公开(公告)号：US20230352262A1

公开(公告)日：2023-11-02

申请号：US17928401

申请日：2020-06-29

Applicant: Hitachi High-Tech Corporation

Inventor： Keigo KASUYA ,  Shuhei ISHIKAWA ,  Kenji TANIMOTO ,  Takashi DOI ,  Soichiro MATSUNAGA ,  Hiroshi MORITA ,  Daigo KOMESU ,  Kenji MIYATA

IPC: H01J37/065 ,  H01J37/073 ,  H01J37/28

CPC classification number: H01J37/065 ,  H01J37/073 ,  H01J37/28

Abstract: In an electron source including a suppressor electrode having an opening at one end portion thereof in a direction along a central axis and an electron emission material having a distal end protruding from the opening, the suppressor electrode further includes a receding portion receding to a position farther from the distal end of the electron emission material than the opening in the direction along the central axis at a position in an outer peripheral direction than the opening, and at least a part of the receding portion is disposed within a diameter of 2810 μm from a center of the opening. Accordingly, an electron source, an electron gun, and a charged particle beam device such as an electron microscope using the same, in which a machine difference in a device performance due to an axial shift between the electron emission material and the suppressor electrode is reduced, are implemented.