公开(公告)号：US20240111281A1

公开(公告)日：2024-04-04

申请号：US18375734

申请日：2023-10-02

Applicant: Hitachi High-Tech Corporation

Inventor： Kenji TAMAKI ,  Wataru KANNO ,  Takashi DOI ,  Fumihiro SASAJIMA

IPC: G05B23/02 ,  G05B13/04

CPC classification number: G05B23/0283 ,  G05B13/048 ,  G05B23/024

Abstract: A deterioration prediction system for a semiconductor manufacturing equipment or a semiconductor inspection equipment, including: an input device receiving, as an input, time series data indicating a state of the equipment; a deterioration prediction device having an estimation unit discriminating fluctuation in the time series data into fluctuation caused by changing setting of the equipment and fluctuation caused by deterioration of the equipment and estimating a time point when the setting is changed, a division unit dividing the time series data into the plurality of periods bounded by the time points, a discrimination unit discriminating at least a trend component from the fluctuation in the time series data in the period, and a prediction unit predicting the deterioration of the equipment based on at least the trend component; and an output device outputting a result of the prediction.

公开(公告)号：US20230352262A1

公开(公告)日：2023-11-02

申请号：US17928401

申请日：2020-06-29

Applicant: Hitachi High-Tech Corporation

Inventor： Keigo KASUYA ,  Shuhei ISHIKAWA ,  Kenji TANIMOTO ,  Takashi DOI ,  Soichiro MATSUNAGA ,  Hiroshi MORITA ,  Daigo KOMESU ,  Kenji MIYATA

IPC: H01J37/065 ,  H01J37/073 ,  H01J37/28

CPC classification number: H01J37/065 ,  H01J37/073 ,  H01J37/28

Abstract: In an electron source including a suppressor electrode having an opening at one end portion thereof in a direction along a central axis and an electron emission material having a distal end protruding from the opening, the suppressor electrode further includes a receding portion receding to a position farther from the distal end of the electron emission material than the opening in the direction along the central axis at a position in an outer peripheral direction than the opening, and at least a part of the receding portion is disposed within a diameter of 2810 μm from a center of the opening. Accordingly, an electron source, an electron gun, and a charged particle beam device such as an electron microscope using the same, in which a machine difference in a device performance due to an axial shift between the electron emission material and the suppressor electrode is reduced, are implemented.

公开(公告)号：US20220199349A1

公开(公告)日：2022-06-23

申请号：US17601421

申请日：2019-04-18

Applicant: Hitachi High-Tech Corporation

Inventor： Keigo KASUYA ,  Akira IKEGAMI ,  Kazuhiro HONDA ,  Masahiro FUKUTA ,  Takashi DOI ,  Souichi KATAGIRI ,  Aki TAKEI ,  Soichiro MATSUNAGA

IPC: H01J37/073

Abstract: A large current electron beam is stably emitted from an electron gun of a charged particle beam device. The electron gun of the charged particle beam device includes: a SE tip 202; a suppressor 303 disposed rearward of a distal end of the SE tip; a cup-shaped extraction electrode 204 including a bottom surface and a cylindrical portion and enclosing the SE tip and the suppressor; and an insulator 208 holding the suppressor and the extraction electrode. A shield electrode 301 of a conductive metal having a cylindrical portion 302 is provided between the suppressor and the cylindrical portion of the extraction electrode. A voltage lower than a voltage of the SE tip is applied to the shield electrode.

公开(公告)号：US20240379318A1

公开(公告)日：2024-11-14

申请号：US18691071

申请日：2021-10-19

Applicant: Hitachi High-Tech Corporation

Inventor： Keigo KASUYA ,  Shuhei ISHIKAWA ,  Kenji TANIMOTO ,  Shunichi WATANABE ,  Takashi DOI ,  Yusuke SAKAI

IPC: H01J37/073 ,  H01J37/28

Abstract: Provided is a charged particle beam device that can precisely manage a temperature at which a cold field emitter is heated. A charged particle beam device includes: a cold field emitter including a tip having a sharpened distal end, a filament connected to the tip, and an auxiliary electrode covering the filament and having an opening from which the tip protrudes; an extraction electrode to which an extraction voltage for extracting electrons from the cold field emitter is applied; and an acceleration electrode to which an acceleration voltage for accelerating the electrons extracted from the cold field emitter is applied. When the tip and the filament are heated, thermionic electrons emitted from the tip and the filament are collected by the auxiliary electrode to measure a current by applying a positive voltage with respect to the tip to the auxiliary electrode.

公开(公告)号：US20220223372A1

公开(公告)日：2022-07-14

申请号：US17595742

申请日：2019-07-02

Applicant: Hitachi High-Tech Corporation

Inventor： Naoki AKIMOTO ,  Takashi DOI ,  Yuzuru MOCHIZUKI

IPC: H01J37/28 ,  H01J37/09 ,  H01J37/26

Abstract: There is provided a charged particle beam system having a computer system for controlling an acceleration voltage of a charged particle beam emitted from a charged particle source, the system including: a first diaphragm group having first and second diaphragms which are diaphragms that act on the charged particle beam and have different thicknesses; and a first diaphragm switching mechanism for switching the diaphragm in the first diaphragm group, in which the computer system controls the first diaphragm switching mechanism so as to switch from the first diaphragm to the second diaphragm according to an increase or decrease of the acceleration voltage.

公开(公告)号：US20230298845A1

公开(公告)日：2023-09-21

申请号：US18016764

申请日：2020-07-20

Applicant: Hitachi High-Tech Corporation

Inventor： Kazuhiro HONDA ,  Hiroyuki ITO ,  Takashi DOI ,  Soichiro MATSUNAGA

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/09 ,  H01J37/244

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/09 ,  H01J37/244 ,  H01J2237/057 ,  H01J2237/04924 ,  H01J2237/0475 ,  H01J2237/24485

Abstract: A decelerating electrode of this energy filter comprises: an electrode pair that has an opening; and a cavity portion that provided in a rotationally symmetrical manner with the center of the opening as the optical axis. Voltages with electric potentials that are substantially the same as that of a charged particle beam are independently applied to the both sides of the decelerating electrode. When an electrical field protrudes into the cavity portion provided in the decelerating electrode, a saddle point having the same electric potential as that of incident charged particles is formed inside the decelerating electrode. The saddle point acts as a high pass filter for incident charged particles at an energy resolution of 1 mV or less. By analyzing charged particles which have been energy-separated, it is possible to measure the energy spectrum and ΔE at the high resolution of 1 mV or less. In addition, by causing the energy-separated charged particle beam to converge and scan on the sample surface with an electron lens, it is possible to obtain an SEM/STEM image with a high resolution (see FIG. 3).

公开(公告)号：US20220351934A1

公开(公告)日：2022-11-03

申请号：US17621503

申请日：2019-07-02

Applicant: Hitachi High-Tech Corporation

Inventor： Erina KAWAMOTO ,  Soichiro MATSUNAGA ,  Souichi KATAGIRI ,  Keigo KASUYA ,  Takashi DOI ,  Tetsuya SAWAHATA ,  Minoru YAMAZAKI

IPC: H01J37/077 ,  H01J37/18 ,  H01J37/075

Abstract: The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.