SEMICONDUCTOR CHIPS AND METHODS OF FORMING THE SAME
    1.
    发明申请
    SEMICONDUCTOR CHIPS AND METHODS OF FORMING THE SAME 审中-公开
    半导体器件及其形成方法

    公开(公告)号:US20120049349A1

    公开(公告)日:2012-03-01

    申请号:US13178156

    申请日:2011-07-07

    IPC分类号: H01L23/498 H01L21/28

    CPC分类号: H01L21/76898

    摘要: Provided is a semiconductor chip including a back side insulation structure. The semiconductor chip may include a semiconductor layer including an active surface and an inactive surface facing each other; the insulating layer includes a first surface adjacent to the inactive surface and a second surface facing the first surface. The insulating layer is disposed on the inactive surface of the semiconductor layer. A penetrating electrode fills a hole penetrating the semiconductor layer and the insulating layer. The through electrode comprises a protrusive portion protruding from the second surface of the insulating layer.

    摘要翻译: 提供了包括背面绝缘结构的半导体芯片。 半导体芯片可以包括半导体层,其包括相互面对的有源表面和非活性表面; 绝缘层包括与非活性表面相邻的第一表面和面向第一表面的第二表面。 绝缘层设置在半导体层的非活性表面上。 穿透电极填充穿透半导体层和绝缘层的孔。 贯通电极包括从绝缘层的第二表面突出的突出部分。