公开(公告)号：US20240339308A1

公开(公告)日：2024-10-10

申请号：US18027200

申请日：2022-01-25

Applicant: Hitachi High-Tech Corporation

Inventor： Satoru Matsukura ,  Yoshito KAMAJI ,  Nanako TAMARI ,  Akira KAGOSHIMA ,  Masahiro SUMIYA

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/32926 ,  H01J37/32935 ,  H01L21/67253

Abstract: An apparatus diagnostic apparatus that performs a computation process using data acquired from a semiconductor apparatus manufacturing apparatus having a reference chamber to create reference chamber feature quantity map data by mapping a feature quantity onto a graph having axes representing a plurality of parameters. The apparatus diagnostic apparatus also performs a computation process using data acquired from a semiconductor apparatus manufacturing apparatus having a calibration-target chamber to create calibration-target chamber feature quantity map data by mapping a feature quantity onto a graph having axes representing a plurality of parameters. Based on patterns observed in the reference chamber feature quantity map data and the calibration-target chamber feature quantity map data, the apparatus diagnostic apparatus identifies a performance difference between different chambers, a performance difference resulting from a temporal change of a single chamber, or a performance difference resulting from component replacement or component cleaning of a single chamber.