Method for preparing a photochromic nanoparticle and nanoparticle prepared therefrom
    1.
    发明申请
    Method for preparing a photochromic nanoparticle and nanoparticle prepared therefrom 审中-公开
    制备由其制备的光致变色纳米颗粒和纳米颗粒的方法

    公开(公告)号:US20080026217A1

    公开(公告)日:2008-01-31

    申请号:US11606962

    申请日:2006-12-01

    IPC分类号: B32B19/00 B05D7/00

    摘要: The present invention provides a photochromic nanoparticle having a core-shell structure comprising (a) a polymer nano particle having a mean diameter controlled in a range of 10˜150 nm and containing a photochromic dye; and (b) a silicate inorganic polymer layer enveloping the polymer nanoparticle, and a method for preparing the same. The photochromic nanoparticle according to the present invention has structural and physical stability continuously in a long term and has transparency because of low light scattering, so that it can be applied to optical products.

    摘要翻译: 本发明提供一种具有核 - 壳结构的光致变色纳米颗粒,其包含(a)平均直径控制在10〜150nm范围内并含有光致变色染料的聚合物纳米颗粒; 和(b)包封聚合物纳米颗粒的硅酸盐无机聚合物层及其制备方法。 根据本发明的光致变色纳米颗粒由于光散射低而具有连续的结构和物理稳定性,并且由于光散射低而具有透明性,所以可应用于光学产品。

    Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same
    2.
    发明申请
    Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same 有权
    用于控制抛光选择性的辅助剂和包含其的化学机械抛光浆料

    公开(公告)号:US20070132058A1

    公开(公告)日:2007-06-14

    申请号:US11634238

    申请日:2006-12-06

    IPC分类号: H01L29/00

    摘要: Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, which forms an adsorption layer on the cationically charged material in order to increase polishing selectivity of the anionically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a mixture of a linear polyelectrolyte having a weight average molecular weight of 2,000˜50,000 with a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed. The adjuvant comprising a mixture of a linear polyelectrolyte with a graft type polyelectrolyte makes it possible to increase polishing selectivity as compared to CMP slurry using the linear polyelectrolyte alone, and to obtain a desired range of polishing selectivity by controlling the ratio of the linear polyelectrolyte to the graft type polyelectrolyte.

    摘要翻译: 公开了一种用于同时抛光阳离子电荷材料和阴离子充电材料的佐剂,其在阳离子电荷材料上形成吸附层,以增加阴离子带电材料的抛光选择性,其中助剂包含含有 (a)重均分子量为2000〜50,000的线性聚电解质与重均分子量为1,000〜20,000的接枝型聚电解质的混合物,其包含骨架和侧链; 和(b)基本材料。 还公开了包含上述助剂和磨料颗粒的CMP(化学机械抛光)浆料。 包含线性聚电解质与接枝型聚电解质的混合物的佐剂使得可以使用单独的线性聚电解质与CMP浆料相比提高抛光选择性,并且通过控制线性聚电解质与 接枝型聚电解质。

    Adjuvant for chemical mechanical polishing slurry
    3.
    发明申请
    Adjuvant for chemical mechanical polishing slurry 有权
    化学机械抛光浆辅料

    公开(公告)号:US20060141741A1

    公开(公告)日:2006-06-29

    申请号:US11319071

    申请日:2005-12-28

    IPC分类号: H01L21/76

    摘要: Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, which forms a adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material to cationically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed.

    摘要翻译: 公开了一种用于同时抛光阳离子充电材料和阴离子充电材料的佐剂,其在阳离子充电材料上形成吸附层,以增加阴离子充电材料对阳离子电荷材料的抛光选择性,其中佐剂 包括聚电解质盐,其包含:(a)重均分子量为1,000〜20,000的接枝型聚电解质,并且包含骨架和侧链; 和(b)基本材料。 还公开了包含上述助剂和磨料颗粒的CMP(化学机械抛光)浆料。