公开(公告)号：US20240355577A1

公开(公告)日：2024-10-24

申请号：US18683071

申请日：2022-08-11

Applicant: ELDICO SCIENTIFIC AG

Inventor： Gunther STEINFELD ,  Harald NIEBEL ,  Christiaan VAN DEN BERG ,  Alexander VAN VEEN ,  Tomi TUOHIMAA

IPC: H01J37/21 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26 ,  H01J37/295

CPC classification number: H01J37/21 ,  H01J37/14 ,  H01J37/1474 ,  H01J37/153 ,  H01J37/265 ,  H01J37/2955 ,  H01J2237/002 ,  H01J2237/0453 ,  H01J2237/1532

Abstract: A charged-particle beam device for charged-particle crystallography of a crystalline sample comprises a charged-particle source for generating a charged-particle beam to be radiated onto a sample and a charged-particle-optical system downstream the charged-particle source, which is configured to form in a diffraction mode a substantially parallel charged-particle beam at a predefined sample position and in an imaging mode a focused charged-particle beam having a focus at the predefined sample position. The charged-particle-optical system comprises a charged-particle zoom lens system consisting of a first magnetic lens, a second magnetic lens downstream the first magnetic lens and a third magnetic lens downstream the second magnetic lens, wherein at least the second magnetic lens, preferably each one of the first, the second and the third magnetic lens has a variable focal length. The charged-particle-optical system further comprises a single beam limiting aperture with a fixed aperture diameter arranged at a fixed position between the second magnetic lens and the third magnetic lens for limiting the diameter of the charged-particle beam at the sample position. The charged-particle-optical system is configured such that the diameter of the charged-particle beam at the sample position is in a range between 100 nanometer and 1000 nanometer, in particular between 220 nanometer and 250 nanometer, in the diffraction mode, and in a range between 10 nanometer and 200 nanometer in the imaging mode.

公开(公告)号：US20240096586A1

公开(公告)日：2024-03-21

申请号：US17829230

申请日：2022-05-31

Applicant: KLA CORPORATION

Inventor： Xinrong JIANG ,  Christopher SEARS ,  Youfei JIANG ,  Sameet K. SHRIYAN ,  Jeong Ho LEE ,  Michael STEIGERWALD ,  Ralph NYFFENEGGER

IPC: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0451 ,  H01J2237/04735 ,  H01J2237/103 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/1532 ,  H01J2237/1536 ,  H01J2237/2448

Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the 5 primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.

公开(公告)号：US20190006145A1

公开(公告)日：2019-01-03

申请号：US16021017

申请日：2018-06-28

Applicant: NGR Inc.

Inventor： Koji KANEKO

IPC: H01J37/22 ,  G06T7/60 ,  G06T7/13 ,  H01J37/28

CPC classification number: H01J37/222 ,  G06T7/13 ,  G06T7/60 ,  G06T2207/10061 ,  G06T2207/30168 ,  H01J37/20 ,  H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: A method capable of verifying whether operation parameters, such as a focus parameter and an astigmatism correction parameter, of a scanning electron microscope are correctly adjusted. This method includes: determining a ratio of a length of an edge in a first direction to a length of the edge in a second direction perpendicular to the first direction, the edge being an edge of a pattern selected from design data; generating images of the pattern while changing an operation parameter of a scanning electron microscope; calculating an edge sharpness in the first direction of each of the images and calculating an edge sharpness in the second direction of each of the images; determining a ratio of a peak value of the edge sharpness in the first direction to a peak value of the edge sharpness in the second direction; and emitting an alarm if the ratio of the peak values does not coincide with the ratio of the lengths of the edge.

公开(公告)号：US20180144905A1

公开(公告)日：2018-05-24

申请号：US15806872

申请日：2017-11-08

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA ,  Yukitaka SHIMIZU

IPC: H01J37/302 ,  H01J37/317 ,  H01J37/04 ,  H01J37/20 ,  H01J37/10 ,  H01J37/153 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/302 ,  H01J37/045 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1532 ,  H01J2237/20221 ,  H01J2237/21 ,  H01J2237/24514 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/31774 ,  H01J2237/31798

Abstract: According to one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting a focus position of multiple beams, a coil correcting astigmatism of the multiple beams, an inspection aperture disposed in a stage and configured to allow one beam of the multiple beams to pass therethrough, a deflector deflecting the multiple beams, a current detector detecting a beam current of each beam of the multiple beams scanned over the inspection aperture in the XY direction and passed through the inspection aperture, and a controller generating a beam image on the basis of the detected beam current, calculating a feature quantity of the beam image, and controlling the objective lens or the coil on the basis of the feature quantity.

公开(公告)号：US09953802B2

公开(公告)日：2018-04-24

申请号：US15112716

申请日：2015-01-21

Applicant: Ramot at Tel-Aviv University Ltd.

Inventor： Roy Shiloh ,  Yossi Lereah ,  Ady Arie

IPC: G21K1/08 ,  H01J37/153 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2614

Abstract: A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase of the beam over a cross-section thereof.

公开(公告)号：US09928989B2

公开(公告)日：2018-03-27

申请号：US15620942

申请日：2017-06-13

Applicant: Intelligent Virus Imaging Inc

Inventor： Ida-Maria Sintorn ,  Rickard Nordstrom ,  Gustaf Kylberg

IPC: H01J37/153 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1532 ,  H01J2237/223

Abstract: The method is for automatic astigmatism correction of a lens system. A first image of a first frequency spectrum in a microscope is provided. The first image of a view is not in focus. The first image is then imaged. A first roundness measure of a distribution and directions of intensities in the first image is determined. The lens is changed to a second stigmator setting to provide a second image of a second frequency spectrum. The second image of the view is not in focus. The second image is the same view as the first image of the view at the first stigmator setting. A second roundness measure of a distribution and directions of intensities in the second image is determined. The first roundness measure is compared with the second roundness measure. The image with the roundness measure indicating the roundest distribution is selected.

公开(公告)号：US09754759B2

公开(公告)日：2017-09-05

申请号：US14947241

申请日：2015-11-20

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Benjamin John Cook ,  Dieter Winkler

IPC: H01J37/12 ,  H01J37/147

CPC classification number: H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis is described. The electrostatic multipole device comprises a substrate with at least one aperture opening for the charged particle beam, which extends along the optical axis through the substrate, and four or more electrodes which are formed on a first main surface of the substrate to influence the charged particle beam propagating through the aperture opening, wherein each of the four or more electrodes is arranged at a radial distance from a beam limiting edge of the aperture opening. Further, a method of manufacturing an electrostatic multipole device is described.

公开(公告)号：US09607806B2

公开(公告)日：2017-03-28

申请号：US13484231

申请日：2012-05-30

Applicant: Aernout Christiaan Zonnevylle ,  Pieter Kruit

Inventor： Aernout Christiaan Zonnevylle ,  Pieter Kruit

IPC: G21K1/08 ,  H01J37/30 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/15 ,  H01J2237/1532

Abstract: The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.

公开(公告)号：US09607805B2

公开(公告)日：2017-03-28

申请号：US15150858

申请日：2016-05-10

Applicant: Hermes Microvision Inc.

Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/04 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2817

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US20170018396A1

公开(公告)日：2017-01-19

申请号：US15124099

申请日：2015-06-17

Applicant: INTELLIGENT VIRUS IMAGING INC.

Inventor： Ida-Maria Sintorn ,  Rickard Nordstrom Nordstrom ,  Gustaf Kylberg

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J2237/1532 ,  H01J2237/223

Abstract: The method is for automatic astigmatism correction of a lens system. A first image is provided that is not in focus at a first stigmator setting of a set of lenses. A calculating device calculates a corresponding first Fourier spectrum image. A distribution and direction of pixels of the Fourier spectrum image are determined by calculating a first vector and a second vector. The first vector is compared with the second vector. The lens system is changed from a first stigmator setting to a second stigmator setting to provide a second image. A corresponding Fourier spectrum image is calculated. The distribution and direction of pixels of the second Fourier spectrum image is determined by calculating a third vector and a fourth vector. The third vector is compared to the fourth vector. The image that has the lowest vector ratio is selected.

Abstract translation: 该方法用于透镜系统的自动散光校正。 提供在一组透镜的第一施放器设置处不聚焦的第一图像。 计算装置计算对应的第一傅立叶光谱图像。 通过计算第一矢量和第二矢量来确定傅里叶谱图像的像素的分布和方向。 将第一个向量与第二个向量进行比较。 透镜系统从第一施放器设置改变为第二施放器设置以提供第二图像。 计算相应的傅立叶光谱图像。 通过计算第三矢量和第四矢量来确定第二傅立叶光谱图像的像素的分布和方向。 将第三个向量与第四个向量进行比较。 选择具有最低矢量比的图像。