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公开(公告)号：US07826037B2
公开(公告)日：2010-11-02
申请号：US11847928
申请日：2007-08-30
申请人： Huibert Visser , Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink , Koenraad Remi André Maria Schreel , Cornelis Cornelia De Bruijn
发明人： Huibert Visser , Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink , Koenraad Remi André Maria Schreel , Cornelis Cornelia De Bruijn
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
摘要翻译： 一个系统用于执行快速和慢速的应用，例如快速应用可以进行脉冲修整。 该系统包括辐射源，电光调制器和分束器。 辐射源被配置为产生偏振的辐射束。 由结晶石英形成的电光调制器被配置成调制辐射束。 分束器被配置为将光束的第一部分引导到光束倾倒并且形成来自光束的第二部分的输出光束。
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公开(公告)号：US20080112030A1
公开(公告)日：2008-05-15
申请号：US11598837
申请日：2006-11-14
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
摘要翻译： 一个系统用于执行快速和慢速的应用，例如快速应用可以进行脉冲修整。 该系统包括辐射源，电光调制器和分束器。 辐射源被配置为产生偏振的辐射束。 由结晶石英形成的电光调制器被配置成调制辐射束。 分束器被配置为将光束的第一部分引导到光束倾倒并且形成来自光束的第二部分的输出光束。
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公开(公告)号：US07738079B2
公开(公告)日：2010-06-15
申请号：US11598837
申请日：2006-11-14
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
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4.发明申请Laser Beam Conditioning System Comprising Multiple Optical Paths Allowing for Dose Control 有权包括允许剂量控制的多个光路的激光束调节系统公开(公告)号：US20080291417A1
公开(公告)日：2008-11-27
申请号：US11753390
申请日：2007-05-24
申请人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
发明人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
摘要翻译： 一种辐射束调节系统，包括至少三个光路，其中辐射被调节。
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5.发明授权Laser beam conditioning system comprising multiple optical paths allowing for dose control 有权激光束调节系统包括允许剂量控制的多个光路公开(公告)号：US07714986B2
公开(公告)日：2010-05-11
申请号：US11753390
申请日：2007-05-24
申请人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
发明人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
IPC分类号： G03B27/54
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
摘要翻译： 一种辐射束调节系统，包括至少三个光路，其中辐射被调节。
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公开(公告)号：US08189173B2
公开(公告)日：2012-05-29
申请号：US12352326
申请日：2009-01-12
申请人： Marcel Henk André Janssens , Oscar Franciscus Jozephus Noordman , Huibert Visser , Evert Nieuwkoop
发明人： Marcel Henk André Janssens , Oscar Franciscus Jozephus Noordman , Huibert Visser , Evert Nieuwkoop
IPC分类号： G03B27/72
CPC分类号： G02B27/28 , G02F1/0136 , G03F7/70566
摘要： Apparatus and methods are used to control a polarization state of a radiation beam. A polarization control unit is configured to modulate a polarization state of at least a part of a radiation beam. A determination arrangement is configured to subsequently determine the polarization state of the at least a part of the radiation beam. A feedback unit is configured to provide signals to the polarization control arrangement based on at least the determined polarization state in order to correct for deviation in the polarization state of the part of the radiation beam from a desired polarization state. For example, the correction may ensure that the polarization state of the part of the radiation beam is at, or returns to, the desired polarization state.
摘要翻译： 装置和方法用于控制辐射束的偏振状态。 偏振控制单元被配置为调制辐射束的至少一部分的偏振状态。 确定装置被配置为随后确定辐射束的至少一部分的偏振状态。 反馈单元被配置为基于至少所确定的偏振状态向偏振控制装置提供信号，以便校正辐射束的部分偏振状态与期望偏振状态的偏差。 例如，校正可以确保辐射束的一部分的偏振状态处于或返回到期望的偏振状态。
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公开(公告)号：US08717535B2
公开(公告)日：2014-05-06
申请号：US12341081
申请日：2008-12-22
申请人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
发明人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70516
摘要： Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
摘要翻译： 设备和方法用于校准光刻设备内的独立可控元件阵列。 校准单元可以在其中调制的辐射束通过投影系统的第一状态之间切换，以将经调制的辐射束投射到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据向独立可控元件阵列的元件提供控制信号，其随后响应于控制信号被配置。
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公开(公告)号：US20090244506A1
公开(公告)日：2009-10-01
申请号：US12341081
申请日：2008-12-22
申请人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
发明人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70516
摘要： Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
摘要翻译： 设备和方法用于校准光刻设备内的独立可控元件的阵列。 校准单元可以在其中调制的辐射束通过投影系统的第一状态之间切换，以将经调制的辐射束投影到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据向独立可控元件阵列的元件提供控制信号，其随后响应于控制信号被配置。
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公开(公告)号：US09323070B2
公开(公告)日：2016-04-26
申请号：US14124002
申请日：2012-06-07
IPC分类号： G02B27/42 , G02B5/18 , H01S3/08 , H01S3/092 , H01S3/0933 , G01J3/18 , H01S3/16 , G02B5/00 , G01J3/24
CPC分类号： G02B27/4244 , G01J3/18 , G01J3/1804 , G01J3/24 , G02B5/008 , G02B5/1828 , G02B5/1852 , G02B5/1857 , G02B5/1866 , H01S3/08009 , H01S3/092 , H01S3/0933 , H01S3/1636
摘要： A manufacturing method for a grating is disclosed for the angular dispersion of light impinging the grating. The grating comprises tapered structures and cavities. A cavity width and/or corrugation amplitude is varied for achieving a desired grating efficiency according to calculation. A method is disclosed for conveniently creating gratings with variable cavity width and/or corrugation amplitude. The method comprises the step of anisotropically etching a groove pattern into a grating master. Optionally a replica is produced that is complementary to the grating master. By variation of an etching resist pattern, the cavity width of the grating may be varied allowing the optimization towards different efficiency goals.
摘要翻译： 公开了一种用于光入射光栅的光的角度色散的光栅的制造方法。 光栅包括锥形结构和空腔。 根据计算，改变空腔宽度和/或波纹幅度以实现期望的光栅效率。 公开了一种方便地创建具有可变腔宽度和/或波纹幅度的光栅的方法。 该方法包括将凹槽图案各向异性蚀刻成光栅母板的步骤。 可选地，产生与光栅母板互补的复制品。 通过蚀刻抗蚀剂图案的变化，可以改变光栅的腔宽度，从而实现不同效率目标的优化。
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10.发明授权Moving beam with respect to diffractive optics in order to reduce interference patterns 有权相对于衍射光学器件移动光束，以减少干涉图案公开(公告)号：US07948606B2
公开(公告)日：2011-05-24
申请号：US11403194
申请日：2006-04-13
申请人： Huibert Visser , Johannes Jacobus Matheus Baselmans , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink
发明人： Huibert Visser , Johannes Jacobus Matheus Baselmans , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink
IPC分类号： G03B27/42
CPC分类号： G03F7/70058
摘要： A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element directs the partially coherent beam to reflect from an angular distribution changing element to form an incoherent beam. The partially coherent beam can be directed at varying angles or positions onto the angular distribution changing element through rotation of the rotating optical element. The angles can vary as a function of time.
摘要翻译： 系统和方法用于从至少部分相干光束形成非相干光束，从而基本上消除了干涉或散斑图案。 旋转光学元件引导部分相干光束从角分布变化元件反射以形成非相干光束。 部分相干光束可以通过旋转光学元件的旋转以变化的角度或位置被引导到角度分布变化元件上。 角度可以随着时间的变化而变化。
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