公开(公告)号：US20090162944A1

公开(公告)日：2009-06-25

申请号：US11992868

申请日：2006-09-29

申请人： Hiroshi Kase ,  Hiroyoshi Aoki ,  Tsutomu Hara ,  Yasumasa Nakamura ,  Yamagata Yutaka

发明人： Hiroshi Kase ,  Hiroyoshi Aoki ,  Tsutomu Hara ,  Yasumasa Nakamura ,  Yamagata Yutaka

IPC分类号： G01N33/566 ,  G01N33/543 ,  G01N33/553 ,  B01J19/00

CPC分类号： G01N33/543 ,  G01N33/557 ,  G01N2035/00158

摘要： According to the present invention, a method for ultrafast and precise measurement and analysis of biomolecules using a small sample was established, and moreover, a compact and simple micro fluid device for implementing the method was provided. Using the method and the micro fluid device of the present invention, the ultrafast, instant, and precise analysis of biomolecules is possible, and there is a great deal of potential for application in the research field, manufacturing field or medical field, environmental monitoring and the like.

摘要翻译： 根据本发明，建立了使用小样品对生物分子进行超快速精确测量和分析的方法，此外，提供了一种用于实施该方法的紧凑且简单的微流体装置。 使用本发明的方法和微流体装置，生物分子的超快速，即时和精确的分析是可能的，并且在研究领域，制造领域或医疗领域，环境监测和 类似。

公开(公告)号：US20070287147A1

公开(公告)日：2007-12-13

申请号：US10599367

申请日：2005-03-02

申请人： Teruyuki Nagamune ,  Akihiko Tajima ,  Yutaka Yamagata ,  Hiroyoshi Aoki

发明人： Teruyuki Nagamune ,  Akihiko Tajima ,  Yutaka Yamagata ,  Hiroyoshi Aoki

IPC分类号： C12Q1/70 ,  G01N33/53

CPC分类号： G01N33/569 ,  C12Q1/04 ,  G01N33/54366

摘要： This invention provides a method to monitor a microorganism that causes infectious disease of a laboratory animal by using a micro flow channel chip immobilized with a molecular to be tested such as an antigen or an antibody of the microorganism that causes infectious disease, the method comprises flowing serum or body fluid taken from the laboratory animal through the minute flow channel of the micro flow channel chip and detecting the antigen antibody reaction on the chip. The method of this invention enabled medical inspection of an infectious disease of a laboratory animal and microorganism monitoring of a laboratory animal, by using minute amount of animal serum or body fluid in a closed system rapidly and sensitively.

摘要翻译： 本发明提供了一种通过使用固定有被测分子的微流通道芯片来监测引起实验动物感染性疾病的微生物的方法，例如引起感染性疾病的微生物的抗原或抗体，该方法包括流动 血清或体液通过微流通芯片的微流通道从实验室动物取出，并检测芯片上的抗原抗体反应。 本发明的方法通过在密闭系统中使用微量的动物血清或体液快速且敏感地实现实验室动物的感染性疾病和实验室动物的微生物监测。

公开(公告)号：US20080083703A1

公开(公告)日：2008-04-10

申请号：US11984972

申请日：2007-11-26

申请人： Katsunori Suzuki ,  Takayuki Shimizu ,  Hiroyoshi Aoki ,  Koji Mori ,  Satoru Hiraoka

发明人： Katsunori Suzuki ,  Takayuki Shimizu ,  Hiroyoshi Aoki ,  Koji Mori ,  Satoru Hiraoka

IPC分类号： C23F1/00

CPC分类号： H01L21/67069 ,  H01J37/32642

摘要： Plasma processing apparatus and plasma processing methods capable of maintaining etching characteristics and to prevent degradation of a lower electrode even when the focus ring is severely eroded by the plasma are disclosed. According to an exemplary embodiment, a side-surface protecting ring formed of a ceramic material having an erosion rate by the plasma lower than an erosion rate of the material of the focus ring is provided to cover the side surface of the lower electrode. As a result, it becomes possible to prevent the side surface of the lower electrode from being exposed to the plasma and maintain the etching characteristics even after the focus ring is severely eroded. Further, degradation of the lower electrode is decreased.

摘要翻译： 公开了即使当聚焦环被等离子体严重侵蚀时，能够保持蚀刻特性和防止下电极的劣化的等离子体处理装置和等离子体处理方法。 根据示例性实施例，提供由陶瓷材料形成的侧表面保护环，其具有等离子体的侵蚀速率低于聚焦环材料的侵蚀速率，以覆盖下电极的侧表面。 结果，即使在聚焦环被严重侵蚀之后，也可以防止下电极的侧表面暴露于等离子体并保持蚀刻特性。 此外，下电极的劣化降低。

公开(公告)号：US20050189068A1

公开(公告)日：2005-09-01

申请号：US11057164

申请日：2005-02-15

申请人： Katsunori Suzuki ,  Takayuki Shimizu ,  Hiroyoshi Aoki ,  Koji Mori ,  Satoru Hiraoka

发明人： Katsunori Suzuki ,  Takayuki Shimizu ,  Hiroyoshi Aoki ,  Koji Mori ,  Satoru Hiraoka

IPC分类号： H01L21/00 ,  C23F1/00

CPC分类号： H01L21/67069 ,  H01J37/32642

摘要： Plasma processing apparatus and plasma processing methods capable of maintaining acceptable etching characteristics and to prevent degradation of a lower electrode even when the focus ring is severely eroded by the plasma, while leaving the plasma discharge conditions used in the conventional apparatus and methods substantially unchanged, are disclosed. According to an exemplary embodiment, a side-surface protecting ring formed of a ceramic material is provided to cover the side surface of the lower electrode such that an outer perimeter of the side-surface protecting ring is approximately aligned with, or inside, an outer perimeter of the substrate to be processed. As a result, the side-surface protecting ring does not influence the plasma characteristic.

摘要翻译： 等离子体处理装置和等离子体处理方法能够保持可接受的蚀刻特性，并且即使当聚焦环被等离子体严重侵蚀时也能防止下电极的劣化，同时留下常规装置和方法中使用的等离子体放电条件基本上不变。 披露 根据示例性实施例，提供由陶瓷材料形成的侧表面保护环以覆盖下电极的侧表面，使得侧表面保护环的外周与外侧的大致对准或内侧 待加工基材的周长。 结果，侧面保护环不影响等离子体特性。