ELECTRON BEAM APPLICATION DEVICE
    1.
    发明公开

    公开(公告)号:US20240161997A1

    公开(公告)日:2024-05-16

    申请号:US18282906

    申请日:2021-04-16

    摘要: A light source that emits pulse excitation light includes a laser light source, an optical splitter that splits a pulse laser beam into a plurality of pulse laser beams, phase adjusters and optical amplifiers provided for the pulse laser beams, and an optical combiner that combines the plurality of pulse laser beams whose phases are adjusted and that are amplified, and outputs combined light as the pulse excitation light. An optical phase controller controls phase delay amounts of the phase adjusters, and an optical monitor detects an inclination of the pulse excitation light relative to an optical axis of a focusing lens. The optical phase controller stores phase delay amount data indicating phase delay amounts of the plurality of phase adjusters in which the inclination is a predetermined value, and sets the phase delay amounts of the plurality of phase adjusters based on the phase delay amount data.

    ELECTRON GUN AND ELECTRON MICROSCOPE

    公开(公告)号:US20220406558A1

    公开(公告)日:2022-12-22

    申请号:US17798092

    申请日:2020-03-25

    IPC分类号: H01J37/073 H01J1/34

    摘要: The electron gun is provided with a first anode electrode and a second anode electrode to generate an acceleration and deceleration electric field. A lens electric field makes it possible to irradiate a sample with an electron beam emitted from a part outside an optical axis of the photoelectric film without being blocked by a differential exhaust diaphragm. A wide range of electron beams off-optical axis can be used even in a high-brightness photocathode that requires high vacuum. As a result, the photoelectric film and the electron gun can be extended in life, can be stabilized, and can be increased in brightness. Further, it is possible to facilitate a control of emitting electron beams from a plurality of positions on the photoelectric film, a timing control of emitting electron beams from a plurality of positions, a condition control of an electron beam in an electron microscope using electron beams.