-
公开(公告)号：US20100029085A1
公开(公告)日：2010-02-04
申请号：US12530766
申请日：2008-03-06
IPC分类号： H01L21/306 , H01L21/308 , G03F7/42
CPC分类号： H01L21/31133 , C11D3/3947 , C11D7/06 , C11D7/36 , C11D11/0047 , G03F7/423 , G03F7/425 , H01L21/02063
摘要： A cleaning composition of a semiconductor device for laminating an organosiloxane-based thin film and a photoresist layer in this order on a substrate having a low dielectric interlayer insulation film and a copper wiring or a copper alloy wiring, then applying selective exposure and development treatments to the subject photoresist layer to form a photoresist pattern, subsequently applying a dry etching treatment to the organosiloxane-based thin film and the low dielectric interlayer insulation film while using this resist pattern as a mask and then removing the organosiloxane-based thin film, a residue generated by the dry etching treatment, a modified photoresist having been modified by the dry etching treatment and an unmodified photoresist layer located in a lower layer than the modified photoresist, the cleaning composition containing from 15 to 20% by mass of hydrogen peroxide, from 0.0001 to 0.003% by mass of an amino polymethylene phosphonic acid, from 0.02 to 0.5% by mass of potassium hydroxide and water and having a pH of from 7.5 to 8.5, is provided. Also, a method for manufacturing a semiconductor device using the subject cleaning composition is provided.
摘要翻译： 一种用于在具有低介电层间绝缘膜和铜布线或铜合金布线的基板上依次层叠有机硅氧烷类薄膜和光致抗蚀剂层的半导体装置的清洗组合物，然后对其进行选择性曝光和显影处理 该主体光致抗蚀剂层形成光致抗蚀剂图案，随后在使用该抗蚀剂图案作为掩模的同时对有机硅氧烷类薄膜和低介电层间绝缘膜进行干蚀刻处理，然后除去有机硅氧烷类薄膜，残留物 通过干蚀刻处理产生的改性光致抗蚀剂，通过干蚀刻处理改性的改性光致抗蚀剂和位于比改性光致抗蚀剂低的层中的未改性光致抗蚀剂层，清洗组合物含有15〜20质量％的过氧化氢，0.0001 至0.003质量％的氨基聚亚甲基膦酸，为0.02〜0.5质量％ 氢氧化钾和水，pH为7.5至8.5。 另外，提供了使用该被检体组合物的半导体装置的制造方法。
-
公开(公告)号：US07977292B2
公开(公告)日：2011-07-12
申请号：US12530766
申请日：2008-03-06
IPC分类号： C11D7/18
CPC分类号： H01L21/31133 , C11D3/3947 , C11D7/06 , C11D7/36 , C11D11/0047 , G03F7/423 , G03F7/425 , H01L21/02063
摘要： A cleaning composition of a semiconductor device for laminating an organosiloxane-based thin film and a photoresist layer in this order on a substrate having a low dielectric interlayer insulation film and a copper wiring or a copper alloy wiring, then applying selective exposure and development treatments to the subject photoresist layer to form a photoresist pattern, subsequently applying a dry etching treatment to the organosiloxane-based thin film and the low dielectric interlayer insulation film while using this resist pattern as a mask and then removing the organosiloxane-based thin film, a residue generated by the dry etching treatment, a modified photoresist having been modified by the dry etching treatment and an unmodified photoresist layer located in a lower layer than the modified photoresist, the cleaning composition containing from 15 to 20% by mass of hydrogen peroxide, from 0.0001 to 0.003% by mass of an amino polymethylene phosphonic acid, from 0.02 to 0.5% by mass of potassium hydroxide and water and having a pH of from 7.5 to 8.5, is provided. Also, a method for manufacturing a semiconductor device using the subject cleaning composition is provided.
摘要翻译： 一种用于在具有低介电层间绝缘膜和铜布线或铜合金布线的基板上依次层叠有机硅氧烷类薄膜和光致抗蚀剂层的半导体装置的清洗组合物，然后对其进行选择性曝光和显影处理 该主体光致抗蚀剂层形成光致抗蚀剂图案，随后在使用该抗蚀剂图案作为掩模的同时对有机硅氧烷类薄膜和低介电层间绝缘膜进行干蚀刻处理，然后除去有机硅氧烷类薄膜，残留物 通过干蚀刻处理产生的改性光致抗蚀剂，通过干蚀刻处理改性的改性光致抗蚀剂和位于比改性光致抗蚀剂低的层中的未改性光致抗蚀剂层，清洗组合物含有15〜20质量％的过氧化氢，0.0001 至0.003质量％的氨基聚亚甲基膦酸，为0.02〜0.5质量％ 氢氧化钾和水，pH为7.5至8.5。 另外，提供了使用该被检体组合物的半导体装置的制造方法。
-
3.发明申请公开(公告)号：US20100051066A1
公开(公告)日：2010-03-04
申请号：US12158077
申请日：2006-12-14
申请人： Eiko Kuwabara , Hideo Kashiwagi , Hiroshi Matsunaga , Masaru Ohto
发明人： Eiko Kuwabara , Hideo Kashiwagi , Hiroshi Matsunaga , Masaru Ohto
CPC分类号： H05K3/26 , C11D3/3947 , C11D7/3281 , C11D11/0047 , G03F7/423 , G03F7/425 , H05K3/0041 , H05K3/388 , H05K2203/0796 , H05K2203/124
摘要： A composition for removing a residue from a wiring board containing an oxidizing agent and an azole compound and having a pH of from 1 to 7 and a cleaning method of a wiring board for removing a residue after dry etching by using this composition are provided. By using the composition for removing a residue of the present invention, in manufacturing a wiring board, residues remaining after dry etching which are derived from a resist or metals can be effectively removed without corroding titanium or titanium alloys with high corrosiveness. In particular, a semiconductor device using a wiring board containing titanium or titanium alloys can be efficiently manufactured.
摘要翻译： 提供一种用于从含有氧化剂和唑类化合物并且pH为1至7的布线板除去残余物的组合物，以及通过使用该组合物在干法蚀刻之后除去残留物的布线板的清洁方法。 通过使用除去本发明的残渣的组合物，在制造布线板时，可以有效地除去从抗蚀剂或金属衍生的干蚀刻后剩余的残留物，而不会腐蚀具有高腐蚀性的钛或钛合金。 特别地，可以有效地制造使用含有钛或钛合金的布线板的半导体装置。
-
公开(公告)号：US20100206789A1
公开(公告)日：2010-08-19
申请号：US12678673
申请日：2009-01-13
申请人： Atsuhiro Yukumoto , Hiroyuki Osora , Yoshio Seiki , Haruaki Hirayama , Yukio Tanaka , Hideo Kashiwagi , Katsufumi Inoue
发明人： Atsuhiro Yukumoto , Hiroyuki Osora , Yoshio Seiki , Haruaki Hirayama , Yukio Tanaka , Hideo Kashiwagi , Katsufumi Inoue
IPC分类号： B01D61/36
CPC分类号： B01D61/362 , B01D61/58 , B01D2313/24 , B01D2317/022 , C07C29/76 , C07C31/08
摘要： Provided is a dehydrator that requires no excessively large apparatus structure and achieves cost-saving while maintaining suction efficiency at a desired level by use of suction means. A dehydrator 100 for separating water from a target liquid 13 includes at least two water separation membrane units 1a and 1b which are provided in series in a flow direction of the target liquid 13. The water separation membrane unit 1a on an upstream side out of the water separation membrane units 1a and 1b is connected to suction means 7 for sucking a gas phase containing water through one condenser 4, and the one condenser 4 condenses water in the gas phase and thereby separates the water. The gas phase sucked by the suction means 7 from the one condenser 4 is transferred to at least one downstream condenser 8 provided downstream of the one condenser 4, and the downstream condenser 8 condenses water in the gas phase and thereby separates the water. The water separation membrane unit 1b on a downstream side of the water separation membrane unit 1a is connected to a steam ejector 3, and the condenser 4 for condensing water in a gas phase passed through the steam ejector 3 condenses water and thereby separates the water.
摘要翻译： 提供一种脱水机，其不需要过大的装置结构，并且通过使用抽吸装置将抽吸效率保持在期望的水平，从而节省成本。 用于从目标液体13分离水的脱水器100包括沿目标液体13的流动方向串联设置的至少两个水分离膜单元1a和1b。在上游侧的水分离膜单元1a 水分离膜单元1a和1b连接到抽吸装置7，用于通过一个冷凝器4吸入含有水的气相，并且一个冷凝器4冷凝气相中的水，从而分离水。 由抽吸装置7从一个冷凝器4吸入的气相被转移到设置在一个冷凝器4下游的至少一个下游冷凝器8，下游冷凝器8冷凝气体中的水分，从而分离出水分。 水分离膜单元1a的下游侧的水分离膜单元1b与蒸汽喷射器3连接，用于冷凝通过蒸汽喷射器3的气相中的水的冷凝器4冷凝水分，从而分离水。
-
公开(公告)号：US08496806B2
公开(公告)日：2013-07-30
申请号：US12678673
申请日：2009-01-13
申请人： Atsuhiro Yukumoto , Hiroyuki Osora , Yoshio Seiki , Haruaki Hirayama , Yukio Tanaka , Hideo Kashiwagi , Katsufumi Inoue
发明人： Atsuhiro Yukumoto , Hiroyuki Osora , Yoshio Seiki , Haruaki Hirayama , Yukio Tanaka , Hideo Kashiwagi , Katsufumi Inoue
CPC分类号： B01D61/362 , B01D61/58 , B01D2313/24 , B01D2317/022 , C07C29/76 , C07C31/08
摘要： Provided is a dehydrator that requires no excessively large apparatus structure and achieves cost-saving while maintaining suction efficiency at a desired level by use of suction means. A dehydrator 100 for separating water from a target liquid 13 includes at least two water separation membrane units 1a and 1b which are provided in series in a flow direction of the target liquid 13. The water separation membrane unit 1a on an upstream side out of the water separation membrane units 1a and 1b is connected to suction means 7 for sucking a gas phase containing water through one condenser 4, and the one condenser 4 condenses water in the gas phase and thereby separates the water. The gas phase sucked by the suction means 7 from the one condenser 4 is transferred to at least one downstream condenser 8 provided downstream of the one condenser 4, and the downstream condenser 8 condenses water in the gas phase and thereby separates the water. The water separation membrane unit 1b on a downstream side of the water separation membrane unit 1a is connected to a steam ejector 3, and the condenser 4 for condensing water in a gas phase passed through the steam ejector 3 condenses water and thereby separates the water.
摘要翻译： 提供一种脱水机，其不需要过大的装置结构，并且通过使用抽吸装置将抽吸效率保持在期望的水平，从而节省成本。 用于从目标液体13分离水的脱水器100包括沿目标液体13的流动方向串联设置的至少两个水分离膜单元1a和1b。在上游侧的水分离膜单元1a 水分离膜单元1a和1b连接到抽吸装置7，用于通过一个冷凝器4吸入含有水的气相，并且一个冷凝器4冷凝气相中的水，从而分离水。 由抽吸装置7从一个冷凝器4吸入的气相被转移到设置在一个冷凝器4下游的至少一个下游冷凝器8，下游冷凝器8冷凝气体中的水分，从而分离出水分。 水分离膜单元1a的下游侧的水分离膜单元1b与蒸汽喷射器3连接，用于冷凝通过蒸汽喷射器3的气相中的水的冷凝器4冷凝水分，从而分离水。
-
公开(公告)号：US4311368A
公开(公告)日：1982-01-19
申请号：US46629
申请日：1979-06-08
申请人： Takeshi Saito , Takashi Ueno , Hideo Kashiwagi
发明人： Takeshi Saito , Takashi Ueno , Hideo Kashiwagi
CPC分类号： G02C7/105
摘要： A light shielding material having a gradient of the luminous transmittance in the vertical direction and comprising at least two regions consecutive to each other and different from each other in the luminous transmittance is provided. The luminous transmittance of one region is in the range of from 30% to 75% and the luminous transmittance of the other region is up to 25%, and said other region includes a portion in which the difference of the luminous density is at least 0.35 per 10 mm of the distance in the vertical direction. This light shielding material is advantageously used for glare-reducing glasses, glare-reducing filters, visors and the like.
摘要翻译： 提供了具有在垂直方向上具有透光率的梯度并且包括彼此连续并且在透光率彼此不同的至少两个区域的遮光材料。 一个区域的透光率在30％至75％的范围内，另一区域的透光率高达25％，而其他区域包括发光密度差为0.35以上的部分 每10毫米的垂直方向的距离。 该遮光材料有利地用于防眩光眼镜，防眩光滤光片，遮阳板等。
-
-
-
-
-
搜索结果
6 条记录 (耗时 0.02 秒)
