公开(公告)号：US20240203708A1

公开(公告)日：2024-06-20

申请号：US17802639

申请日：2021-08-23

Applicant: Hitachi High-Tech Corporation

Inventor： Kazuhiro UEDA ,  Kazuyuki IKENAGA

IPC: H01J37/32 ,  B08B3/12

CPC classification number: H01J37/32862 ,  B08B3/12 ,  H01J37/32495 ,  H01J2237/3151

Abstract: A cleaning method of a protective film for a plasma processing apparatus, the protective film being formed on a surface of a base material disposed inside a processing chamber of the plasma processing apparatus for processing a wafer using plasma, and containing a material having resistance to the plasma, and the cleaning method includes: (a) a step of preparing the base material including the film containing yttrium on the surface; and (b) a step of cleaning performed by immersing the base material in a dilute nitric acid solution and performing ultrasonic irradiation on the film, in which in the step (b), an elution rate of yttrium is detected in the cleaning, and the cleaning is stopped after the elution rate of yttrium after a start of the ultrasonic irradiation sequentially goes through a first decrease, a first increase, and a second decrease and before a second increase occurs.

公开(公告)号：US20230207279A1

公开(公告)日：2023-06-29

申请号：US18115124

申请日：2023-02-28

Applicant: Hitachi High-Tech Corporation

Inventor： Kazuhiro UEDA ,  Kazuyuki IKENAGA ,  Tomoyuki TAMURA ,  Masahiro SUMIYA

IPC: H01J37/32 ,  C23C14/06

CPC classification number: H01J37/32495 ,  C23C14/0694 ,  H01J37/32477 ,  H01J2237/332 ,  H01J2237/334

Abstract: A plasma processing apparatus includes: a processing chamber disposed inside a vacuum container and in which plasma is formed; and a member which is a member forming an inner wall surface of the processing chamber and is disposed on a surface to be exposed to the plasma and has a coating film formed by spraying of yttrium fluoride or a material containing the yttrium fluoride. A ratio of an orthorhombic crystal of the yttrium fluoride or the material containing the yttrium fluoride forming the coating film relative to the entirety is 60% or more.

公开(公告)号：US20230095532A1

公开(公告)日：2023-03-30

申请号：US17907921

申请日：2020-03-30

Applicant: Hitachi High-Tech Corporation

Inventor： Fumihiro SASAJIMA ,  Masami TAKANO ,  Kazuhiro UEDA ,  Masayoshi ISHIKAWA ,  Yasuhiro YOSHIDA

IPC: G05B23/02

Abstract: The present disclosure proposes a diagnostic system capable of properly identifying the cause of even an error for which multiple factors or multiple compound factors may be accountable. The diagnostic system according to the present disclosure is provided with a learning device for learning at least one of a recipe defining operations of an inspection device, log data describing states of the device, or specimen data describing characteristics of a specimen in association with error types of the device, and estimates the cause of the error by using the learning device (refer to FIG. 4).

公开(公告)号：US20220334172A1

公开(公告)日：2022-10-20

申请号：US17634809

申请日：2019-09-06

Applicant: Hitachi High-Tech Corporation

Inventor： Kouichi HAYAKAWA ,  Masami TAKANO ,  Kazuhiro UEDA ,  Masayoshi ISHIKAWA ,  Yasuhiro YOSHIDA

IPC: G01R31/28 ,  H01L21/66

Abstract: An objective of the present invention is to provide a system which can infer the cause of a recipe error and present a correction candidate for the recipe error. A recipe information presentation system or recipe error inference system according to the present invention: causes a learner to learn a correspondence between a recipe and an error originating from the recipe; and acquires from the learner an inference result as to whether the error occurs when a new recipe is used (refer to FIG. 1).