Detection device
    5.
    发明授权
    Detection device 失效
    检测装置

    公开(公告)号:US4605853A

    公开(公告)日:1986-08-12

    申请号:US655373

    申请日:1984-09-27

    CPC分类号: G01D5/34715

    摘要: A supporting mechanism for a fixed detection section in a detection device comprises the fixed detection section and a rotary detection section. The mechanism comprises a plate spring and a supporting plate. The plate spring is mounted on a fixed housing of a drive motor in spaced relation thereto, and has at least in part an elastic portion whose resilient force direction along an axial direction of the rotary shaft. The supporting plate of a ring shape has a plurality of elongated apertures formed therein along a concentric line, and is mounted on the plate spring in spaced relation thereto. The fixed detection section is fixedly connected with screws through the elongated apertures to the supporting plate.

    摘要翻译: 检测装置中的固定检测部的支撑机构包括固定检测部和旋转检测部。 该机构包括板簧和支撑板。 板簧安装在驱动电动机的与壳体间隔开的固定壳体上,并且至少部分地具有沿着旋转轴的轴向的弹性力方向的弹性部分。 环形的支撑板具有沿着同心线形成在其中的多个细长孔,并以与其成间隔的关系安装在板簧上。 固定检测部分通过细长孔与螺钉固定连接到支撑板。

    METHOD FOR FABRICATING SUBSTRATE FOR SOLAR CELL AND SOLAR CELL
    6.
    发明申请
    METHOD FOR FABRICATING SUBSTRATE FOR SOLAR CELL AND SOLAR CELL 审中-公开
    用于制造太阳能电池和太阳能电池基板的方法

    公开(公告)号:US20130306148A1

    公开(公告)日:2013-11-21

    申请号:US13982104

    申请日:2012-01-27

    IPC分类号: H01L31/0236

    摘要: The problem addressed by the present invention is providing a technique for fabricating, by a method simpler than conventional methods, a silicon substrate that is effective for light trapping, one surface of which has a textured structure and the other surface of which has higher reflectivity than the surface having the textured structure. The fabrication method for this semiconductor substrate comprises: a sandblasting step in which a first surface of a silicon substrate in an as-sliced state, fabricated by slicing a silicon ingot, is surface treated by sandblasting and, after the sandblasting step, a step for carrying out surface treatment using an etching solution that contains either or both of hydrofluoric acid and nitric acid on the silicon substrate.

    摘要翻译: 本发明所解决的问题是提供一种通过比传统方法简单的方法制造对于光捕获有效的硅衬底的技术,其一个表面具有纹理结构,另一个表面的反射率比 该表面具有纹理结构。 该半导体衬底的制造方法包括:喷砂步骤,通过喷砂表面处理以硅锭切片制成的切片状态的硅衬底的第一表面,并且在喷砂步骤之后, 使用在硅衬底上含有氢氟酸和硝酸中的任一种或两者的蚀刻溶液进行表面处理。