公开(公告)号：US20120194809A1

公开(公告)日：2012-08-02

申请号：US13362808

申请日：2012-01-31

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/956

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于检测被检测物体上的缺陷或异物。 该装置包括用于安装样本的可移动台，用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统 方向。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

公开(公告)号：US20110149275A1

公开(公告)日：2011-06-23

申请号：US12992903

申请日：2009-05-13

申请人： Hiroyuki Nakano ,  Shunji Maeda ,  Toshihiko Nakata

发明人： Hiroyuki Nakano ,  Shunji Maeda ,  Toshihiko Nakata

IPC分类号： G01N21/956

CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N2021/9563

摘要： A defect inspection device, which inspects defects such as foreign materials existing on a specimen on which a circuit pattern of wiring or the like is formed, is provided with an illumination optical system which illuminates a plurality of different areas the specimen with a plurality of linear shaped beams and an image forming optical system that forms images of the plurality of the illuminated areas on a plurality of detectors, and the detectors are configured to receive a plurality of polarization components substantially at the same time and individually, wherein the polarization components are different from each other and are contained in each of the plurality of the optical images formed by the image forming optical system, thereby detecting a plurality of signals corresponding to the polarization components and carrying out the inspection at high speed under a plurality of optical conditions.

摘要翻译： 检查存在于其上形成有布线等的电路图案的样本上存在的异物的缺陷检查装置设置有照明光学系统，该照明光学系统用多个线性照射多个不同的区域 以及形成在多个检测器上的多个照明区域的图像的图像形成光学系统，并且检测器被配置为基本上同时和单独地接收多个偏振分量，其中偏振分量是不同的 并且被包含在由图像形成光学系统形成的多个光学图像的每一个中，从而检测对应于偏振分量的多个信号，并且在多个光学条件下高速执行检查。

公开(公告)号：US20100271628A1

公开(公告)日：2010-10-28

申请号：US12831102

申请日：2010-07-06

申请人： Hiroyuki NAKANO ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki NAKANO ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向，用于利用来自倾斜方向的光照射电路图案的照明系统，以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US20090213366A1

公开(公告)日：2009-08-27

申请号：US12435523

申请日：2009-05-05

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/958

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括：载置基板试样的载台部分，其可以在XYZ-θ方向中任意移动;照射系统，用于利用来自倾斜方向的光照射电路图案;以及图像形成 光学系统，用于从上下方向在检测器上形成照射的检测区域的图像。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US20060290923A1

公开(公告)日：2006-12-28

申请号：US11472426

申请日：2006-06-22

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

公开(公告)号：US08634069B2

公开(公告)日：2014-01-21

申请号：US12992903

申请日：2009-05-13

申请人： Hiroyuki Nakano ,  Shunji Maeda ,  Toshihiko Nakata

发明人： Hiroyuki Nakano ,  Shunji Maeda ,  Toshihiko Nakata

IPC分类号： G01N21/88

CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N2021/9563

摘要： A defect inspection device, which inspects defects such as foreign materials existing on a specimen on which a circuit pattern of wiring or the like is formed, is provided with an illumination optical system which illuminates a plurality of different areas the specimen with a plurality of linear shaped beams and an image forming optical system that forms images of the plurality of the illuminated areas on a plurality of detectors, and the detectors are configured to receive a plurality of polarization components substantially at the same time and individually, wherein the polarization components are different from each other and are contained in each of the plurality of the optical images formed by the image forming optical system, thereby detecting a plurality of signals corresponding to the polarization components and carrying out the inspection at high speed under a plurality of optical conditions.

摘要翻译： 检查存在于其上形成有布线等的电路图案的样本上存在的异物的缺陷检查装置设置有照明光学系统，该照明光学系统用多个线性照射多个不同的区域 以及形成在多个检测器上的多个照明区域的图像的图像形成光学系统，并且检测器被配置为基本上同时和单独地接收多个偏振分量，其中偏振分量是不同的 并且被包含在由图像形成光学系统形成的多个光学图像的每一个中，从而检测对应于偏振分量的多个信号，并且在多个光学条件下高速执行检查。

公开(公告)号：US07528942B2

公开(公告)日：2009-05-05

申请号：US11472426

申请日：2006-06-22

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括：载置基板试样的载台部分，其可以在XYZ-θ方向中任意移动;照射系统，用于利用来自倾斜方向的光照射电路图案;以及图像形成 光学系统，用于从上下方向在检测器上形成照射的检测区域的图像。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US20080068593A1

公开(公告)日：2008-03-20

申请号：US11853050

申请日：2007-09-11

申请人： HIROYUKI NAKANO ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Taketo Ueno

发明人： HIROYUKI NAKANO ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Taketo Ueno

IPC分类号： G01N21/00

CPC分类号： G01N21/95623 ,  G01N21/21 ,  G01N21/95607 ,  G01N2201/0655

摘要： A defect detecting apparatus for detecting defects on a substrate sample (wafer) having circuit patterns such as interconnections. The defect detecting apparatus is provided with stages that can be moved arbitrarily in each of the X, Y, Z, and θ directions in a state that the substrate sample is mounted thereon, an illumination optical system for illuminating the circuit patterns from one or plural directions, and a detection optical system for detecting reflection light, diffraction light, or scattered light coming from an inspection region being illuminated through almost the entire hemispherical surface having the substrate sample as the bottom surface. The NA (numerical aperture) thereby falls within a range of 0.7 to 1.0. Harmful defects or foreign substances can be detected so as to be separated from non-defects such as surface roughness of interconnections.

摘要翻译： 一种用于检测具有诸如互连之类的电路图案的衬底样品（晶片）上的缺陷的缺陷检测装置。 该缺陷检测装置设置有可以在其上安装衬底样品的状态下在X，Y，Z和θ方向中的任一个中任意移动的阶段，用于从一个或多个照明电路图案的照明光学系统 方向，以及用于检测来自检查区域的反射光，衍射光或散射光的检测光学系统，该检查区域被基底样品的几乎整个半球形表面照射作为底面。 NA（数值孔径）因此落在0.7至1.0的范围内。 可以检测有害的缺陷或异物，以便与诸如互连的表面粗糙度的无缺陷分离。

公开(公告)号：US06825437B2

公开(公告)日：2004-11-30

申请号：US10231267

申请日：2002-08-30

申请人： Hiroyuki Nakano ,  Takeshi Arai ,  Toshihiko Nakata

发明人： Hiroyuki Nakano ,  Takeshi Arai ,  Toshihiko Nakata

IPC分类号： B23K1000

CPC分类号： G01N21/51 ,  G01N21/94 ,  H01J2237/0225

摘要： When determining the presence of foreign particles in a processing chamber by radiating a laser beam inside a processing chamber and detecting scattered light from foreign particles within the processing chamber, the detection of scattered light is performed using a detecting lens having a wide field angle and deep focal depth. Accordingly, the detection of foreign particles floating in the processing chamber can be performed across a wide range, and with uniform sensitivity, with a detecting optical system having a simple constitution.

摘要翻译： 当通过在处理室内辐射激光束并且检测处理室内的异物的散射光来确定处理室中外来颗粒的存在时，使用具有宽场角和深度的检测透镜来执行散射光的检测 焦点深度 因此，利用具有简单结构的检测光学系统，可以在宽范围内以及具有均匀灵敏度的方式对漂浮在处理室中的异物进行检测。

公开(公告)号：US06355570B1

公开(公告)日：2002-03-12

申请号：US09260074

申请日：1999-03-02

申请人： Toshihiko Nakata ,  Takanori Ninomiya ,  Sachio Uto ,  Hiroyuki Nakano

发明人： Toshihiko Nakata ,  Takanori Ninomiya ,  Sachio Uto ,  Hiroyuki Nakano

IPC分类号： H01L21302

CPC分类号： G01N21/53 ,  G01N21/94 ,  G01N21/9501

摘要： The present invention provides a semiconductor manufacturing method, a plasma processing method and a plasma processing apparatus for generating a plasma in a processing chamber and carrying out processing on material to be processed by using the plasma, comprising a floating-foreign-particle measuring apparatus including: a light radiating optical system for radiating a light having a desired wavelength and completing intensity modulation at a desired frequency to the processing chamber; a scattered-light detecting optical system for separating a component with the desired wavelength from scattered lights obtained from the processing chamber as a result of radiation of the light by the light radiating optical system, for optically receiving the component and for converting the component into a first signal; and a foreign-particle-signal extracting unit which separates a second signal representing foreign particle floating in the plasma or in an area in proximity to the plasma from a third signal obtained by emission of the plasma for detection of the second signal by extraction of a component with the desired frequency used for the intensity modulation from the first signal obtained from the scattered-light detecting optical system.