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公开(公告)号：US20130141735A1
公开(公告)日：2013-06-06
申请号：US13488322
申请日：2012-06-04
IPC分类号： G01B11/14
CPC分类号： G01B11/14 , G01B11/002
摘要： A target (16) for a metrology system (10) that monitors the position of an object (12) includes a target housing (225) and a photo detector assembly (226). The target housing (225) can include a first target surface (218A), and a second target surface (218B) that is at an angle relative to the first target surface (218A). The photo detector assembly (226) can include a first detector (220A) that is secured to the first target surface (218A), and a second detector (220B) that is secured to the second target surface (218B). Each of the detectors (220A) (220B) can be a quad cell that includes four detector cells (238A) (238B) (238C) (238D) that are separated by a gap (236).
摘要翻译： 用于监测物体（12）的位置的测量系统（10）的目标（16）包括目标壳体（225）和光电检测器组件（226）。 目标壳体（225）可以包括第一目标表面（218A）和相对于第一目标表面（218A）成一定角度的第二目标表面（218B）。 光检测器组件（226）可以包括固定到第一目标表面（218A）的第一检测器（220A）和固定到第二目标表面（218B）的第二检测器（220B）。 每个检测器（220A）（220B）可以是四边形单元，其包括由间隙（236）分开的四个检测器单元（238A）（238B）（238C）（238D）。
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公开(公告)号：US20120050726A1
公开(公告)日：2012-03-01
申请号：US13214717
申请日：2011-08-22
申请人： W. Thomas Novak , Daniel G. Smith , Lloyd Holland
发明人： W. Thomas Novak , Daniel G. Smith , Lloyd Holland
IPC分类号： G01J1/00
CPC分类号： G01B11/14 , G01B11/002 , G01S5/16 , G01S5/163 , G01S17/00
摘要： A metrology system that uses a plurality of photo-detecting targets positioned on the objects to be assembled, a plurality of rotating photo-emitting heads, a master signal generator that generates a reference RF signal, and a signal processor that determines the position of each of the targets from signals generated by each target in response to the photo-emitting heads. During operation, the reference RF signal is broadcast to the rotating photo-emitting heads and the photo-detecting targets. The RF signal is used to determine the azimuth of the heads relative to a zero reference position to a high degree of accuracy.
摘要翻译： 一种测量系统，其使用位于要组装的物体上的多个光检测目标，多个旋转光发射头，产生参考RF信号的主信号发生器，以及确定每个 从由每个目标响应于光发射头的信号产生的目标。 在操作期间，将参考RF信号广播到旋转的光发射头和光检测目标。 RF信号用于以高精确度确定磁头相对于零参考位置的方位角。
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公开(公告)号：US07932989B2
公开(公告)日：2011-04-26
申请号：US11808850
申请日：2007-06-13
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
摘要翻译： 用于浸没式光刻设备的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，通过该曝光区域将图像图案投影到诸如晶片的工件上。 这些喷嘴各自适于选择性地用作用于将流体供应到曝光区域中的源喷嘴或用作从曝光区域回收流体的回收喷嘴。 流体控制装置用于使得在曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴并且使所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得可以建立期望的流动模式 为了方便浸没光刻。
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公开(公告)号：US07889207B2
公开(公告)日：2011-02-15
申请号：US11704404
申请日：2007-02-08
申请人： Li Hong , Maki Suzuki , Mark Takita , W. Thomas Novak
发明人： Li Hong , Maki Suzuki , Mark Takita , W. Thomas Novak
CPC分类号： H04N5/235 , G06T5/002 , G06T5/009 , G06T5/20 , G06T5/40 , G06T5/50 , G06T2207/10024 , G06T2207/20012 , G06T2207/20192 , H04N5/2355 , H04N5/243 , H04N2101/00
摘要： An image apparatus (10) for providing an adjusted image (242) of a scene (236) includes a capturing system (16) and a control system (24). The capturing system (16) captures an underexposed first frame (240) that is defined by a plurality of pixels (240A), including a first pixel and a second pixel. The first frame (240) includes at least one of a first texture region (240S) and a second texture region (240T). The control system (24) can analyze information from the pixels (240A) and determine if the first pixel has captured a portion of the first texture region (240S) or the second texture region (240T). Further, the control system (16) can analyze information from the pixels (240A) and to determine if the second pixel has captured a portion of the first texture region (240S) or the second texture region (240T). With this design, the control system (16) can reduce the noise in the first frame (240) to provide a well exposed adjusted image (242).
摘要翻译： 用于提供场景（236）的调整图像（242）的图像设备（10）包括捕获系统（16）和控制系统（24）。 捕获系统（16）捕获由包括第一像素和第二像素的多个像素（240A）限定的曝光不足的第一帧（240）。 第一框架（240）包括第一纹理区域（240S）和第二纹理区域（240T）中的至少一个。 控制系统（24）可以分析来自像素（240A）的信息，并且确定第一像素是否已经捕获了第一纹理区域（240S）或第二纹理区域（240T）的一部分。 此外，控制系统（16）可以分析来自像素（240A）的信息，并且确定第二像素是否已经捕获了第一纹理区域（240S）或第二纹理区域（240T）的一部分。 利用这种设计，控制系统（16）可以减少第一帧（240）中的噪声，以提供良好曝光的调整图像（242）。
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公开(公告)号：US07821615B2
公开(公告)日：2010-10-26
申请号：US11808850
申请日：2007-06-13
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
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6.发明授权公开(公告)号：US07720371B2
公开(公告)日：2010-05-18
申请号：US11655501
申请日：2007-01-18
申请人： Li Hong , Mark Takita , W. Thomas Novak
发明人： Li Hong , Mark Takita , W. Thomas Novak
CPC分类号： G03B13/18
摘要： A camera (210) for providing an adjusted image (214) of a scene (12) includes an apparatus frame (224), an optical assembly (222), a capturing system (226), and a control system (232). The optical assembly (222) is adjustable to alternatively be focused on a first focal area (356A) and a second focal area (356B) that is different than the first focal area (356A). The capturing system (226) captures a first captured image (360A) when the optical assembly (222) is focused at the first focal area (356A) and captures a second captured image (360B) when the optical assembly (222) is focused at the second focal area (356B). The control system (232) provides the adjusted image (214) of the scene (12) based upon the first captured image (360A) and the second captured image (360B). Additionally, the control system (232) can perform object depth extraction of one or more objects (16) (18) (20) in the scene (12). Alternatively, the multiple captured images (360A) (360B) can be adjusted by a separate adjustment system (680).
摘要翻译： 用于提供场景（12）的调整图像（214）的相机（210）包括装置框架（224），光学组件（222），捕获系统（226）和控制系统（232）。 光学组件（222）可调节以可选地聚焦在与第一焦点区域（356A）不同的第一焦点区域（356A）和第二焦点区域（356B）上。 当光学组件（222）被聚焦在第一焦点区域（356A）时，捕获系统（226）捕获第一捕获图像（360A），并且当光学组件（222）被聚焦在第二捕获图像 第二重点领域（356B）。 控制系统（232）基于第一拍摄图像（360A）和第二拍摄图像（360B）提供场景（12）的调整图像（214）。 此外，控制系统（232）可以对场景（12）中的一个或多个物体（16）（18）（20）进行物体深度提取。 或者，多个拍摄图像（360A）（360B）可以通过单独的调整系统（680）进行调整。
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7.发明申请公开(公告)号：US20090262322A1
公开(公告)日：2009-10-22
申请号：US12457742
申请日：2009-06-19
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G03B27/54
CPC分类号： G03F7/70258 , G03F7/2041 , G03F7/70341 , G03F7/70641 , G03F7/70958 , G03F9/7026 , G03F9/7034
摘要： A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. In addition, a gap is formed between a member and a surface, through which the exposure beam does not pass, of the optical element. A suction is provided to the gap.
摘要翻译： 光刻投影装置包括光学元件，通过该光学元件，用曝光光束照射基板。 在曝光期间，光学元件和基板之间的空间被填充液体。 此外，光学元件之间的部件和曝光光束不通过的表面之间形成间隙。 向间隙提供吸力。
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公开(公告)号：US06963821B2
公开(公告)日：2005-11-08
申请号：US10361700
申请日：2003-02-11
申请人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
发明人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
CPC分类号： G03F7/70766 , B23Q11/0032 , G03F7/70725
摘要： A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.
摘要翻译： 晶片台反质量组件通常包括支撑一个或多个阶段的基座和第一和第二反作用力。 第一和第二阶段以一个或多个自由度移动。 反恐怖主义至少有一个自由度，在理想条件下，可以抵抗运行阶段的运动，从而保持系统的重心，避免不必要的身体运动。 然而，在实际情况下，反恐怖主义可能在行进或超越其理想轨迹。 为了更紧密地跟踪理想轨迹，控制器启动微调电机，以将小的力施加到反作用体上，将其推向Y方向的参考位置。 第二实施例还考虑到X位置，以消除扭矩的阶段。
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公开(公告)号：US06815695B2
公开(公告)日：2004-11-09
申请号：US10056017
申请日：2002-01-28
申请人： W. Thomas Novak , Douglas C. Watson
发明人： W. Thomas Novak , Douglas C. Watson
IPC分类号： H01L2100
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70741 , G03F7/70975 , H01J37/16
摘要： A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or pivotably attached thereto. The angled opening provides access to a reticle stage housed within the reticle chamber. The angled opening further permits removal of the reticle stage from the reticle chamber without having to disassemble and remove the optics system of the electron beam system. This reduces maintenance and repair costs, as well as reduces down time of the electron beam system.
摘要翻译： 与电子束系统一起使用的简化掩模版去除系统。 简化的掩模版去除系统包括具有成角度的开口的标线室和可拆卸地或可枢转地附接到其上的维护面板。 倾斜的开口提供了进入分隔板室内的掩模版阶段。 成角度的开口还允许从标线室移除光罩台，而不必拆卸和移除电子束系统的光学系统。 这样可以减少维护和修理成本，同时减少电子束系统的停机时间。
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公开(公告)号：US06717159B2
公开(公告)日：2004-04-06
申请号：US09952444
申请日：2001-09-13
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： A61N500
CPC分类号： G03F7/707 , G03F7/70708
摘要： A chuck assembly for use in semiconductor processing equipment includes elements that permit reticle expansion and assembly misalignment without additional reticle deformation. Reticle expansion is allowed by flexible support elements that are positioned to move in the direction of expansion, but that also combine to provide the control necessary for processing. Misalignment is allowed by connections that attach the reticle securely and uniquely to the support elements despite some amount of imperfection in the reticle, or the connections themselves. Accounting in this way for expansion and misalignment prevents additional reticle distortion and thus improves the accuracy of the product.
摘要翻译： 用于半导体加工设备的卡盘组件包括允许掩模版扩展和组装不对准的元件，而没有额外的掩模版变形。 通过定位成在膨胀方向上移动的柔性支撑元件允许标线片膨胀，但也结合起来提供加工所需的控制。 尽管在掩模版或连接本身中存在一些缺陷，但是通过将掩模版牢固且唯一地附着到支撑元件的连接允许不对准。 以这种方式计量膨胀和不对准会妨碍附加的标线失真，从而提高产品的准确性。
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