摘要:
Photoprotective/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair, as well as of a wide variety of other photosensitive materials and substrates, e.g., inorganic or organic glasses, plastics or the like, against the deleterious effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel insoluble benzalmalonate/phenylcyanoacrylate-substituted s-triazine compound having the structural formula (I): ##STR1## in which R.sub.1, R.sub.1 ' and R.sub.1 ", which may be identical or different, are each a monovalent radical having one of the formulae (A) or (B) below: ##STR2##
摘要:
Photoprotective/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair, as well as of a wide variety of other photosensitive materials and substrates, e.g., inorganic or organic glasses, plastics or the like, against the deleterious effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel insoluble benzalmalonate/phenylcyanoacrylate-substituted s-triazine compound having the structural formula (I): ##STR1## in which R.sub.1, R.sub.1 ' and R.sub.1 ", which may be identical or different, are each a monovalent radical having one of the formulae (A) or (B) below:
摘要:
Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel benzotriazole-substituted polyorganosiloxane/polyorganosilane having one of the formulae (1) to (3): ##STR1## wherein A is a monovalent benzotriazole radical bonded directly to a silicon atom and having the formula (4): ##STR2##
摘要:
Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel benzotriazole-substituted polyorganosiloxane/polyorganosilane having one of the formulae (1) to (3): ##STR1##A--Si(R').sub.3 (3)wherein A is a monovalent benzotriazole radical which comprises an acrylate or acrylamide functional group, which is bonded directly to a silicon atom, and which has the formula (4): ##STR2##
摘要:
The use of linear or cyclic silicon compounds containing at least one chromophoric group of quinone or azo type as direct dyes in dye compositions intended for dyeing human keratin fibres and in particular the hair. The invention also relates to novel silicon compounds and dye compositions containing them, as well as to the corresponding direct dyeing process.
摘要:
Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel benzotriazole-substituted polyorganosiloxane/polyorganosilane having one of the formulae (1) to (3): ##STR1## wherein A is a monovalent benzotriazole radical which comprises an acrylate or acrylamide functional group, which is bonded directly to a silicon atom, and which has the formula (4): ##STR2##
摘要:
Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel benzotriazole-substituted polyorganosiloxane/polyorganosilane having one of the formulae (1) to (3): ##STR1## wherein A is a monovalent benzotriazole radical bonded directly to a silicon atom and having the formula (4): ##STR2## the compounds of formulae (1) to (3) are prepared, e.g., via hydrosilylation, from novel intermedates, per se also exhibiting sunscreen activity, and having the formula (4a): ##STR3##
摘要:
Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel cinnamonitrile-substituted polyorganosiloxane/polyorganosilane.
摘要:
Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel cinnamonitrile-substituted polyorganosiloxane/polyorganosilane having one of the formulae (1) to (3): ##STR1## wherein A is a monovalent cinnamonitrile radical which comprises an alkylene or alkyleneoxy bridging group, which is bonded directly to a silicon atom, and which has the formula (4): ##STR2##
摘要:
Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel sulfonamido-functional polyorganosiloxane/polyorganosilane having one of the formulae (1) to (3): ##STR1## wherein A is a monovalent benzylidenecamphor radical which comprises a sulfonamido-functional bridging group, which is bonded directly to a silicon atom, and which has the formula. (4.1) ##STR2##