METHOD OF MANUFACTURING A LIGHT EMITTING DEVICE AND THIN FILM FORMING APPARATUS
    2.
    发明申请
    METHOD OF MANUFACTURING A LIGHT EMITTING DEVICE AND THIN FILM FORMING APPARATUS 有权
    制造发光装置和薄膜成型装置的方法

    公开(公告)号:US20100233931A1

    公开(公告)日:2010-09-16

    申请号:US12775569

    申请日:2010-05-07

    IPC分类号: H01J9/50

    摘要: A method of manufacturing a light emitting device is provided in which satisfactory image display can be performed by the investigation and repair of short circuits in defect portions of light emitting elements. A backward direction electric current flows in the defect portions if a reverse bias voltage is applied to the light emitting elements having the defect portions. Emission of light which occurred from the backward direction electric current flow is measured by using an emission microscope, specifying the position of the defect portions, and short circuit locations can be repaired by irradiating a laser to the defect portions, turning them into insulators.

    摘要翻译: 提供一种制造发光器件的方法,其中可以通过调查和修复发光元件的缺陷部分中的短路来执行令人满意的图像显示。 如果对具有缺陷部分的发光元件施加反向偏置电压,则向缺陷部分流过反向电流。 通过使用规定缺陷部位的位置的发射型显微镜来测量从逆向电流流出的光的发射,并且可以通过向缺陷部照射激光,将其转换成绝缘体来修复短路位置。

    Method of manufacturing a light emitting device and thin film forming apparatus
    3.
    发明授权
    Method of manufacturing a light emitting device and thin film forming apparatus 有权
    制造发光器件和薄膜形成装置的方法

    公开(公告)号:US08273583B2

    公开(公告)日:2012-09-25

    申请号:US12775569

    申请日:2010-05-07

    IPC分类号: H01L21/66

    摘要: A method of manufacturing a light emitting device is provided in which satisfactory image display can be performed by the investigation and repair of short circuits in defect portions of light emitting elements. A backward direction electric current flows in the defect portions if a reverse bias voltage is applied to the light emitting elements having the defect portions. Emission of light which occurred from the backward direction electric current flow is measured by using an emission microscope, specifying the position of the defect portions, and short circuit locations can be repaired by irradiating a laser to the defect portions, turning them into insulators.

    摘要翻译: 提供了一种制造发光器件的方法,其中可以通过调查和修复发光元件的缺陷部分中的短路来执行令人满意的图像显示。 如果对具有缺陷部分的发光元件施加反向偏置电压,则向缺陷部分流过反向电流。 通过使用规定缺陷部位的位置的发射型显微镜来测量从逆向电流流出的光的发射,并且可以通过向缺陷部照射激光,将其转换成绝缘体来修复短路位置。

    Method of manufacturing a light emitting device and thin film forming apparatus
    4.
    发明授权
    Method of manufacturing a light emitting device and thin film forming apparatus 有权
    制造发光器件和薄膜形成装置的方法

    公开(公告)号:US07871930B2

    公开(公告)日:2011-01-18

    申请号:US11061861

    申请日:2005-02-22

    IPC分类号: H01L21/44

    摘要: A method of manufacturing a light emitting device is provided in which satisfactory image display can be performed by the investigation and repair of short circuits in defect portions of light emitting elements. A backward direction electric current flows in the defect portions if a reverse bias voltage is applied to the light emitting elements having the defect portions. Emission of light which occurred from the backward direction electric current flow is measured by using an emission microscope, specifying the position of the defect portions, and short circuit locations can be repaired by irradiating a laser to the defect portions, turning them into insulators.

    摘要翻译: 提供了一种制造发光器件的方法,其中可以通过调查和修复发光元件的缺陷部分中的短路来执行令人满意的图像显示。 如果对具有缺陷部分的发光元件施加反向偏置电压,则向缺陷部分流过反向电流。 通过使用规定缺陷部位的位置的发射型显微镜来测量从逆向电流流出的光的发射,并且可以通过向缺陷部照射激光,将其转换成绝缘体来修复短路位置。

    Method of manufacturing a light emitting device and thin film forming apparatus
    6.
    发明授权
    Method of manufacturing a light emitting device and thin film forming apparatus 有权
    制造发光器件和薄膜形成装置的方法

    公开(公告)号:US06909111B2

    公开(公告)日:2005-06-21

    申请号:US10021315

    申请日:2001-12-19

    IPC分类号: H01L51/52 H01L31/20

    摘要: A method of manufacturing a light emitting device is provided in which satisfactory image display can be performed by the investigation and repair of short circuits in defect portions of light emitting elements. A backward direction electric current flows in the defect portions if a reverse bias voltage is applied to the light emitting elements having the defect portions. Emission of light which occurred from the backward direction electric current flow is measured by using an emission microscope, specifying the position of the defect portions, and short circuit locations can be repaired by irradiating a laser to the defect portions, turning them into insulators.

    摘要翻译: 提供了一种制造发光器件的方法,其中可以通过调查和修复发光元件的缺陷部分中的短路来执行令人满意的图像显示。 如果对具有缺陷部分的发光元件施加反向偏置电压,则向缺陷部分流过反向电流。 通过使用规定缺陷部位的位置的发射型显微镜来测量从逆向电流流出的光的发射,并且可以通过向缺陷部照射激光,将其转换成绝缘体来修复短路位置。