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    Method for producing compound having acid-labile group
    1.
    发明申请
    Method for producing compound having acid-labile group 审中-公开
    具有酸不稳定基团的化合物的制备方法

    公开(公告)号：US20060177763A1

    公开(公告)日：2006-08-10

    申请号：US10569099

    申请日：2004-08-31

    申请人： Hiroshi Matsuoka ,  Junzo Yamano ,  Katsuhiro Ito ,  Ikuo Shimizu ,  Ryo Numazaki

    发明人： Hiroshi Matsuoka ,  Junzo Yamano ,  Katsuhiro Ito ,  Ikuo Shimizu ,  Ryo Numazaki

    IPC分类号： G03C1/76

    CPC分类号： G03F7/0392 ,  C07D307/20 ,  C07D309/12 ,  C08F8/00 ,  C08F112/14

    摘要： The present invention provides a process for producing a compound having a group represented by general formula (II). (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O—C—C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).

    摘要翻译： 本发明提供具有由通式（II）表示的基团的化合物的制备方法。 （其中R 1，R 2，R 3和R 3可以相同或不同，并且各自表示取代或未取代的烷基，取代的 或未取代的芳基，或取代或未取代的芳烷基，或R 1和R 2可以彼此结合形成与相邻碳原子一起形成的脂环族烃环，或 R 2和R 3可以彼此结合形成脂环族杂环以及可以具有取代基的相邻OCC），其包括使具有羟基的化合物 与通式（I）表示的卤代烷基醚反应：其中R 1，R 2，R 3和R 3相同 分别如上所定义，X表示卤素原子）。

    PROCESS FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP
    2.
    发明申请
    PROCESS FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP 审中-公开
    生产具有酸性化合物的化合物的方法

    公开(公告)号：US20090035702A1

    公开(公告)日：2009-02-05

    申请号：US12240227

    申请日：2008-09-29

    申请人： Hiroshi Matsuoka ,  Junzo Yamano ,  Katsuhiro Ito ,  Ikuo Shimizu ,  Ryo Numazaki

    发明人： Hiroshi Matsuoka ,  Junzo Yamano ,  Katsuhiro Ito ,  Ikuo Shimizu ,  Ryo Numazaki

    IPC分类号： G03F7/028 ,  C07D309/10 ,  G03F7/004 ,  C08F116/10

    CPC分类号： G03F7/0392 ,  C07D307/20 ,  C07D309/12 ,  C08F8/00 ,  C08F112/14

    摘要： The present invention provides a process for producing a compound having a group represented by general formula (II): (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O—C—C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).

    摘要翻译： 本发明提供一种具有由通式（II）表示的基团的化合物的制备方法：（其中R 1，R 2和R 3可以相同或不同，各自表示取代或未取代的烷基，取代或未取代的芳基 或者取代或未取代的芳烷基，或者R 1和R 2可以相互结合形成与相邻碳原子一起形成的脂环族烃环，或者R 2和R 3可以彼此结合形成脂环族杂环以及相邻的OCC 其可以具有取代基），其包括使具有羟基的化合物与通式（I）表示的卤代烷基醚反应：其中R1，R2和R3分别与上述定义相同，X表示 卤素原子）。

    METHOD FOR PRODUCING UNSATURATED ETHER COMPOUND
    3.
    发明申请
    METHOD FOR PRODUCING UNSATURATED ETHER COMPOUND 审中-公开
    生产不饱和醚化合物的方法

    公开(公告)号：US20090054697A1

    公开(公告)日：2009-02-26

    申请号：US11911685

    申请日：2006-04-26

    申请人： Ryo Numazaki ,  Katsuhiro Ito ,  Hiroshi Matsuoka ,  Iwao Hotta

    发明人： Ryo Numazaki ,  Katsuhiro Ito ,  Hiroshi Matsuoka ,  Iwao Hotta

    IPC分类号： C07C41/01

    CPC分类号： C07C41/28 ,  C07C43/15

    摘要： The present invention provides a method for producing an unsaturated ether compound represented by general formula (2) below, the method comprising reacting an acetal represented by general formula (1) below in the presence of an aliphatic or aromatic sulfonic acid and an organic base having a total carbon number of 3 to 7.(In the formulae, R1, R2, and R3 may be the same or different and each represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with the adjacent carbon atom.)

    摘要翻译： 本发明提供下述通式（2）表示的不饱和醚化合物的制造方法，其特征在于，在脂肪族或芳香族磺酸和有机碱的存在下，使下述通式（1）表示的缩醛反应， （式中，R 1，R 2和R 3可以相同或不同，表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2形式 环烷基与相邻碳原子一起）

    Composition sensitive to visible light
    4.
    发明申请
    Composition sensitive to visible light 失效
    组合对可见光敏感

    公开(公告)号：US20060003259A1

    公开(公告)日：2006-01-05

    申请号：US10523523

    申请日：2003-08-20

    申请人： Tsuguo Yamaoka ,  Katsuhiro Ito ,  Takeshi Iwasaki ,  Ikuo Shimizu

    发明人： Tsuguo Yamaoka ,  Katsuhiro Ito ,  Takeshi Iwasaki ,  Ikuo Shimizu

    IPC分类号： G03C1/73

    CPC分类号： G03F7/0392

    摘要： The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.

    摘要翻译： 本发明提供对可见光高度敏感的可见光敏组合物，可用作电子电路形成材料，平版印刷材料等，所述可见光敏组合物包含（a）包含 由通式（I）表示的重复单元：其中R 1，R 2，R 3和R 3相同或不同，各自表示取代的 或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或者R 1和R 2与邻接的碳原子一起形成环烷基， 4表示低级烷基，（b）通过可见光照射产生酸的化合物和（c）敏化染料。

    Process for producing ether compound
    5.
    发明授权
    Process for producing ether compound 失效
    生产醚化合物的方法

    公开(公告)号：US07358030B2

    公开(公告)日：2008-04-15

    申请号：US11289706

    申请日：2005-11-30

    申请人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    发明人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0392 ,  C07C67/04 ,  C07C69/54

    摘要： The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield.A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.

    摘要翻译： 本发明提供以下制备醚化合物的方法，其可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少的副反应和高产率。 制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是 并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基 ，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2， 和R 3分别具有与上述相同的含义。

    Composition sensitive to visible light
    6.
    发明授权
    Composition sensitive to visible light 失效
    组合对可见光敏感

    公开(公告)号：US07294448B2

    公开(公告)日：2007-11-13

    申请号：US10523523

    申请日：2003-08-20

    申请人： Tsuguo Yamaoka ,  Katsuhiro Ito ,  Takeshi Iwasaki ,  Ikuo Shimizu

    发明人： Tsuguo Yamaoka ,  Katsuhiro Ito ,  Takeshi Iwasaki ,  Ikuo Shimizu

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0392

    摘要： The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.

    摘要翻译： 本发明提供对可见光高度敏感的可见光敏组合物，可用作电子电路形成材料，平版印刷材料等，所述可见光敏组合物包含（a）包含 由通式（I）表示的重复单元：其中R 1，R 2，R 3和R 3相同或不同，各自表示取代的 或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或者R 1和R 2与邻接的碳原子一起形成环烷基， 4表示低级烷基，（b）通过可见光照射产生酸的化合物和（c）敏化染料。

    Process for producing ether compound
    7.
    发明申请
    Process for producing ether compound 失效
    生产醚化合物的方法

    公开(公告)号：US20060074262A1

    公开(公告)日：2006-04-06

    申请号：US11289706

    申请日：2005-11-30

    申请人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    发明人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    IPC分类号： C07C43/30

    CPC分类号： G03F7/0392 ,  C07C67/04 ,  C07C69/54

    摘要： The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above respectively.

    摘要翻译： 本发明提供了以下的制造方法，其能够生产可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少副反应和高反应性的醚化合物 产量。 制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是 并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基 ，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2， 和R 3分别具有与上述相同的含义。

    Process for producing ether compound
    8.
    发明授权
    Process for producing ether compound 失效
    生产醚化合物的方法

    公开(公告)号：US07015363B2

    公开(公告)日：2006-03-21

    申请号：US10482111

    申请日：2002-07-12

    申请人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    发明人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    IPC分类号： C07C41/54

    CPC分类号： G03F7/0392 ,  C07C67/04 ,  C07C69/54

    摘要： The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield.A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.

    摘要翻译： 本发明提供了以下的制造方法，其能够生产可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少副反应和高反应性的醚化合物 产量。 制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是 并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基 ，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2， 和R 3分别具有与上述相同的含义。