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1.发明授权Method of manufacturing stamper for manufacturing information medium, stamper, and photoresist master 失效用于制造信息介质，压模和光致抗蚀剂母版的压模的方法公开(公告)号：US07204188B2
公开(公告)日：2007-04-17
申请号：US10500816
申请日：2003-01-06
IPC分类号： B41F33/00
摘要： A stamper with a sharp uneven pattern for manufacturing high precision information media and a method of manufacturing a stamper. The method includes (1) manufacturing a photoresist master by forming a light absorption layer and a photoresist layer on substrate, (2) forming a latent image on the photoresist layer, and an uneven pattern in the photoresist layer by developing the latent image, (3) forming a Ni thin film on the uneven pattern by electroless plating, (4) forming a Ni film on the Ni thin film, and (5) removing the Ni thin film and the Ni film from the photoresist master. The method also includes, prior to the step of forming the Ni thin film on the photoresist layer, a metal catalyst being provided on the surface of the uneven pattern, the metal catalyst being activated, and the surface of the uneven pattern being washed with ultra pure water.
摘要翻译： 具有用于制造高精度信息介质的尖锐不均匀图案的压模以及制造压模的方法。 该方法包括：（1）通过在基板上形成光吸收层和光致抗蚀剂层来制造光致抗蚀剂母版，（2）通过显影潜像在光致抗蚀剂层上形成潜像和不透明图案（ 3）通过化学镀在不平坦图案上形成Ni薄膜，（4）在Ni薄膜上形成Ni膜，（5）从光致抗蚀剂母版中去除Ni薄膜和Ni薄膜。 该方法还包括在光致抗蚀剂层上形成Ni薄膜的步骤之前，在不均匀图案的表面上设置金属催化剂，使金属催化剂活化，不均匀图案的表面用超级清洗 纯净水。
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2.发明申请Method of manufacturing stamper for manufacturing information medium, stamper, and photoresist master 失效用于制造信息介质，压模和光致抗蚀剂母版的压模的方法公开(公告)号：US20050039621A1
公开(公告)日：2005-02-24
申请号：US10500816
申请日：2003-01-06
摘要： A stamper with a sharp uneven pattern is obtained, and high precision information media can be manufactured using this stamper. A method of manufacturing a stamper comprises the steps of manufacturing a photoresist master 100 by forming a light absorption layer 103 and a photoresist layer 104 on top of a substrate 102, forming a latent image on the photoresist layer 104, and then forming an uneven pattern 106 in the photoresist layer 104 by developing the latent image, forming a Ni thin film 108 on the uneven pattern 106 of the photoresist master 100 by electroless plating, forming a Ni film 110 on top of the Ni thin film 108, and then removing the Ni thin film 108 and the Ni film 110 from the photoresist master 100 to form the stamper 120, wherein as preliminary treatments prior to the step of forming the Ni thin film 108 on the photoresist layer 104, a metal catalyst is provided on the surface of the uneven pattern 106, the metal catalyst is activated, and the surface of the uneven pattern 106 on which the metal catalyst has been provided is washed with ultra pure water.
摘要翻译： 获得具有尖锐不均匀图案的压模，并且可以使用该压模来制造高精度的信息介质。 制造压模的方法包括以下步骤：通过在衬底102的顶部上形成光吸收层103和光致抗蚀剂层104，在光致抗蚀剂层104上形成潜像，然后形成不均匀图案来制造光致抗蚀剂母版100 通过显影潜像在光致抗蚀剂层104中，通过无电镀在光致抗蚀剂母版100的不平坦图案106上形成Ni薄膜108，在Ni薄膜108的顶部形成Ni膜110，然后除去 Ni薄膜108和来自光致抗蚀剂母版100的Ni膜110以形成压模120，其中作为在光致抗蚀剂层104上形成Ni薄膜108的步骤之前的预处理，在 不均匀图案106，金属催化剂被活化，并且用超纯水洗涤其上提供金属催化剂的不平坦图案106的表面。
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公开(公告)号：US06704274B2
公开(公告)日：2004-03-09
申请号：US10193222
申请日：2002-07-12
申请人： Hiroaki Takahata , Hisaji Oyake
发明人： Hiroaki Takahata , Hisaji Oyake
IPC分类号： G11B724
CPC分类号： G11B7/24079 , G11B7/24076 , G11B7/24082 , G11B7/24085 , G11B7/261
摘要： A groove is present in a surface of a disc substrate. A part of the groove is curved toward another groove adjacent to the groove to thereby form a land pre-pit. The following relations hold among DG, DP and r: 0.267≦(DP/DG)2·r≦0.701; and 3.185≦(DP/DG)/r≦8.553, where DG: depth of the groove 4B, DP: depth of the land pre-pit 5A, r [&mgr;m]: distance between the center of the land pre-pit 5A and the center line of the groove 4B having the curved land pre-pit 5A.
摘要翻译： 在盘基片的表面存在凹槽。 槽的一部分向与槽相邻的另一个槽弯曲，从而形成焊盘预制坑。在DG，DP和r之间保持以下关系：其中DG：槽4B的深度，DP： 凹坑5A，r [mum]：焊盘预制槽5A的中心与具有弯曲的焊盘前凹坑5A的凹槽4B的中心线之间的距离。
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公开(公告)号：US06498777B2
公开(公告)日：2002-12-24
申请号：US09845273
申请日：2001-05-01
申请人： Hiroaki Takahata , Hisaji Oyake
发明人： Hiroaki Takahata , Hisaji Oyake
IPC分类号： G11B370
CPC分类号： G11B7/24085 , G11B7/007 , G11B7/26
摘要： In an optical recording medium comprising a substrate including parallel extending lands and grooves on one surface thereof, the grooves serving as recording tracks, and the lands being formed with prepits, the height HP of the land disposed between the prepit and the groove divided by the height HL of the land in a prepit-free region, both as measured from the groove bottom, i.e., HP/HL ranges from 0.25 to less than 1. This enables to significantly increase the recording density of the medium without a substantial cost increase.
摘要翻译： 在包括在其一个表面上具有平行的延伸焊盘和凹槽的基板的光学记录介质中，用作记录轨道的凹槽和用预凹坑形成的焊盘，设置在预凹坑和凹槽之间的焊盘的高度HP由 从凹槽底部测量，即HP / HL的范围从0.25到小于1，在无预浸渍区域中的焊盘的高度HL。这使得能够显着地增加介质的记录密度而不会显着地增加成本。
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5.发明申请Method for manufacturing stamper for information medium manufacture, stamper, and photoresist original disk 审中-公开用于信息介质制造，压模和光致抗蚀剂原盘的压模的制造方法公开(公告)号：US20050066825A1
公开(公告)日：2005-03-31
申请号：US10500008
申请日：2002-12-27
IPC分类号： G11B7/26
CPC分类号： G11B7/261 , G03F7/0017 , G11B7/263
摘要： A stamper with a sharp protrusion/depression pattern is obtained, and high precision information media can be produced using this stamper. A method of manufacturing a stamper comprises the steps of manufacturing a photoresist master 100 by laminating a light absorption layer 103 and a photoresist layer 104 on top of a substrate 102, and then forming an protrusion/depression pattern 106 in the photoresist layer 104 by forming and developing a latent image, providing Pd on the surface of the protrusion/depression pattern 106 as a preliminary treatment to conducting electroless plating onto the protrusion/depression pattern of the photoresist master 100, and forming a stamper 120 by forming a thin metal film 108 on top of the Pd-containing protrusion/depression pattern surface by using electroless plating, forming a Ni film 110 on top of this Ni thin film 108 using electroforming, and then removing the thin metal film 108 and the Ni film 110.
摘要翻译： 获得具有尖锐突起/凹陷图案的压模，并且可以使用该压模生产高精度信息介质。 制造压模的方法包括以下步骤：通过在基板102的顶部上层叠光吸收层103和光致抗蚀剂层104，然后在光致抗蚀剂层104中形成突起/凹陷图案106，通过形成 并显影潜像，在突起/凹陷图案106的表面上提供Pd作为对光致抗蚀剂母版100的突起/凹陷图案进行化学镀的初步处理，以及通过形成薄金属膜108形成压模120 通过使用无电解电镀在含Pd的突起/凹陷图案表面的顶部上，使用电铸在该Ni薄膜108的顶部上形成Ni膜110，然后除去薄金属膜108和Ni膜110。
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6.发明申请Method for manufacturing stamper for information medium manufacture, stamper, and stamper intermediate with master disk 审中-公开用于制造用于信息介质制造的压模的方法，压模和用于主盘的压模公开(公告)号：US20050042427A1
公开(公告)日：2005-02-24
申请号：US10500719
申请日：2003-01-06
CPC分类号： G11B7/261 , G11B7/263 , Y10T428/24802
摘要： A stamper with a sharp uneven pattern and a favorable surface state is obtained. A photoresist master 100 is manufactured by forming a light absorption layer 103 and a photoresist layer 104, in that order, on top of a substrate 102, and then forming an uneven pattern 106 in the photoresist layer 104 by forming and developing a latent image, a Ni thin film 108 is formed on top of the uneven pattern 106 of the photoresist master 100 using either a sputtering method or a vapor deposition method, a Ni film 110 is formed on top of the Ni thin film 108, and then the Ni thin film 108 and the Ni film 110 are separated from the photoresist master 100 to form a stamper 120.
摘要翻译： 获得具有尖锐不均匀图案和良好表面状态的压模。 通过在基板102的顶部依次形成光吸收层103和光致抗蚀剂层104，然后通过形成和显影潜像在光致抗蚀剂层104中形成不均匀图案106来制造光致抗蚀剂母版100， 使用溅射法或气相沉积法在光致抗蚀剂母版100的不平坦图案106的顶部上形成Ni薄膜108，在Ni薄膜108的顶部形成Ni薄膜110，然后将Ni薄膜 膜108和Ni膜110与光致抗蚀剂母版100分离以形成压模120。
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7.发明申请Production method for photoresist master, production method for optical recording medium-producing stamper, stamper, phtoresist master, stamper intermediate element and optical recroding medium 审中-公开光致抗蚀剂母版的制造方法，光记录介质制造用模具的制造方法，压模，雕刻母版，压模中间元件和光学重绘介质公开(公告)号：US20050232130A1
公开(公告)日：2005-10-20
申请号：US10515404
申请日：2003-05-30
申请人： Hisaji Oyake , Hiroaki Takahata , Kenji Shirasuna
发明人： Hisaji Oyake , Hiroaki Takahata , Kenji Shirasuna
CPC分类号： G03F7/0017 , G11B7/261
摘要： A stamper (36) used for fabricating an optical recording medium is fabricated by forming a convexo-concave pattern (22) without development of a photoresist layer (16). A fabrication method of the stamper used for fabricating an optical recording medium includes: forming a light-absorbing layer (14) and the photoresist layer (16) on a glass substrate (10); forming the convexo-concave pattern (22) of undeveloped photoresist by irradiating the photoresist layer (16) with laser light from a surface of the photoresist layer that is opposite to the light-absorbing layer (14) so as to remove a part of the photoresist layer by energy of the laser light, thereby fabricating a photoresist master (26); forming a metal thin layer (28) on the convexo-concave pattern (22) in the photoresist master (26); forming a metal layer (30) on the metal thin layer (28) by electro-plating; and forming the stamper (36) by separating the metal thin layer (28) and the metal layer (30) from the photoresist master (26).
摘要翻译： 用于制造光学记录介质的压模（36）通过形成不形成光致抗蚀剂层（16）的凹凸图案（22）来制造。 用于制造光记录介质的压模的制造方法包括：在玻璃基板（10）上形成光吸收层（14）和光致抗蚀剂层（16）; 通过用来自与光吸收层（14）相对的光致抗蚀剂层的表面的激光照射光致抗蚀剂层（16），形成未显影的光致抗蚀剂的凹凸图案（22），以便去除部分 光致抗蚀剂层，由此制造光致抗蚀剂母版（26）; 在所述光致抗蚀剂主体（26）中的所述凹凸图案（22）上形成金属薄层（28）; 通过电镀在金属薄层（28）上形成金属层（30）; 以及通过从金属薄层（28）和金属层（30）与光刻胶母版（26）分离而形成压模（36）。
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8.发明申请Method for manufacturing stamper for information medium manufacture, stamper, and photoresist master disk 审中-公开用于制造信息介质制造，压模和光致抗蚀剂母盘的压模的方法公开(公告)号：US20050118534A1
公开(公告)日：2005-06-02
申请号：US10500893
申请日：2003-01-06
CPC分类号： G11B7/263
摘要： A stamper with a sharp uneven pattern is obtained, and high precision information media can be manufactured using this stamper. A photoresist master 100 is manufactured by forming a light absorption layer 103 with a film thickness T that satisfies T>180 (nm) and a photoresist layer 104, in that order, on top of a substrate 102, and then forming an uneven pattern 106 in the photoresist layer 104 by forming and developing a latent image, and a stamper 120 is manufactured by forming a Ni thin film 108 on top of the uneven pattern 106 of the photoresist master 100 by electroless plating, forming a Ni film 110 on top of this Ni thin film 108 by electroforming, and then separating the Ni thin film 108 and the Ni film 110 from the photoresist master 100.
摘要翻译： 获得具有尖锐不均匀图案的压模，并且可以使用该压模来制造高精度的信息介质。 通过在基板102的顶部依次形成具有满足T> 180（nm）的膜厚度T的光吸收层103和光致抗蚀剂层104，然后形成不均匀图案106来制造光致抗蚀剂母版100 通过形成潜像来形成和显影光致抗蚀剂层104，并且通过无电解电镀在光致抗蚀剂母版100的不平坦图案106的顶部上形成Ni薄膜108来制造压模120，在其上形成Ni膜110 该Ni薄膜108通过电铸，然后将Ni薄膜108和Ni薄膜110与光致抗蚀剂母版100分离。
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9.发明申请Stamper, mold system, recording medium substrate, recording medium, optical disc substrate, optical disc, and method for producing stamper 审中-公开压模，模具系统，记录介质基板，记录介质，光盘基板，光盘以及用于制造压模的方法公开(公告)号：US20050034617A1
公开(公告)日：2005-02-17
申请号：US10953517
申请日：2004-09-30
CPC分类号： B29C45/263 , B29C45/2632 , B29C2045/2667 , Y10T428/21 , Y10T428/2419
摘要： A stamper for forming a data recording region on a recording medium substrate by means of a transfer surface thereof. The transfer surface transfers a predetermined set of data to the recording medium substrate. The stamper is fitted on at least one of metal molds that are arranged opposite one another for forming the recording medium substrate. The stamper includes a stepped portion formed as bends in the material of the stamper. The stepped portion is configured to project from the transfer surface toward the recording medium substrate.
摘要翻译： 一种压模，用于通过其转印表面在记录介质基板上形成数据记录区域。 传送表面将预定的一组数据传送到记录介质基板。 压模安装在彼此相对布置的金属模具中的至少一个以形成记录介质基板。 压模包括在压模的材料中形成为弯曲部的台阶部分。 台阶部被配置为从转印面朝向记录介质基板突出。
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10.发明申请公开(公告)号：US20050006336A1
公开(公告)日：2005-01-13
申请号：US10495746
申请日：2002-11-29
申请人： Hiroaki Takahata , Hisaji Oyake
发明人： Hiroaki Takahata , Hisaji Oyake
CPC分类号： G11B7/261
摘要： An information medium master manufacturing method forms a latent image by emitting an exposing beam onto a photoresist layer formed on a light absorbing layer, then develops the latent image to expose a part of the light absorbing layer from the photoresist layer, dry etches the light absorbing layer using the photoresist layer as a mask to form concave parts in the light absorbing layer, and removes the remaining photoresist layer from the light absorbing layer to manufacture a master in which a protrusion/depression pattern is formed. The light absorbing layer is formed of a resin material such that the selection ratio of the etching rate of the photoresist layer to the etching rate of the light absorbing layer is 0.5 or above during the dry etching. By doing so, it is possible to ensure that the photoresist layer used as a mask remains even when the formation of concave parts of a desired depth is completed, so that problems such as rounding or shallow formation of the groove shapes of the concave parts can be avoided and it is possible to manufacture an information medium master with a sharp protrusion/depression pattern.
摘要翻译： 信息介质主制造方法通过将曝光光束发射到形成在光吸收层上的光致抗蚀剂层上形成潜像，然后使潜像显影以从光致抗蚀剂层暴露一部分光吸收层，干燥蚀刻光吸收 使用光致抗蚀剂层作为掩模在光吸收层中形成凹部，并且从光吸收层中除去剩余的光致抗蚀剂层，以制造其中形成有突起/凹陷图案的母版。 光吸收层由树脂材料形成，使得在干蚀刻期间光致抗蚀剂层的蚀刻速率与光吸收层的蚀刻速率的选择比为0.5以上。 通过这样做，可以确保即使在形成所需深度的凹部的情况下，作为掩模使用的光致抗蚀剂层仍然保持，因此凹部的凹槽形状的圆形化或浅层形成等问题可以 并且可以制造具有尖锐突起/凹陷图案的信息介质主体。
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