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1.发明授权公开(公告)号：US08287749B2
公开(公告)日：2012-10-16
申请号：US12644208
申请日：2009-12-22
CPC分类号： G03F7/0002 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y40/00 , Y10T428/24802
摘要： The present invention provides a method of manufacturing a high-molecular thin film having a fine structure from a block-copolymer compound containing a block copolymer A as a main constituent composed of at least a block chain A1 and a block chain A2, and a block copolymer B as an accessory constituent composed of a block chain B1 miscible with a polymeric phase P1 mainly composed of the block chain A1 and a block chain B2 miscible with a polymeric phase P2 mainly composed of the block chain A2, and a substrate having a surface on which the block-copolymer compound is applied and on which a pattern member formed of a second material is discretely arranged to a surface part formed of a first material.
摘要翻译： 本发明提供一种制造具有微结构的高分子薄膜的方法，所述高分子薄膜是由嵌段共聚物化合物制成的，所述嵌段共聚物含有嵌段共聚物A作为至少由块链A1和嵌段链A2构成的主要成分，以及嵌段 共聚物B作为由与主要由嵌段链A1组成的聚合物相P1混合的嵌段链B1和与主要由嵌段链A2构成的聚合物相P2混合的嵌段链B2组成的辅助成分，以及具有表面 其上施加了嵌段共聚物化合物，并且其上由第二材料形成的图案构件离散地布置在由第一材料形成的表面部分上。
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公开(公告)号：US20100159214A1
公开(公告)日：2010-06-24
申请号：US12644208
申请日：2009-12-22
CPC分类号： G03F7/0002 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y40/00 , Y10T428/24802
摘要： The present invention provides a method of manufacturing a high-molecular thin film having a fine structure from a block-copolymer compound containing a block copolymer A as a main constituent composed of at least a block chain A1 and a block chain A2, and a block copolymer B as an accessory constituent composed of a block chain B1 miscible with a polymeric phase P1 mainly composed of the block chain A1 and a block chain B2 miscible with a polymeric phase P2 mainly composed of the block chain A2, and a substrate having a surface on which the block-copolymer compound is applied and on which a pattern member formed of a second material is discretely arranged to a surface part formed of a first material.
摘要翻译： 本发明提供一种制造具有微结构的高分子薄膜的方法，所述高分子薄膜是由嵌段共聚物化合物制成的，所述嵌段共聚物含有嵌段共聚物A作为至少由块链A1和嵌段链A2构成的主要成分，以及嵌段 共聚物B作为由与主要由嵌段链A1组成的聚合物相P1混合的嵌段链B1和与主要由嵌段链A2构成的聚合物相P2混合的嵌段链B2组成的辅助成分，以及具有表面 其上施加了嵌段共聚物化合物，并且其上由第二材料形成的图案构件离散地布置在由第一材料形成的表面部分上。
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公开(公告)号：US07767265B2
公开(公告)日：2010-08-03
申请号：US11751661
申请日：2007-05-22
IPC分类号： B05D3/02
摘要： It is an object to provide a microstructure having cylindrical microdomains oriented in the film thickness direction and arranged in a regular pattern, for which a microphase separation phenomenon of a block copolymer is utilized. The process for producing the microstructure includes 2 steps; the first step for arranging, on a substrate (40), a polymer layer at least containing a block copolymer having a first block which constitutes a continuous phase (10) of the microstructure (30) and a second block which constitutes microdomains (20) dispersed in the continuous phase (10) and oriented in the thickness direction; and second step for thermally treating the substrate (40) at a neutral temperature (Tn), at which a first material (A) and second material (B) which constitute the respective first and second blocks have substantially the same interfacial tension with the substrate (40) surface (X).
摘要翻译： 本发明的目的是提供一种具有沿膜厚度方向定向的圆柱形微畴的微结构，并且以规则的图案布置，其中使用嵌段共聚物的微相分离现象。 生产微结构的工艺包括2个步骤; 在衬底（40）上布置至少含有构成微结构（30）的连续相（10）的第一块的嵌段共聚物和构成微畴（20）的第二块的聚合物层的第一步骤， 分散在连续相（10）中并在厚度方向取向; 以及在中性温度（Tn）下对基材（40）进行热处理的第二步骤，其中构成相应的第一和第二块的第一材料（A）和第二材料（B）与基材具有基本上相同的界面张力 （40）表面（X）。
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4.发明授权Polymer thin film, patterned substrate, patterned medium for magnetic recording, and method of manufacturing these articles 有权聚合物薄膜，图案化基底，用于磁记录的图案化介质以及制造这些制品的方法公开(公告)号：US08039056B2
公开(公告)日：2011-10-18
申请号：US12019848
申请日：2008-01-25
CPC分类号： G11B5/855 , B05D1/34 , B05D3/0254 , B05D3/0493 , B05D5/00 , G03F7/0002 , Y10T428/269
摘要： A polymer thin film in which cylindrical phases are distributed in a continuous phase and are oriented in a pass-through-direction of the film includes at least: a first block copolymer including at least a block chain A1, as a component of the continuous phase, composed of polymerized monomers a1, and a block chain B1, as a component of the cylindrical phases, composed of polymerized monomers b1; and a second block copolymer including at least a block chain A2, as a component of the continuous phase, composed of polymerized monomers a2, and a block chain B2, as a component of the cylindrical phases, composed of polymerized monomers b2, with the second copolymer having a degree of polymerization different from that of the first copolymer. A film thickness of the polymer thin film and an average center distance between adjacent cylindrical phases have a relation represented by a predetermined expression.
摘要翻译： 一种聚合物薄膜，其中圆柱相分布在连续相中并且在膜的通过方向上取向至少包括：至少包含作为连续相的组分的嵌段链A1的第一嵌段共聚物 由聚合单体a1组成的嵌段链B1和由聚合单体b1组成的圆柱相的组分; 和作为连续相的组分的至少一种链段A2的第二嵌段共聚物，由作为由聚合单体b2组成的圆柱相的组分的聚合单体a2和嵌段链B2组成，第二嵌段链A2与第二嵌段链A2 共聚物，其聚合度与第一共聚物的聚合度不同。 聚合物薄膜的膜厚和相邻圆柱相之间的平均中心距离具有由预定表达式表示的关系。
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5.发明申请POLYMER THIN-FILM, PROCESS FOR PRODUCING PATTERNED SUBSTRATE, MATTER WITH PATTERN TRANSFERRED, AND PATTERNING MEDIUM FOR MAGNETIC RECORDING 审中-公开聚合物薄膜，用于生产图案的基板的工艺，转印的图案和用于磁记录的图形介质公开(公告)号：US20090239103A1
公开(公告)日：2009-09-24
申请号：US12094218
申请日：2006-11-17
IPC分类号： C08L101/00 , C08J5/18 , C08L53/00 , G11B5/73 , B32B3/10
CPC分类号： G11B5/855 , C08F293/005 , C08F297/00 , C08L53/00 , Y10T428/24273 , Y10T428/24331 , Y10T428/24802 , C08L2666/02 , C08L2666/04 , C08L2666/24
摘要： A polymer thin film 30 includes a continuous phase 10 primarily composed of polymers of a first monomer 11 and cylindrical microdomains each of which is primarily composed of a polymer of a second monomer 21, the cylindrical microdomains 20 being distributed in the continuous phase 10 and oriented along the penetration direction through the film, wherein the polymer thin film 30 contains block copolymers 31 which include at least respective first segments 12 formed by polymerization of the first monomer 11 and respective second segments 22 formed by polymerization of the second monomer 21, and polymers 13 compatible with the first segments.
摘要翻译： 聚合物薄膜30包括主要由第一单体11和圆柱形微区的聚合物组成的连续相10，其各自主要由第二单体21的聚合物组成，圆柱形微区20分布在连续相10中并且定向 沿着穿过该膜的穿透方向，其中聚合物薄膜30含有嵌段共聚物31，其包含至少相应的第一段12，其通过第一单体11的聚合和通过第二单体21的聚合形成的相应的第二段22而形成， 13与第一段兼容。
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6.发明申请Polymer Thin Film, Patterned Substrate, Patterned Medium for Magnetic Recording, and Method of Manufacturing these Articles 有权聚合物薄膜，图案化基板，用于磁记录的图案化介质及其制造方法公开(公告)号：US20080233435A1
公开(公告)日：2008-09-25
申请号：US12019848
申请日：2008-01-25
CPC分类号： G11B5/855 , B05D1/34 , B05D3/0254 , B05D3/0493 , B05D5/00 , G03F7/0002 , Y10T428/269
摘要： A polymer thin film in which cylindrical phases are distributed in a continuous phase and are oriented in a pass-through-direction of the film includes at least: a first block copolymer including at least a block chain A1, as a component of the continuous phase, composed of polymerized monomers a1, and a block chain B1, as a component of the cylindrical phases, composed of polymerized monomers b1; and a second block copolymer including at least a block chain A2, as a component of the continuous phase, composed of polymerized monomers a2, and a block chain B2, as a component of the cylindrical phases, composed of polymerized monomers b2, with the second copolymer having a degree of polymerization different from that of the first copolymer. A film thickness of the polymer thin film and an average center distance between adjacent cylindrical phases have a relation represented by a predetermined expression.
摘要翻译： 一种聚合物薄膜，其中圆柱相分布在连续相中并且在膜的通过方向上取向至少包括：至少包含嵌段链A 1的第一嵌段共聚物作为连续的 由聚合单体a 1和作为圆柱相的组分的嵌段链B 1组成的相，由聚合单体b 1组成; 和作为连续相的组分的至少一种嵌段链A 2的第二嵌段共聚物，由作为圆柱相的组分的聚合单体a 2和嵌段链B 2组成，由聚合单体b 2 ，其中第二共聚物的聚合度不同于第一共聚物的聚合度。 聚合物薄膜的膜厚和相邻圆柱相之间的平均中心距离具有由预定表达式表示的关系。
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公开(公告)号：US08132505B2
公开(公告)日：2012-03-13
申请号：US11774216
申请日：2007-07-06
IPC分类号： B31F1/07
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/855 , H01L21/76817
摘要： The present invention provides an imprint apparatus transferring a surface structure of a stamper to material to be patterned by allowing the stamper come in contact with the material to be patterned. The imprint apparatus includes a holding means that holds the material to be patterned and the stamper with a distance therebetween, a pressure reduction means that reduces pressure of a chamber in which the material to be patterned and the stamper are placed, and an alignment means that aligns the stamper with the material to be patterned.
摘要翻译： 本发明提供一种压印装置，通过允许压模与待图案化的材料接触，将压模的表面结构转移到待图案化的材料。 压印装置包括保持装置，其保持要被图案化的材料和压模之间的距离;减压装置，其减小其中待图案化材料和压模放置的室的压力;以及对准装置， 将压模与待图案化的材料对准。
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公开(公告)号：US08133427B2
公开(公告)日：2012-03-13
申请号：US12190607
申请日：2008-08-13
申请人： Yasuhiko Tada , Hiroshi Yoshida
发明人： Yasuhiko Tada , Hiroshi Yoshida
IPC分类号： B29C35/04
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/855
摘要： The present invention is directed to providing a photo nanoimprint lithography which can form a more uniform base layer. A photo nanoimprint lithography according to the present invention includes the steps of discretely applying a photo-curable resist drop-wise onto a substrate, filling an asperity pattern of a mold with the photo-curable resist by bringing the mold having the asperity pattern formed therein into contact with the photo-curable resist, curing the photo-curable resist by irradiating the resist with a light and releasing from the mold the photo-curable resist which has been photo-cured, wherein an intermediary layer is formed on a surface of the substrate for maintaining a discrete placement of the photo-curable resist that has been instilled drop-wise on the substrate until the mold is brought into contact with the photo-curable resist that has been instilled drop-wise on the substrate.
摘要翻译： 本发明旨在提供一种可以形成更均匀的基底层的光学纳米压印光刻。 根据本发明的照片纳米压印光刻包括以下步骤：将光可固化抗蚀剂逐滴涂布在基材上，通过使具有形成凹凸图案的模具在光固化抗蚀剂中填充模具的粗糙图案 与光固化抗蚀剂接触，通过用光照射光刻胶固化光固化抗蚀剂，并从模具中释放已经光固化的可光固化抗蚀剂，其中中间层形成在 衬底，用于保持已经滴落在基底上的可光固化抗蚀剂的离散放置，直到模具与已经滴落在基底上的可光固化抗蚀剂接触。
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公开(公告)号：US20080041248A1
公开(公告)日：2008-02-21
申请号：US11774216
申请日：2007-07-06
IPC分类号： B41J9/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/855 , H01L21/76817
摘要： The present invention provides an imprint apparatus transferring a surface structure of a stamper to material to be patterned by allowing the stamper come in contact with the material to be patterned. The imprint apparatus includes a holding means that holds the material to be patterned and the stamper with a distance therebetween, a pressure reduction means that reduces pressure of a chamber in which the material to be patterned and the stamper are placed, and an alignment means that aligns the stamper with the material to be patterned.
摘要翻译： 本发明提供一种压印装置，通过允许压模与待图案化的材料接触，将压模的表面结构转移到待图案化的材料。 压印装置包括保持装置，其保持要被图案化的材料和压模之间的距离;减压装置，其减小其中待图案化材料和压模放置的室的压力;以及对准装置， 将压模与待图案化的材料对准。
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公开(公告)号：US09040251B2
公开(公告)日：2015-05-26
申请号：US13388671
申请日：2010-07-29
IPC分类号： G01N33/53 , C07K1/04 , G01N33/551 , G01N33/543 , A61K39/00
CPC分类号： G01N33/54353 , A61K2039/625 , G01N33/543 , G01N33/54393
摘要： This invention provides a biomolecule modifying substrate comprising biomolecules selectively fixed to given regions thereon. The biomolecule modifying substrate comprises: a substrate at least comprising a first surface and a second surface; a first linker molecule comprising a hydrocarbon chain and a functional group capable of selectively binding to the first surface at one end of the hydrocarbon chain, which is bound to the first surface via such functional group; a second linker molecule comprising a reactive group capable of binding to the hydrocarbon chain of the first linker molecule, which is bound to the first linker molecule via a bond between the reactive group and the hydrocarbon chain; and a biomolecule bound thereto via the second linker molecule.
摘要翻译： 本发明提供一种生物分子修饰底物，其包含选择性地固定在其上给定区域上的生物分子。 生物分子修饰基质包括：至少包含第一表面和第二表面的基底; 第一连接分子，其包含烃链和能够选择性地结合到烃链一端的第一表面的官能团，其通过该官能团与第一表面结合; 第二连接分子，其包含能够结合第一连接分子的烃链的反应性基团，其通过反应性基团和烃链之间的键与第一连接分子结合; 和通过第二连接分子与其结合的生物分子。
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