider , Torsten Winkler
IPC分类号： C23C1434
CPC分类号： G11B5/7325 , C23C14/165 , C23C14/34
摘要： A method of coating of thin film coated magnetic disks and thin film magnetic disks made thereby is described. In accordance with the invention, a barrier layer is deposited on the substrate before the underlayer film(s) to increase the corrosion resistance of metallic substrate magnetic disks and, in the case of nonmetallic substrates, to reduce the diffusion of water to the substrate and of freely moveable ions from the substrate. Preferably the barrier layer is deposited by medium frequency pulsed sputtering at a frequency of 10 to 200 kHz and a pulse length to pulse pause ratio from 5:1 to 1:10. Aluminum or chromium are the preferred materials for the barrier layer. Additional improvements may be achieved where the sputtering process gas contains a proportion of oxygen and/or nitrogen.
摘要翻译： 描述了由此制成的薄膜涂覆磁盘和薄膜磁盘的涂覆方法。 根据本发明，在下层膜之前在衬底上沉积阻挡层以提高金属基底磁盘的耐腐蚀性，并且在非金属基底的情况下，减少水向衬底的扩散， 可自由移动的离子。 优选地，阻挡层通过中频脉冲溅射以10至200kHz的频率和脉冲长度与脉冲间隔比从5:1沉积到1:10。 铝或铬是阻挡层的优选材料。 当溅射工艺气体含有一部分氧和/或氮时，可以实现另外的改进。
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公开(公告)号：US06605312B2
公开(公告)日：2003-08-12
申请号：US09962212
申请日：2001-09-26
申请人： Torsten Winkler , Ralf Blüthner , Klaus Goedicke , Michael Junghähnel , Hans Buchberger , Manfred Müller , Arno Hebgen , Hans-Hermann Schneider
发明人： Torsten Winkler , Ralf Blüthner , Klaus Goedicke , Michael Junghähnel , Hans Buchberger , Manfred Müller , Arno Hebgen , Hans-Hermann Schneider
IPC分类号： B05D100
CPC分类号： C23C14/35 , C23C16/515
摘要： Production of a thin-film system containing at least one ultra-thin film, preferentially in the film thickness range from 1 to 10 nm, which is deposited by plasma-aided chemical or physical vapor-phase deposition using magnetron discharges. The method is characterized in that in the course of deposition of the ultra-thin film the power output is introduced into the plasma in the form of a controlled number of power pulses and that the average power output during the pulse-on time is set higher by a factor of at least 3 than the averaged power output over the entire coating time during deposition of the ultra-thin film.
摘要翻译： 生产含有至少一种超薄膜的薄膜系统，优选在1至10nm的膜厚度范围内，其通过使用磁控管放电的等离子体辅助化学或物理气相沉积来沉积。 该方法的特征在于，在沉积超薄膜的过程中，功率输出以受控数量的功率脉冲的形式被引入到等离子体中，并且将脉冲接通时间期间的平均功率输出设置得更高 比在超薄膜沉积期间的整个涂布时间的平均功率输出至少3倍。
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公开(公告)号：US07972486B2
公开(公告)日：2011-07-05
申请号：US11279047
申请日：2006-04-07
IPC分类号： C23C14/34
CPC分类号： C23C14/56 , H01J37/32431 , H01J37/32458
摘要： A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.
摘要翻译： 用于涂覆用于生产显示屏的透明基板的机器包括具有模块化设计的涂布室。 每个模块1具有腔室部分2，可移除地布置在腔室部分2中或在腔室部分2中的第一支撑件3，以及可移除地布置在第一支撑件3处的第二支撑件4.而第一支撑件3承载阴极 ，第二支撑件4形成为盖，在该盖处布置有用于在涂覆室中产生真空的泵。 载体3和4可以从腔室部分2侧向移除到可以在模块部件之间形成人员可接近的区域11a，11b。 以这种方式，机器的组件容易接近，例如用于维护目的。 可以在阴极和室内同时进行工作。
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