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1.发明申请ABERRATION EVALUATION PATTERN, ABERRATION EVALUATION METHOD, ABERRATION CORRECTION METHOD, ELECTRON BEAM DRAWING APPARATUS, ELECTRON MICROSCOPE, MASTER, STAMPER, RECORDING MEDIUM, AND STRUCTURE 有权ABERRATION评估模式，ABERRATION评估方法，ABERRATION校正方法，电子束绘图设备，电子显微镜，MASTER，STAMPER，记录介质和结构公开(公告)号：US20100227200A1
公开(公告)日：2010-09-09
申请号：US12279964
申请日：2007-12-27
CPC分类号： H01J37/153 , H01J37/28 , H01J2237/1532 , H01J2237/282 , Y10T428/24479
摘要： A method of evaluating astigmatism of an irradiation system irradiating an electron beam is disclosed. In this method, a figure pattern consisting of plural (for example, four) concentric circles is formed on a reference sample “WP” and an image (scanned image) is formed based on an electron signal obtained by scanning the electron beam onto the reference sample “WP”. In the scanned image, the image has a blur in a region with its longitudinal direction parallel to the generating direction of the astigmatism and the size of the blur depends on magnitude of the astigmatism. Therefore, the direction and the magnitude of the astigmatism of the irradiation system of an irradiation apparatus can be detected based on the obtained scanned image.
摘要翻译： 公开了一种评估照射电子束的照射系统的像散的方法。 在该方法中，在参考样品“WP”上形成由多个（例如四个）同心圆组成的图形图形，并且基于通过将电子束扫描到参考上而获得的电子信号形成图像（扫描图像） 样品“WP”。 在扫描图像中，图像在其纵向方向平行于像散的产生方向的区域中具有模糊，并且模糊的大小取决于像散的大小。 因此，可以基于获得的扫描图像来检测照射装置的照射系统的散光的方向和大小。
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2.发明授权Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure 有权畸变评估模式，像差评估方法，像差校正方法，电子束描绘装置，电子显微镜，主模，压模，记录介质和结构公开(公告)号：US08158310B2
公开(公告)日：2012-04-17
申请号：US12279964
申请日：2007-12-27
IPC分类号： G03C5/00
CPC分类号： H01J37/153 , H01J37/28 , H01J2237/1532 , H01J2237/282 , Y10T428/24479
摘要： A method of evaluating astigmatism of an irradiation system irradiating an electron beam is disclosed. In this method, a figure pattern consisting of plural (for example, four) concentric circles is formed on a reference sample “WP” and an image (scanned image) is formed based on an electron signal obtained by scanning the electron beam onto the reference sample “WP”. In the scanned image, the image has a blur in a region with its longitudinal direction parallel to the generating direction of the astigmatism and the size of the blur depends on magnitude of the astigmatism. Therefore, the direction and the magnitude of the astigmatism of the irradiation system of an irradiation apparatus can be detected based on the obtained scanned image.
摘要翻译： 公开了一种评估照射电子束的照射系统的像散的方法。 在该方法中，在参考样品“WP”上形成由多个（例如四个）同心圆组成的图形图形，并且基于通过将电子束扫描到参考上而获得的电子信号形成图像（扫描图像） 样品“WP”。 在扫描图像中，图像在其纵向方向平行于像散的产生方向的区域中具有模糊，并且模糊的大小取决于像散的大小。 因此，可以基于获得的扫描图像来检测照射装置的照射系统的散光的方向和大小。
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公开(公告)号：US06989536B2
公开(公告)日：2006-01-24
申请号：US10897344
申请日：2004-07-21
IPC分类号： H01J37/28 , H01J37/256
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3174 , H01J2237/31761
摘要： The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation means 311 calculates the start-to-end point distance L of a writing pattern (S502), and number-of-scan-clocks calculating means 312 calculates the number of scan clocks required to write the writing pattern based on the start-to-end point distance L and a unit distance corresponding to the minimum time resolution for a high-speed D/A converter 306 (S503). Count conversion means 605 separates the start-to-end point distance L into X and Y components to convert them in an equation using the number of scan clocks (S504). Based on the equation, variable rate calculating means 314 calculates an extinction ratio to determine the extinction ratio at a variable attenuator 307 (S505). ATT D/A converter 303 specifies the extinction ratio at the attenuator 307 to reduce the unit distance corresponding to the resolving power of the high-speed D/A converter 306 so that an electron beam will be irradiated and scanned at intervals of the reduced unit distance to perform writing.
摘要翻译： 本发明旨在提供一种以高速度高精度地写入线的装置和方法。 距离计算装置311计算写入模式的起始点到终点距离L（S 502），并且扫描时间计算装置312基于开始计算写入写入模式所需的扫描时钟数 到端点距离L和对应于高速D / A转换器306的最小时间分辨率的单位距离（S 503）。 计数转换装置605将起始点到终点距离L分离为X和Y分量，以使用扫描时钟数在等式中转换它们（S 504）。 基于该方程，可变速率计算装置314计算消光比以确定可变衰减器307处的消光比（S 505）。 ATT D / A转换器303指定衰减器307处的消光比，以减小对应于高速D / A转换器306的分辨率的单位距离，使得将电子束以缩小单位的间隔照射和扫描 执行写作的距离
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公开(公告)号：US20050018496A1
公开(公告)日：2005-01-27
申请号：US10897344
申请日：2004-07-22
IPC分类号： G11C5/00 , H01J37/302 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3174 , H01J2237/31761
摘要： The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation means 311 calculates the start-to-end point distance L of a writing pattern (S502), and number-of-scan-clocks calculating means 312 calculates the number of scan clocks required to write the writing pattern based on the start-to-end point distance L and a unit distance corresponding to the minimum time resolution for a high-speed D/A converter 306 (S503). Count conversion means 605 separates the start-to-end point distance L into X and Y components to convert them in an equation using the number of scan clocks (S504). Based on the equation, variable rate calculating means 314 calculates an extinction ratio to determine the extinction ratio at a variable attenuator 307 (S505). ATT D/A converter 303 specifies the extinction ratio at the attenuator 307 to reduce the unit distance corresponding to the resolving power of the high-speed D/A converter 306 so that an electron beam will be irradiated and scanned at intervals of the reduced unit distance to perform writing.
摘要翻译： 本发明旨在提供一种以高速度高精度地写入线的装置和方法。 距离计算装置311计算写入模式的起点到终点距离L（S502），并且扫描时间计算装置312基于开始时间计算装置312计算写入写入模式所需的扫描时钟数， 端点距离L和对应于高速D / A转换器306的最小时间分辨率的单位距离（S503）。 计数转换装置605将起点到终点距离L分离为X和Y分量，以使用扫描时钟数在等式中转换它们（S504）。 基于该方程，可变速率计算装置314计算消光比以确定可变衰减器307处的消光比（S505）。 ATT D / A转换器303指定衰减器307处的消光比，以减小对应于高速D / A转换器306的分辨率的单位距离，使得将电子束以缩小单位的间隔照射和扫描 执行写作的距离
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