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公开(公告)号：US20190206920A1
公开(公告)日：2019-07-04
申请号：US16234472
申请日：2018-12-27
Applicant: IMEC VZW
Inventor： Veronique ROCHUS , Xavier ROTTENBERG
IPC: H01L27/146
CPC classification number: H01L27/14636 , H01L27/14605 , H01L27/14685 , H01L27/14689
Abstract: A method for producing an image sensor comprises: depositing a first back-end-of-line, BEOL, layer above a substrate comprising an array of light-detecting elements, said BEOL layer comprising metal wirings being arranged to form connections to components on the substrate and together with depositing the first BEOL layer, improving planarization of the first BEOL layer by depositing a planarizing metal dummy pattern in the first BEOL layer, wherein a part of the planarizing metal dummy pattern is arranged above a light-detecting element, wherein the planarizing metal dummy patterns is formed from the same material as the metal wirings and is deposited to planarize density of the metal deposited in the first BEOL layer across a surface of the layer and wherein a shape and/or position of the metal dummy pattern above the array of light-detecting elements is designed to provide a desired effect on incident light.
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2.发明申请公开(公告)号：US20200174186A1
公开(公告)日：2020-06-04
申请号：US16703242
申请日：2019-12-04
Applicant: IMEC VZW , KATHOLIEKE UNIVERSITEIT LEUVEN
Inventor： Wouter Jan WESTERVELD , Veronique ROCHUS , Simone SEVERI , Roelof JANSEN
Abstract: A waveguide for guiding an electro-magnetic wave comprises: a first waveguide part; and a second waveguide part; wherein the first waveguide part has a first width in a first direction (Y) perpendicular to the direction of propagation of the electro-magnetic wave and the second waveguide part has a second width in the first direction (Y), wherein the second width is larger than the first width; and wherein the first and the second waveguide parts are spaced apart by a gap in a second direction (Z) perpendicular to the first and second planes in which the waveguide parts are formed, wherein the gap has a size which is sufficiently small such that the first and second waveguide parts unitely form a single waveguide for guiding the electro-magnetic wave.A photonic integrated circuit component, a sensor and an actuator comprising the waveguide are disclosed.
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公开(公告)号：US20200319019A1
公开(公告)日：2020-10-08
申请号：US16840269
申请日：2020-04-03
Applicant: IMEC VZW , KATHOLIEKE UNIVERSITEIT LEUVEN
Inventor： Wouter Jan WESTERVELD , Roelof JANSEN , Xavier ROTTENBERG , Veronique ROCHUS
IPC: G01H9/00
Abstract: A sensor structure for an acoustical pressure sensor. The structure comprises an optical waveguide closed-loop resonator and a plurality of sensor elements, wherein the individual sensor elements of the plurality of sensor elements are configured to be affected by an acoustical pressure wave such that a physical property of the individual sensor element is changed. Further, the optical waveguide closed-loop resonator is arranged at said plurality of sensor elements and associated with each of the individual sensor elements of the plurality of sensor elements such that a resonance frequency of the optical waveguide closed-loop resonator is shifted due to the affected physical properties of all individual sensor elements of the plurality of sensor elements.
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Patent Agency Ranking
公开(公告)号：US20200174192A1
公开(公告)日：2020-06-04
申请号：US16703650
申请日：2019-12-04
Applicant: IMEC VZW , KATHOLIEKE UNIVERSITEIT LEUVEN
Inventor： Md Mahmud Ul HASAN , Simone SEVERI , Veronique ROCHUS , Wouter Jan WESTERVELD
IPC: G02B6/132 , G02B6/136 , C23C16/455 , C23C16/56
Abstract: A method for manufacturing of a waveguide for guiding an electro-magnetic wave comprising: forming a first waveguide layer, a sacrificial layer and a protection layer on a first wafer, patterning to define a pattern of a first waveguide part and a supporting structure in the first waveguide layer; exposing the sacrificial layer on the first waveguide part while the protection layer still covers the sacrificial layer on the supporting structure; removing the sacrificial layer on the first waveguide part; removing the protection layer; bonding a second wafer to the sacrificial layer of the first wafer such that a second waveguide part is supported by the supporting structure and a gap corresponding to the thickness of the sacrificial layer is formed between the first and second waveguide parts.
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公开(公告)号：US20210189310A1
公开(公告)日：2021-06-24
申请号：US17128091
申请日：2020-12-19
Applicant: IMEC VZW , Katholieke Universiteit Leuven
Inventor： Aaron DELAHANTY , Dries BRAEKEN , Alexandru ANDREI , Peter PEUMANS , Carolina MORA LOPEZ , Veerle REUMERS , Veronique ROCHUS , Bart WEEKERS
Abstract: A semiconductor cell culture device for three-dimensional cell culture comprises: a semiconductor material layer in which a cell culture portion of semiconductor material is defined, wherein the cell culture portion defines an area within the semiconductor material layer surrounded by semiconductor material, wherein the cell culture portion comprises a mesh structure having island structures being interconnected by bridge structures and defining through-pores between the island structures allowing for selective transport of cell constructs, cellular components, proteins or other large molecules through the semiconductor material layer and on opposite sides of the cell culture portion in the semiconductor material layer, and a supporting structure connected to the cell culture portion.
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公开(公告)号：US20200173843A1
公开(公告)日：2020-06-04
申请号：US16703657
申请日：2019-12-04
Applicant: IMEC VZW , KATHOLIEKE UNIVERSITEIT LEUVEN
Inventor： Wouter Jan WESTERVELD , Veronique ROCHUS , Simone SEVERI , Roelof JANSEN
Abstract: A sensor comprises: a thin structure, which is configured to receive a force for deforming a shape of the thin structure and which is arranged above a substrate; and a waveguide for guiding an electro-magnetic wave comprising: a first waveguide part; and a second waveguide part; wherein the second waveguide part has a larger width than the first waveguide part; and wherein the first and the second waveguide parts are spaced apart by a gap which is sufficiently small such that the first and second waveguide parts unitely form a single waveguide, wherein one of the first and the second waveguide part is arranged at least partly on the thin structure and another of the first and the second waveguide part is arranged on the substrate.
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公开(公告)号：US20190196111A1
公开(公告)日：2019-06-27
申请号：US16231452
申请日：2018-12-22
Applicant: IMEC VZW
Inventor： Bruno FIGEYS , Veronique ROCHUS , Roelof JANSEN , Xavier ROTTENBERG
Abstract: An integrated photonic device comprises: an input waveguide configured to extend in an input plane, and an output waveguide configured to extend in an output plane, wherein the output plane is parallel to or contained within the input plane; an input coupler optically coupled to the input waveguide, wherein the input coupler is configured to redirect a light signal out of the input waveguide and the input plane; a light property modifier configured to receive the light signal from the input coupler and reflect the light signal towards the output plane, wherein the light property modifier is configured to selectively adjust an optical path length of the light signal; and an output coupler optically coupled to the output waveguide, wherein the output coupler is configured to receive the reflected light signal from the light property modifier and redirect the light signal into the output waveguide and the output plane.
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公开(公告)号：US20180364121A1
公开(公告)日：2018-12-20
申请号：US16006835
申请日：2018-06-12
Applicant: IMEC VZW
Inventor： Roelof JANSEN , Xavier ROTTENBERG , Veronique ROCHUS
Abstract: A force sensing device comprises: a membrane (120), which is configured to deform upon receiving a force; a first Mach Zehnder-type interferometer device (110); a second Mach Zehnder-type interferometer device (130), wherein a first measurement propagation path (114) of the first Mach Zehnder-type interferometer device (110) and a second measurement propagation path (134) of the second Mach Zehnder-type interferometer device (130) are arranged on or in the membrane (120), and wherein the first measurement propagation path (114) and the second measurement propagation path (134) are differently sensitive to applied force on the membrane (120).
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