公开(公告)号：US20080213418A1

公开(公告)日：2008-09-04

申请号：US11931280

申请日：2007-10-31

申请人： Hua Tan ,  Wei Zhang ,  He Gao ,  Linshu Kong ,  Lin Hu ,  Colby Steere ,  Stephen Y. Chou

发明人： Hua Tan ,  Wei Zhang ,  He Gao ,  Linshu Kong ,  Lin Hu ,  Colby Steere ,  Stephen Y. Chou

IPC分类号： H01L21/304

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7042

摘要： An imprint system for imprint lithography comprises an alignment subsystem and an imprint subsystem. The mask (mold) and the wafer for imprinting (substrate) are align on the alignment subsystem and contacted to each other to form a mask/wafer set. The mask/wafer set is then transferred onto the imprint subsystem while alignment is maintained. The mask/wafer set is then imprinted on the imprint subsystem. During transfer, the mask/wafer set can be held in alignment by surface. The surface adhesion can be enhanced by local pressing, local heating, or both. Alternatively, the mask/wafer set can be held in alignment by clamping. Advantageously, the imprinting is effected by fluid pressure imprinting.

摘要翻译： 用于压印光刻的压印系统包括对准子系统和压印子系统。 掩模（模具）和用于压印的晶片（衬底）在对准子系统上对准并且彼此接触以形成掩模/晶片组。 然后将掩模/晶片组转移到压印子系统上，同时保持对准。 然后将掩模/晶片组印在压印子系统上。 在传送期间，掩模/晶片组可以通过表面保持对准。 表面粘合可通过局部加压，局部加热或两者增强。 或者，掩模/晶片组可以通过夹持保持对准。 有利地，压印通过流体压力印迹来实现。

公开(公告)号：US08337959B2

公开(公告)日：2012-12-25

申请号：US11945470

申请日：2007-11-27

申请人： Wei Zhang ,  Lin Hu ,  Hua Tan ,  He Gao ,  Linshu Kong ,  Stephen Y. Chou

发明人： Wei Zhang ,  Lin Hu ,  Hua Tan ,  He Gao ,  Linshu Kong ,  Stephen Y. Chou

IPC分类号： H05H1/24 ,  C23C16/00 ,  B05D3/00 ,  B05D3/02

CPC分类号： H01J37/32431 ,  B82Y10/00 ,  B82Y40/00 ,  C23C14/12 ,  G03F7/0002 ,  H01J2237/3355

摘要： In imprint lithography, the mold is coated with a surface release layer for a non-sticking separation. Bonding strength of the release layer to the mold depends on the cleanness of the surface and the process of release layer deposition. In accordance with the invention, the mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay. The chamber encloses a support chuck for the mold or substrate, a surface cleaner unit adjacent the support, a heating source adjacent the support, and advantageously, sensors of measuring chamber pressure, vapor partial pressure and moisture concentration. A vapor source connected to the chamber supplies release surfactant vapor. The mold is cleaned, and the cleaning is followed by vapor phase deposition of the surfactant. The mold is advantageously heated. Typical ways of cleaning include exposure to ozone or plasma ion etch. Surfactant vapor may be generated by liquid surface vaporization, liquid injection or spray vaporization. A surface adhesion promoter can be coated on the substrate by a similar method with the same apparatus.

摘要翻译： 在压印光刻中，模具涂有用于不粘分离的表面剥离层。 脱模层与模具的粘合强度取决于表面的清洁度和剥离层沉积过程。 根据本发明，模具设置在可抽空的室中，被清洁以除去表面有机污染物并且涂覆在室中的表面释放层，全部不需要重新定位或不期望的时间延迟。 腔室包围用于模具或基底的支撑卡盘，与支撑件相邻的表面清洁器单元，邻近支撑件的加热源，有利地是测量室压力，蒸气分压和水分浓度的传感器。 连接到室的蒸气源提供表面活性剂蒸气。 模具被清洁，清洁之后是表面活性剂的气相沉积。 有利地加热模具。 典型的清洁方法包括暴露于臭氧或等离子体离子蚀刻。 表面活性剂蒸气可以通过液体表面蒸发，液体注入或喷雾蒸发来产生。 表面粘合促进剂可以通过类似的方法用相同的装置涂覆在基材上。

公开(公告)号：US20080131623A1

公开(公告)日：2008-06-05

申请号：US11945470

申请日：2007-11-27

申请人： Wei Zhang ,  Lin Hu ,  Hua Tan ,  He Gao ,  Linshu Kong ,  Stephen Y. Chou

发明人： Wei Zhang ,  Lin Hu ,  Hua Tan ,  He Gao ,  Linshu Kong ,  Stephen Y. Chou

IPC分类号： C23C16/00 ,  B28B7/38 ,  H05H1/24

CPC分类号： H01J37/32431 ,  B82Y10/00 ,  B82Y40/00 ,  C23C14/12 ,  G03F7/0002 ,  H01J2237/3355

摘要： In imprint lithography, the mold is coated with a surface release layer for a non-sticking separation. Bonding strength of the release layer to the mold depends on the cleanness of the surface and the process of release layer deposition. In accordance with the invention, the mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay. The chamber encloses a support chuck for the mold or substrate, a surface cleaner unit adjacent the support, a heating source adjacent the support, and advantageously, sensors of measuring chamber pressure, vapor partial pressure and moisture concentration. A vapor source connected to the chamber supplies release surfactant vapor. The mold is cleaned, and the cleaning is followed by vapor phase deposition of the surfactant. The mold is advantageously heated. Typical ways of cleaning include exposure to ozone or plasma ion etch. Surfactant vapor may be generated by liquid surface vaporization, liquid injection or spray vaporization. A surface adhesion promoter can be coated on the substrate by a similar method with the same apparatus.

摘要翻译： 在压印光刻中，模具涂有用于不粘分离的表面剥离层。 脱模层与模具的粘合强度取决于表面的清洁度和剥离层沉积过程。 根据本发明，模具设置在可抽空的室中，被清洁以除去表面有机污染物并且涂覆在室中的表面释放层，全部不需要重新定位或不期望的时间延迟。 腔室包围用于模具或基底的支撑卡盘，与支撑件相邻的表面清洁器单元，邻近支撑件的加热源，有利地是测量室压力，蒸气分压和水分浓度的传感器。 连接到室的蒸气源提供表面活性剂蒸气。 模具被清洁，清洁之后是表面活性剂的气相沉积。 有利地加热模具。 典型的清洁方法包括暴露于臭氧或等离子体离子蚀刻。 表面活性剂蒸气可以通过液体表面蒸发，液体注入或喷雾蒸发来产生。 表面粘合促进剂可以通过类似的方法用相同的装置涂覆在基材上。

公开(公告)号：US20220017886A1

公开(公告)日：2022-01-20

申请号：US17497963

申请日：2021-10-10

申请人： Haiqin Chen ,  Bo Yang ,  He Gao ,  Jianxin Zhao ,  Yongquan Chen ,  Hao Zhang ,  Wei Chen

发明人： Haiqin Chen ,  Bo Yang ,  He Gao ,  Jianxin Zhao ,  Yongquan Chen ,  Hao Zhang ,  Wei Chen

IPC分类号： C12N9/90 ,  C12P7/64

摘要： Disclosed is linoleic acid isomerases and their application in production of conjugated linoleic acid, which belongs to the technical fields of protein engineering and microbial engineering. The linoleic acid isomerase derived from Bifidobacterium is used to produce the conjugated linoleic acid. The recombinant E. coli containing the linoleic acid isomerase of the invention is added into a reaction system containing linoleic acid and react for 3 h to produce conjugated linoleic acids. The conversion rate of the conjugated linoleic acid of the invented method ranges from 12.1% to 42.1%, and the percentage of cis9, trans11-CLA in the conjugated linoleic acid can reach 84.3% to 89.1%. The invention provides a method for using microorganisms to produce conjugated linoleic acids with high safety and yield where cis9, trans11-CLA isomer is the major form in the conjugated linoleic acid products.