公开(公告)号：US07522259B2

公开(公告)日：2009-04-21

申请号：US11237651

申请日：2005-09-29

申请人： Andrew J Hazelton ,  Hidemi Kawai ,  Douglas C Watson ,  W Thomas Novak

发明人： Andrew J Hazelton ,  Hidemi Kawai ,  Douglas C Watson ,  W Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.

摘要翻译： 浸没式光刻设备具有分隔板台，其布置成保持掩模版，布置成保持工件的工作台，以及包括照明源和与工件相对的光学元件的光学系统，用于具有通过辐射投射的掩模版的图像图案 照明源。 在光学元件和工件之间限定间隙，并且流体供应装置用于将浸没液体供应到该间隙中，使得所提供的浸没液体在浸没式光刻工艺期间与光学元件和工件接触。 一种清洁装置，用于在净化过程中从光学元件中去除吸收的液体。 清洁装置可以利用对吸收的液体具有亲和性的清洁液体，热，真空条件，超声波振动或气泡以去除吸收的液体。 可以通过设置有诸如阀门的开关装置的相同的流体施加装置来供应清洁液体。

公开(公告)号：US08797500B2

公开(公告)日：2014-08-05

申请号：US12292251

申请日：2008-11-14

申请人： Derek Coon ,  Andrew J Hazelton

发明人： Derek Coon ,  Andrew J Hazelton

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet is controlled based on the motion of the surface such that a pressure exerted by the gas is made stronger or weaker depending on the motion of the surface.

摘要翻译： 浸没式光刻设备包括光学构件，限定在光学构件和与填充有浸没液体的光学构件相对设置的表面之间的间隙，以及包括气体出口的流体控制装置，通过该气体出口供应气体以防止浸没 液体进入暴露区域外部的环绕区域。 基于表面的运动来控制从气体出口供给的气体的流速，使得由气体施加的压力根据表面的运动变得更强或更弱。

公开(公告)号：US08497973B2

公开(公告)日：2013-07-30

申请号：US11878540

申请日：2007-07-25

申请人： Derek Coon ,  Andrew J Hazelton

发明人： Derek Coon ,  Andrew J Hazelton

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet depends on a contact angle between the immersion liquid and the surface.

摘要翻译： 浸没式光刻设备包括光学构件，限定在光学构件和与填充有浸没液体的光学构件相对设置的表面之间的间隙，以及包括气体出口的流体控制装置，通过该气体出口供应气体以防止浸没 液体进入暴露区域外部的环绕区域。 从气体出口供给的气体的流速取决于浸没液体和表面之间的接触角。

公开(公告)号：US08508718B2

公开(公告)日：2013-08-13

申请号：US12318122

申请日：2008-12-22

申请人： Andrew J Hazelton ,  Hiroaki Takaiwa

发明人： Andrew J Hazelton ,  Hiroaki Takaiwa

IPC分类号： G03B27/58

CPC分类号： G03F7/70975 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  Y10T29/49826

摘要： Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.

摘要翻译： 方法和装置允许液体基本上容纳在浸没式光刻系统的透镜和晶片台组件之间。 根据一个示例，曝光装置包括透镜和晶片台组件。 晶片台组件具有顶表面，并且被布置成支撑晶片相对于透镜以及至少一个部件移动。 晶片的顶表面和部件的顶表面各自与晶片台组件的顶表面基本相同的高度。 包括晶片的顶表面，晶片台组件的顶表面和至少一个部件的顶表面的晶片台组件的整个顶表面基本上是平面的。

公开(公告)号：US07339650B2

公开(公告)日：2008-03-04

申请号：US11237650

申请日：2005-09-29

申请人： Derek Coon ,  Andrew J Hazelton

发明人： Derek Coon ,  Andrew J Hazelton

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： A fluid control system for immersion lithography that uses an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, includes a fluid-supplying device for providing an immersion fluid such as water to a specified exposure area in the gap, and a fluid control device that activates a force on the fluid so that the immersion fluid is retained in the exposure area and its vicinity at least while the immersion lithography operation is being carried out. A pressured gas may be caused to apply a hydrodynamic force on the fluid to keep it in its place.

摘要翻译： 一种用于浸没式光刻的流体控制系统，其使用诸如透镜的光学构件，诸如半导体晶片的工件，具有与光学构件相对的表面设置在其间的间隙，所述液体控制系统包括用于提供浸液的流体供应装置 例如水到间隙中的指定曝光区域;以及流体控制装置，其至少在进行浸没光刻操作时，激活流体上的力，使得浸没流体保持在曝光区域及其附近。 可能导致加压气体对流体施加流体动力以将其保持在其位置。

公开(公告)号：US07301607B2

公开(公告)日：2007-11-27

申请号：US11319399

申请日：2005-12-29

申请人： Andrew J Hazelton ,  Hiroaki Takaiwa

发明人： Andrew J Hazelton ,  Hiroaki Takaiwa

IPC分类号： G03B27/32 ,  G03B27/58

CPC分类号： G03F7/70975 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  Y10T29/49826

摘要： Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.

公开(公告)号：US08102501B2

公开(公告)日：2012-01-24

申请号：US11878547

申请日：2007-07-25

申请人： Derek Coon ,  Andrew J Hazelton

发明人： Derek Coon ,  Andrew J Hazelton

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member, a fluid-supplying device which provides an immersion liquid to the gap, and a field generator which generates a magnetic field or an electric field such that the immersion liquid is subjected to the magnetic or electric field generated by the field generator.

摘要翻译： 浸没式光刻设备包括光学构件，在光学构件和与光学构件相对设置的表面之间限定的间隙，向间隙提供浸没液体的流体供应装置和产生磁场的场发生器， 电场使得浸没液体受到场发生器产生的磁场或电场的影响。

公开(公告)号：US07486380B2

公开(公告)日：2009-02-03

申请号：US11606913

申请日：2006-12-01

申请人： Andrew J Hazelton ,  Hiroaki Takaiwa

发明人： Andrew J Hazelton ,  Hiroaki Takaiwa

IPC分类号： G03B27/32 ,  G03B27/42

CPC分类号： G03F7/70975 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  Y10T29/49826

摘要： Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.

摘要翻译： 方法和装置允许液体基本上容纳在浸没式光刻系统的透镜和晶片台组件之间。 根据一个示例，曝光装置包括透镜和晶片台组件。 晶片台组件具有顶表面，并且被布置成支撑晶片相对于透镜以及至少一个部件移动。 晶片的顶表面和部件的顶表面各自与晶片台组件的顶表面基本相同的高度。 包括晶片的顶表面，晶片台组件的顶表面和至少一个部件的顶表面的晶片台组件的整个顶表面基本上是平面的。

公开(公告)号：US07456930B2

公开(公告)日：2008-11-25

申请号：US11819089

申请日：2007-06-25

申请人： Andrew J Hazelton ,  Michael Sogard

发明人： Andrew J Hazelton ,  Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion fluid that is directly between the fluid barrier and the device. The fluid barrier can include a scavenge inlet that is positioned near the device, and the immersion fluid system can include a low pressure source that is in fluid communication with the scavenge inlet. The fluid barrier confines any vapor of the immersion fluid and prevents it from perturbing a measurement system. Additionally, the environmental system can include a bearing fluid source that directs a bearing fluid between the fluid barrier and the device to support the fluid barrier relative to the device.