公开(公告)号：US4401745A

公开(公告)日：1983-08-30

申请号：US296358

申请日：1981-08-26

申请人： Hisashi Nakane ,  Wataru Kanai ,  Minoru Tsuda

发明人： Hisashi Nakane ,  Wataru Kanai ,  Minoru Tsuda

IPC分类号： C08F2/00 ,  C08F2/54 ,  G03F7/008 ,  G03F7/031 ,  G03F7/36 ,  G03C1/52

CPC分类号： G03F7/0085 ,  G03F7/031 ,  Y10S430/12 ,  Y10S430/128

摘要： A composition for ultra-fine pattern formation comprising at least one of acrylic and/or vinyl ketone polymers as the major component and an effective amount of an aromatic azide compound and, in another embodiment, further comprising an effective amount of an organic compound having a vinyl group, and a process for ultra-fine pattern formation therewith. In the process, a required area of a film formed from the composition is irradiated with a corpuscular beam or with electromagnetic wave radiation. The aromatic azide compound or a mixture thereof with the aromatic compound having a vinyl group only in the unexposed areas is subjected to a deactivation treatment within the film, and the unexposed areas of the film are removed with a gas plasma to form an ultra-fine pattern. The composition is suitable for use in the ultra-fine pattern formation of a resist for transistors, integrated circuits (IC), large scale integrated circuits (LSI) or the like in the semiconductor industry.

摘要翻译： 一种用于超细图案形成的组合物，其包含丙烯酸和/或乙烯基酮聚合物作为主要组分中的至少一种和有效量的芳族叠氮化合物，并且在另一个实施方案中，还包含有效量的具有 乙烯基，以及与其形成超微细图案的方法。 在该过程中，由组合物形成的膜的所需面积被照射了粒子束或电磁波辐射。 芳族叠氮化合物或其与仅在未曝光区域中具有乙烯基的芳族化合物的混合物在膜内进行钝化处理，并且用气体等离子体除去膜的未曝光区域以形成超细 模式。 该组合物适合用于半导体工业中的晶体管，集成电路（IC），大型集成电路（LSI）等的抗蚀剂的超微细图案形成。

公开(公告)号：US4388397A

公开(公告)日：1983-06-14

申请号：US248325

申请日：1981-03-27

申请人： Wataru Kanai

发明人： Wataru Kanai

IPC分类号： G03F7/36 ,  G03F7/008 ,  H01L21/027 ,  G03C1/71 ,  G03C1/60 ,  G03C1/70

CPC分类号： G03F7/008 ,  Y10S430/108 ,  Y10S430/109 ,  Y10S430/111 ,  Y10S430/128

摘要： A novel photosensitive composition for dry development in the ultra-fine pattern formation of the semiconductor industry, which is composed of at least one of acrylic and vinyl ketone polymers and a specified subliming hisazide compound as a photocuring agent, is disclosed.The use of the photosensitive composition provides a very effective ultra-fine pattern formation process in the semiconductor industry with such advantages that unexposed areas are selectively removable by treating with a plasma, and consequently plasma development becomes available so that high resolution may easily be obtained. Automating and dry processing of all the stages ranging from development processing to stripping processing become available when using the photosensitive composition of this invention. No expensive treating reagents are needed and environmental pollution is eliminated.

摘要翻译： 公开了由丙烯酸和乙烯基酮聚合物中的至少一种和特定的升华含量的叠氮化合物作为光固化剂组成的半导体工业的超微细图案形成中的用于干燥显影的新型光敏组合物。 感光组合物的使用在半导体工业中提供非常有效的超细图案形成方法，具有这样的优点，即通过用等离子体处理可选择性地除去未曝光的区域，从而可以容易地获得高分辨率的等离子体显影。 当使用本发明的感光组合物时，从显影处理到剥离处理的所有阶段的自动和干燥处理变得可用。 不需要昂贵的处理试剂，消除了环境污染。

公开(公告)号：US4468447A

公开(公告)日：1984-08-28

申请号：US472004

申请日：1983-03-04

申请人： Wataru Kanai

发明人： Wataru Kanai

IPC分类号： G03F7/36 ,  G03F7/008 ,  H01L21/027 ,  G03C1/71 ,  G03C1/60 ,  G03C1/70

CPC分类号： G03F7/008 ,  Y10S430/108 ,  Y10S430/109 ,  Y10S430/111 ,  Y10S430/128

摘要： A novel photosensitive composition for dry development in the ultra-fine pattern formation of the semiconductor industry, which is composed of at least one of acrylic and vinyl ketone polymers and a specified subliming bisazide compound as a photocuring agent, is disclosed.The use of the photosensitive composition provides a very effective ultra-fine pattern formation process in the semiconductor industry with such advantages that unexposed areas are selectively removable by treating with a plasma, and consequently plasma development becomes available so that high resolution may easily be obtained. Automating and dry processing of all the stages ranging from development processing to stripping processing become available when using the photosensitive composition of this invention. No expensive treating reagents are needed and environmental pollution is eliminated.

摘要翻译： 公开了由丙烯酸和乙烯基酮聚合物中的至少一种和特定的升华双叠氮化合物作为光固化剂组成的半导体工业的超细图案形成中的用于干式显影的新型光敏组合物。 感光组合物的使用在半导体工业中提供非常有效的超细图案形成方法，具有这样的优点，即通过用等离子体处理可选择性地除去未曝光的区域，从而可以容易地获得高分辨率的等离子体显影。 当使用本发明的感光组合物时，从显影处理到剥离处理的所有阶段的自动和干燥处理变得可用。 不需要昂贵的处理试剂，消除了环境污染。

公开(公告)号：US20090135587A1

公开(公告)日：2009-05-28

申请号：US12274599

申请日：2008-11-20

申请人： Tetsuya Oketani ,  Wataru Kanai ,  Yoshiki Makishima

发明人： Tetsuya Oketani ,  Wataru Kanai ,  Yoshiki Makishima

IPC分类号： A47F11/10 ,  F25D27/00

CPC分类号： A47F3/001 ,  A47F3/0426

摘要： An object is to provide a showcase in which appropriate illumination is realized by an LED illumination apparatus having a high durability against turning ON/OFF and capable of securing a predetermined illumination intensity even under an environment at a low temperature and in which dew condensation caused in a door frame can effectively be suppressed. The showcase in which the inside of a display chamber constituted in a main body so as to display commodities is illuminated by the LED illumination apparatus includes a glass door which openably closes an opening of the display chamber, and a metal door frame which is provided in the main body so as to constitute an opening edge of the display chamber and on which the glass door abuts, and the LED illumination apparatus is provided on the surface of the door frame on the side of the display chamber in a heat exchange relation.

摘要翻译： 本发明的目的是提供一种展示柜，其中通过具有对打开/关闭的高耐久性的LED照明装置实现适当的照明，并且即使在低温环境下也能够确保预定的照明强度，并且其中产生结露 可以有效地抑制门框。 其中，由LED照明装置照明在主体中构成显示商品的显示室的内部的展示柜，其包括可打开地封闭显示室的开口的玻璃门和设置在显示室中的金属门框 所述主体构成所述显示室的开口边缘，并且所述玻璃门抵接在所述主体上，所述LED照明装置以与热交换关系在所述显示室侧的所述门框的表面上设置。