利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

9 条记录 (耗时 0.032 秒)

    Mask for electromagnetic radiation and method of fabricating the same
    1.
    发明申请
    Mask for electromagnetic radiation and method of fabricating the same 审中-公开
    电磁辐射掩模及其制造方法

    公开(公告)号：US20060134531A1

    公开(公告)日：2006-06-22

    申请号：US11274474

    申请日：2005-11-16

    申请人： I-Hun Song ,  Won-Il Ryu ,  Suk-Pil Kim ,  Hoon Kim ,  Seung-Hyuk Chang ,  Won-Joo Kim ,  Young-Soo Park

    发明人： I-Hun Song ,  Won-Il Ryu ,  Suk-Pil Kim ,  Hoon Kim ,  Seung-Hyuk Chang ,  Won-Joo Kim ,  Young-Soo Park

    IPC分类号： G03C5/00 ,  G21K5/00 ,  G03F1/00

    CPC分类号： G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24

    摘要： A mask for lithography and a method of manufacturing the same. The mask may include a substrate, a reflection layer formed of a material capable of reflecting electromagnetic rays on the substrate and an absorption pattern formed in a desired pattern such that absorbing regions with respect to electromagnetic rays and windows through which electromagnetic rays pass are formed, wherein the absorption pattern includes at least one side surface that is adjacent to the window and is inclined with respect to the reflection layer. The method may include forming a reflection layer which is formed of a material capable of reflecting electromagnetic rays on a substrate, forming an absorption layer which is formed of a material capable of absorbing electromagnetic rays on the refection layer, and patterning the absorption layer to form an absorption pattern with at least one side surface adjacent to a window that has an inclined side surface with respect to the reflection layer.

    摘要翻译： 光刻用掩模及其制造方法。 掩模可以包括基板，由能够在基板上反射电磁射线的材料形成的反射层和形成为期望图案的吸收图案，使得形成相对于电磁射线通过的电磁射线和窗口的吸收区域， 其中所述吸收图案包括与所述窗口相邻并且相对于所述反射层倾斜的至少一个侧表面。 该方法可以包括形成由能够在基板上反射电磁射线的材料形成的反射层，形成由能够在反射层上吸收电磁射线的材料形成的吸收层，以及图案化吸收层以形成 具有与窗口相邻的至少一个侧表面的吸收图案，该窗口具有相对于反射层的倾斜侧表面。

    Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same
    7.
    发明授权
    Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same 有权
    离轴投影光学系统和使用其的极紫外光刻设备

    公开(公告)号：US07301694B2

    公开(公告)日：2007-11-27

    申请号：US11453775

    申请日：2006-06-16

    申请人： Seung-Hyuk Chang ,  I-Hun Song ,  Young-Soo Park ,  Suk-Pil Kim ,  Hoon Kim

    发明人： Seung-Hyuk Chang ,  I-Hun Song ,  Young-Soo Park ,  Suk-Pil Kim ,  Hoon Kim

    IPC分类号： G02B5/08

    CPC分类号： G03F7/70241 ,  G03F7/70941

    摘要： Example embodiments are directed to an off-axis projection optical system including first and second mirrors that are off-axially arranged. The tangential and sagittal radii of curvature of the first mirror may be R1t and R1s, respectively. The tangential and sagittal radii of curvature of the second mirror may be R2t and R2s, respectively. The incident angle of the beam from an object point to the first mirror 10 may be i1, and an incident angle of the beam reflected from the first mirror 10 to the second mirror 30 is i2. The values of R1t, R1s, R2t, R2s, i1 and i2 may satisfy the following Equation R1t cos i1=R2t cos i2 R1s=R1t cos2i1 R2s=R2t cos2i2.

    摘要翻译： 示例性实施例涉及一种离轴投影光学系统，其包括非轴向布置的第一和第二反射镜。 第一反射镜的切向和矢状曲率半径可以分别为R 1t 1和R 1s 1。 第二反射镜的切向和矢状曲率半径可以分别为R 2t 2和R 2s 3。 从物点到第一反射镜10的光束的入射角度可以为1＆lt; 1＆gt;，从第一反射镜10反射到第二反射镜30的光束的入射角为 2 。 R 1，R 1，R 2，R 2，R 2，R 1，R 2， SUB>和i <2>可以满足以下等式<？in-line-formula description =“In-line Formulas”end =“lead”？> R 1t cos α-in-line-formula description =“In-line Formulas”end =“tail”？> R＆lt; 1s＆lt; 1＆lt; 1＆lt; 1＆lt; i <？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead “？”R 2s 2 = R 2t 2＆lt; 2＆lt; 2＆lt; 2＆lt;＆lt;行内公式描述= “直线公式”end =“tail”？>

    Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same
    8.
    发明申请
    Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same 有权
    离轴投影光学系统和使用其的极紫外光刻设备

    公开(公告)号：US20060284113A1

    公开(公告)日：2006-12-21

    申请号：US11453775

    申请日：2006-06-16

    申请人： Seung-Hyuk Chang ,  I-Hun Song ,  Young-Soo Park ,  Suk-Pil Kim ,  Hoon Kim

    发明人： Seung-Hyuk Chang ,  I-Hun Song ,  Young-Soo Park ,  Suk-Pil Kim ,  Hoon Kim

    IPC分类号： G21G5/00 ,  A61N5/00

    CPC分类号： G03F7/70241 ,  G03F7/70941

    摘要： An off-axis projection optical system including first and second mirrors that are off-axially arranged is provided. The tangential and sagittal radii of curvature of the first mirror may be R1t and R1s, respectively. The tangential and sagittal radii of curvature of the second mirror may be R2t and R2s, respectively. The incident angle of the beam from an object point to the first mirror 10 may be i1, and an incident angle of the beam reflected from the first mirror 10 to the second mirror 30 is i2. The values of R1t, R1s, R2t, R2s, i1 and i2 may satisfy the following Equation. R1t cos i1=R2t cos i2 R1s=R1t cos2i1 R2s=R2t cos2i2

    摘要翻译： 提供了一种离轴投影光学系统，其包括非轴向布置的第一和第二反射镜。 第一反射镜的切向和矢状曲率半径可以分别为R 1t 1和R 1s 1。 第二反射镜的切向和矢状曲率半径可以分别为R 2t 2和R 2s 3。 从物点到第一反射镜10的光束的入射角度可以为1＆lt; 1＆gt;，从第一反射镜10反射到第二反射镜30的光束的入射角为 2 。 R 1，R 1，R 2，R 2，R 2，R 1，R 2， SUB＆gt;和i＆lt; 2＆gt;可以满足以下等式。 <？in-line-formula description =“In-line Formulas”end =“lead”？> R＆lt; 1t＆gt; cos＆lt; 1＆lt; 1＆lt; 2＆lt; > cos i <2> <？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end = “引线”→R 1> = R 1t＆lt; 2＆gt;＆lt; 2＆lt;＆lt; =“在线公式”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> R <2> 2t 2 “in-line-formula description =”In-line Formulas“end =”tail“？>

    Methods of operating image sensors
    9.
    发明授权
    Methods of operating image sensors 有权

    公开(公告)号：US10602086B2

    公开(公告)日：2020-03-24

    申请号：US14883453

    申请日：2015-10-14

    申请人： Seung-Hyuk Chang ,  Yoon-Dong Park ,  Yong-Jei Lee

    发明人： Seung-Hyuk Chang ,  Yoon-Dong Park ,  Yong-Jei Lee

    IPC分类号： H04N5/351 ,  H04N5/225 ,  H04N13/254 ,  H04N13/271 ,  G01S7/481 ,  G01S17/06

    摘要： A method of operating a three-dimensional image sensor may include: obtaining position information of an object using light emitted by a light source module, the three-dimensional image sensor including the light source module having a light source and a lens; and adjusting a relative position of the light source to the lens based on the obtained position information of the object. A method of operating an image sensor may include: obtaining position information of an object using light emitted by a light source module, the image sensor including the light source module; and adjusting an emission angle of the light emitted by the light source module based on the obtained position information.